Patents by Inventor Motoyuki Shima
Motoyuki Shima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210115221Abstract: A composition enables particles to be removed from a surface of a substrate by: applying the composition on the surface of the substrate to form a substrate treatment film on the surface; and bringing a liquid into contact with the substrate treatment film to remove the substrate treatment film from the surface. The composition includes a resin; and a solvent. The solvent includes a first solvent component having a normal boiling point of no less than 175° C. A content of the first solvent component with respect to 100 parts by mass of the resin is no less than 1 part by mass.Type: ApplicationFiled: December 28, 2020Publication date: April 22, 2021Applicant: JSR CORPORATIONInventors: Shun Aoki, Takashi Katagiri, Kazunori Takanashi, Motoyuki Shima
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Patent number: 10792711Abstract: An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment comprises a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, wherein the treatment film comprises an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film.Type: GrantFiled: December 11, 2018Date of Patent: October 6, 2020Assignee: Tokyo Electron LimitedInventors: Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno, Kenji Mochida, Motoyuki Shima
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Patent number: 10272478Abstract: An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment includes a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, the treatment film includes an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film.Type: GrantFiled: July 27, 2015Date of Patent: April 30, 2019Assignee: Tokyo Electron LimitedInventors: Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno, Kenji Mochida, Motoyuki Shima
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Publication number: 20190118227Abstract: An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment comprises a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, wherein the treatment film comprises an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film.Type: ApplicationFiled: December 11, 2018Publication date: April 25, 2019Applicant: Tokyo Electron LimitedInventors: Meitoku AIBARA, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno, Kenji Mochida, Motoyuki Shima
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Patent number: 10023827Abstract: A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which is a non-polymeric acid. The organic acid is preferably a polyhydric carboxylic acid. The acid dissociation constant of the polymer is preferably less than that of the organic acid. The solubility of the organic acid in water at 25° C. is preferably no less than 5% by mass. The organic acid is preferably a solid at 25° C.Type: GrantFiled: May 9, 2017Date of Patent: July 17, 2018Assignee: JSR CORPORATIONInventors: Kenji Mochida, Motoyuki Shima
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Patent number: 9926462Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).Type: GrantFiled: November 22, 2016Date of Patent: March 27, 2018Assignee: JSR CORPORATIONInventors: Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima
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Patent number: 9817311Abstract: A resist pattern-forming method is provided, including: providing a resist film using a photoresist composition; exposing the resist film; and developing the resist film exposed, the photoresist composition containing a polymer having a weight average molecular weight of no less than 1,000 and no greater than 7,500 and having a structural unit that includes an acid-labile group that is dissociated by an action of an acid, a radiation-sensitive acid generator and a solvent composition, and the photoresist composition having a content of solids of no less than 20% by mass and no greater than 60% by mass. The photoresist composition preferably has a viscosity of no less than 50 mPa·s and no greater than 150 mPa·s at 25° C.Type: GrantFiled: May 25, 2016Date of Patent: November 14, 2017Assignee: JSR CorporationInventors: Yuichiro Katsura, Ryu Matsumoto, Motoyuki Shima, Yuji Yada, Ken Nakakura
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Patent number: 9818598Abstract: An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film.Type: GrantFiled: July 27, 2015Date of Patent: November 14, 2017Assignees: Tokyo Electron Limited, JSR CorporationInventors: Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno, Kenji Mochida, Motoyuki Shima
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Publication number: 20170240851Abstract: A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which is a non-polymeric acid. The organic acid is preferably a polyhydric carboxylic acid. The acid dissociation constant of the polymer is preferably less than that of the organic acid. The solubility of the organic acid in water at 25° C. is preferably no less than 5% by mass. The organic acid is preferably a solid at 25° C.Type: ApplicationFiled: May 9, 2017Publication date: August 24, 2017Applicant: JSR CORPORATIONInventors: Kenji MOCHIDA, Motoyuki SHIMA
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Publication number: 20170073541Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).Type: ApplicationFiled: November 22, 2016Publication date: March 16, 2017Applicant: JSR CORPORATIONInventors: Kiyoshi TANAKA, Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima
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Patent number: 9540535Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).Type: GrantFiled: March 28, 2013Date of Patent: January 10, 2017Assignee: JSR CORPORATIONInventors: Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima
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Publication number: 20160266489Abstract: A resist pattern-forming method is provided, including: providing a resist film using a photoresist composition; exposing the resist film; and developing the resist film exposed, the photoresist composition containing a polymer having a weight average molecular weight of no less than 1,000 and no greater than 7,500 and having a structural unit that includes an acid-labile group that is dissociated by an action of an acid, a radiation-sensitive acid generator and a solvent composition, and the photoresist composition having a content of solids of no less than 20% by mass and no greater than 60% by mass. The photoresist composition preferably has a viscosity of no less than 50 mPa·s and no greater than 150 mPa·s at 25° C.Type: ApplicationFiled: May 25, 2016Publication date: September 15, 2016Applicant: JSR CORPORATIONInventors: Yuichiro KATSURA, Ryu MATSUMOTO, Motoyuki SHIMA, Yuji YADA, Ken NAKAKURA
