Abstract: A GaN-series light emitting diode with high light efficiency utilizes a p-type semiconductor layer having a textured surface structure. The optical waveguide effect can be interrupted and formation of hexagonal shaped pits defect can be reduced due to the textured structure. The p-type semiconductor layer is formed on a light emitting layer and includes a p-type cladding layer, p-type transitional layer, and p-type ohmic contact layer. During the manufacturing of the GaN-series LED, the tension and compression of strain is controlled while the p-type cladding layer and the p-type transition layer are formed. Through the control of the epitaxial growth process, it is attained that the surface of the p-type semiconductor layer is textured to increase external quantum efficiency and the operation life of the light emitting device.

Abstract: The present invention relates to a structure and a manufacturing method of epitaxial layers of gallium nitride-based compound semiconductors with less dislocation densities. Surface treatment is carried out first on the surface of a substrate using reaction precursors Cp2Mg and NH3. Then a gallium nitride-based buffer layer is formed on the substrate to form a semiconductor epitaxial structure with an interface layer or an interface zone between the substrate and the buffer layer. The structure can reduce effectively the dislocation density formed in the gallium nitride-based epitaxial layer on top of the gallium nitride-based buffer layer. Thereby, high-quality epitaxial layers tend to be attained and the uniformity of the dislocation density can be enhanced.

Abstract: A vertical electrode structure of GaN-based light emitting diode discloses an oxide window layer constructing the GaN-based light emitting diode of vertical electrode structure, which effectively decreases the Fresnel reflection loss and total reflection, and further advances the luminous efficiency. Moreover, the further included metal reflecting layer causes the reflection without the selective angle of incidence, thus increasing the coverage of the reflecting angles and further reflecting the light emitted from a light emitting layer effectively. In addition, the invented structure can also advance the function of heat elimination and the electrostatic discharge (ESD) so as to the increase the operating life of the component and to be applicable to the using under the high current driving. Moreover, the vertical electrode structure of the present invention is able to lower down the manufacturing square of the chip and facilitate the post stage of the conventional wire bonding process.

Abstract: A method for fabricating GaN-based LED is provided. The method first forms a first contact spreading metallic layer on top of the texturing surface of the p-type ohmic contact layer. The method then forms a second and a third contact spreading metallic layers on top of the first contact spreading layer. The p-type transparent metallic conductive layer composed of the three contact spreading metallic layers, after undergoing an alloying process within an oxygenic or nitrogenous environment under a high temperature, would have a superior conductivity. The p-type transparent metallic conductive layer could enhance the lateral contact uniformity between the p-type metallic electrode and the p-type ohmic contact layer, so as to avoid the localized light emission resulted from the uneven distribution of the second contact spreading metallic layer within the third contact spreading metallic layer. The GaN-based LED's working voltage and external quantum efficiency are also significantly improved.

Abstract: The present invention relates to a structure and a manufacturing method of epitaxial layers of gallium nitride-based compound semiconductors with less dislocation densities. Surface treatment is carried out first on the surface of a substrate using reaction precursors Cp2Mg and NH3. Then a gallium nitride-based buffer layer is formed on the substrate to form a semiconductor epitaxial structure with an interface layer or an interface zone between the substrate and the buffer layer. The structure can reduce effectively the dislocation density formed in the gallium nitride-based epitaxial layer on top of the gallium nitride-based buffer layer. Thereby, high-quality epitaxial layers tend to be attained and the uniformity of the dislocation density can be enhanced.

Abstract: A light-emitting gallium nitride-based III-V group compound semiconductor device with high light extraction efficiency that features on a substrate with concave and/or convex surface, a texturing surface layer, and a transparent conductive window layer. Therefore, the operating voltage is decreased and the efficiency of light extracting is improved.

Abstract: A GaN-series light emitting diode with high light efficiency utilizes a p-type semiconductor layer having a textured surface structure. The optical waveguide effect can be interrupted and formation of hexagonal shaped pits defect can be reduced due to the textured structure. The p-type semiconductor layer is formed on a light emitting layer and includes a p-type cladding layer, p-type transitional layer, and p-type ohmic contact layer. During the manufacturing of the GaN-series LED, the tension and compression of strain is controlled while the p-type cladding layer and the p-type transition layer are formed. Through the control of the epitaxial growth process, it is attained that the surface of the p-type semiconductor layer is textured to increase external quantum efficiency and the operation life of the light emitting device.

Abstract: A structure of a gallium nitride light emitting diode has a transparent conductive window layer including a diffusion barrier layer, an ohmic contact layer, and a window layer. By using the added domain contact layer, the diffusion barrier layer and the P-type semiconductor layer of the light emitting diode are put into ohmic contact. And then, the rising of the contact resistivity is barred by applying the diffusion barrier layer to block the diffusion of the window layer from the contact with the domain contact layer so as to lower down the operating voltage and advance the transparency.