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Patent number: 9417527Abstract: A resist pattern-forming method is provided, including: providing a resist film using a photoresist composition; exposing the resist film; and developing the resist film exposed, the photoresist composition containing a polymer having a weight average molecular weight of no less than 1,000 and no greater than 7,500 and having a structural unit that includes an acid-labile group that is dissociated by an action of an acid, a radiation-sensitive acid generator and a solvent composition, and the photoresist composition having a content of solids of no less than 20% by mass and no greater than 60% by mass. The photoresist composition preferably has a viscosity of no less than 50 mPa·s and no greater than 150 mPa·s at 25° C.Type: GrantFiled: August 12, 2014Date of Patent: August 16, 2016Assignee: JSR CorporationInventors: Yuichiro Katsura, Ryu Matsumoto, Motoyuki Shima, Yuji Yada, Ken Nakakura
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Publication number: 20160032227Abstract: A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. The cleaning composition preferably further contains an organic acid which is a non-polymeric acid. The organic acid is preferably a polyhydric carboxylic acid. The acid dissociation constant of the polymer is preferably less than that of the organic acid. The solubility of the organic acid in water at 25° C. is preferably no less than 5% by mass. The organic acid is preferably a solid at 25° C.Type: ApplicationFiled: July 28, 2015Publication date: February 4, 2016Applicant: JSR CORPORATIONInventors: Kenji MOCHIDA, Motoyuki SHIMA
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Publication number: 20160035564Abstract: An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film.Type: ApplicationFiled: July 27, 2015Publication date: February 4, 2016Inventors: Meitoku AIBARA, Yuki YOSHIDA, Hisashi KAWANO, Masami YAMASHITA, Itaru KANNO, Kenji MOCHIDA, Motoyuki SHIMA
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Publication number: 20160035561Abstract: An object of the present invention is to obtain a high removing performance of particles. The substrate processing system according to the exemplary embodiment comprises a holding unit and a removing solution supply unit. The holding unit holds a substrate that has a treatment film formed thereon, wherein the treatment film comprises an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent. The removing solution supply unit supplies to the treatment film formed on the substrate, a removing solution capable of removing the treatment film.Type: ApplicationFiled: July 27, 2015Publication date: February 4, 2016Inventors: Meitoku AIBARA, Yuki YOSHIDA, Hisashi KAWANO, Masami YAMASHITA, Itaru KANNO, Kenji MOCHIDA, Motoyuki SHIMA
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Publication number: 20150048051Abstract: A resist pattern-forming method is provided, including: providing a resist film using a photoresist composition; exposing the resist film; and developing the resist film exposed, the photoresist composition containing a polymer having a weight average molecular weight of no less than 1,000 and no greater than 7,500 and having a structural unit that includes an acid-labile group that is dissociated by an action of an acid, a radiation-sensitive acid generator and a solvent composition, and the photoresist composition having a content of solids of no less than 20% by mass and no greater than 60% by mass. The photoresist composition preferably has a viscosity of no less than 50 mPa·s and no greater than 150 mPa·s at 25° C.Type: ApplicationFiled: August 12, 2014Publication date: February 19, 2015Applicant: JSR CORPORATIONInventors: Yuichiro KATSURA, Ryu MATSUMOTO, Motoyuki SHIMA, Yuji Yada, Ken NAKAKURA
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Patent number: 8927200Abstract: A double patterning method includes providing a first resist film on a substrate using a first photoresist composition. The first resist film is exposed. The exposed first resist film is developed using a first developer to form a first resist pattern. A second resist film is provided in at least space areas of the first resist pattern using a second photoresist composition. The second resist film is exposed. The exposed second resist film is developed using a second developer that includes an organic solvent to form a second resist pattern. The first resist pattern is insoluble or scarcely soluble in the second developer.Type: GrantFiled: October 22, 2013Date of Patent: January 6, 2015Assignee: JSR CorporationInventors: Kanako Meya, Takeo Shioya, Motoyuki Shima
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Publication number: 20140147794Abstract: A method of forming a photoresist pattern includes providing a photoresist film on a substrate. An upper layer film is provided on the photoresist film using an upper layer film-forming composition. Radiation is applied to the upper layer film and the photoresist film through a mask having a given pattern via an immersion medium. The upper layer film and the photoresist film are developed using a developer to form a photoresist pattern. The upper layer film-forming composition includes a resin soluble in the developer and a solvent component. The solvent component includes a first solvent, a second solvent shown by a general formula (2), and a third solvent shown by a general formula (3). The first solvent is diethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol diethyl ether, ?-butyrolactone, methyl propylene diglycol, methyl propylene triglycol or a mixture thereof.Type: ApplicationFiled: February 3, 2014Publication date: May 29, 2014Applicant: JSR CORPORATIONInventors: Norihiko SUGIE, Kazunori KUSABIRAKI, Kiyoshi TANAKA, Motoyuki SHIMA, Yoshikazu YAMAGUCHI
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Publication number: 20140080066Abstract: A double patterning method includes providing a first resist film on a substrate using a first photoresist composition. The first resist film is exposed. The exposed first resist film is developed using a first developer to form a first resist pattern. A second resist film is provided in at least space areas of the first resist pattern using a second photoresist composition. The second resist film is exposed. The exposed second resist film is developed using a second developer that includes an organic solvent to form a second resist pattern. The first resist pattern is insoluble or scarcely soluble in the second developer.Type: ApplicationFiled: October 22, 2013Publication date: March 20, 2014Applicant: JSR CORPORATIONInventors: Kanako MEYA, Takeo SHIOYA, Motoyuki SHIMA