Abstract: The present invention is a semiconductor structure for light emitting devices that can emit light with multiple wavelengths, in particular, in the blue to ultraviolet region of the electromagnetic spectrum. The structure comprises an active portion positioned between a p-type gallium nitride (GaN) layer and an n-type gallium nitride (GaN) layer. The active portion includes an MQW emitting light with long wavelength and an MQW emitting light with short wavelength. There is another group of strain induces thickness fluctuation layers (SITFL) positioned between the active portion and the n-type gallium nitride (GaN) layer. The semiconductor structure itself is based on a sapphire substrate. A low temperature buffer layer is positioned between the sapphire substrate and the n-type gallium nitride (GaN) layer. There is still another undoped gallium nitride (GaN) layer positioned between n-type gallium nitride (GaN) layer and the low temperature buffer layer.

Abstract: A method for fabricating GaN-based LED is provided. The method first forms a first contact spreading metallic layer on top of the texturing surface of the p-type ohmic contact layer. The method then forms a second and a third contact spreading metallic layers on top of the first contact spreading layer. The p-type transparent metallic conductive layer composed of the three contact spreading metallic layers, after undergoing an alloying process within an oxygenic or nitrogenous environment under a high temperature, would have a superior conductivity. The p-type transparent metallic conductive layer could enhance the lateral contact uniformity between the p-type metallic electrode and the p-type ohmic contact layer, so as to avoid the localized light emission resulted from the uneven distribution of the second contact spreading metallic layer within the third contact spreading metallic layer. The GaN-based LED's working voltage and external quantum efficiency are also significantly improved.

Abstract: A vertical electrode structure of GaN-based light emitting diode discloses an oxide window layer constructing the GaN-based light emitting diode of vertical electrode structure, which effectively decreases the Fresnel reflection loss and total reflection, and further advances the luminous efficiency. Moreover, the further included metal reflecting layer causes the reflection without the selective angle of incidence, thus increasing the coverage of the reflecting angles and further reflecting the light emitted from a light emitting layer effectively. In addition, the invented structure can also advance the function of heat elimination and the electrostatic discharge (ESD) so as to the increase the operating life of the component and to be applicable to the using under the high current driving. Moreover, the vertical electrode structure of the present invention is able to lower down the manufacturing square of the chip and facilitate the post stage of the conventional wire bonding process.

Abstract: A vertical electrode structure of GaN-based light emitting diode discloses an oxide window layer constructing the GaN-based light emitting diode of vertical electrode structure, which effectively decreases the Fresnel reflection loss and total reflection, and further advances the luminous efficiency. Moreover, the further included metal reflecting layer causes the reflection without the selective angle of incidence, thus increasing the coverage of the reflecting angles and further reflecting the light emitted from a light emitting layer effectively. In addition, the invented structure can also advance the function of heat elimination and the electrostatic discharge (ESD) so as to the increase the operating life of the component and to be applicable to the using under the high current driving. Moreover, the vertical electrode structure of the present invention is able to lower down the manufacturing square of the chip and facilitate the post stage of the conventional wire bonding process.

Abstract: An epitaxial structure of a gallium nitride series semiconductor device and a process of forming the same are described. A first buffer layer of gallium nitride is epitaxially formed on a substrate at a first temperature. A second buffer layer of indium gallium nitride is formed on the first buffer layer at a second temperature. The second temperature increases up to a third temperature, during which precursors including In(CH3)3 and NH3 are used for surface treatment. A high-temperature gallium nitride is formed at the third temperature. The buffer layer and the way to form such a buffer layer allow improved crystal configuration and lowered defect density, thereby increasing the performance and service life of a semiconductor device.

Abstract: A GaN-series of light emitting diode with high light extraction efficiency includes a substrate, a n-type semiconductor, a light emitting layer and a p-type semiconductor layer. More particular, the p-type semiconductor layer includes a p-type cladding layer, a p-type transition layer and a p-type ohmic contact layer, wherein the p-type transition layer is formed on the p-type cladding layer and the p-type ohmic contact layer is formed on the p-type transition layer. A doping concentration of magnesium of the p-type ohmic contact layer is between the p-type cladding layer and the p-type transition layer thereof that is to form the strain among three layers of the p-type semiconductor layer. Hence, a surface (the p-type ohmic contact layer) of the p-type semiconductor layer has a non-hexagonal texture, which interruptes the optical waveguide effect to increase external quantum efficiency and operation life of the light emitting diode.

Abstract: A manufacturing method and device for white light emitting comprise at least two light emitting layers capable of emitting the light with the wavelengths of ?1 and ?2. Upon absorbing the light with the wavelength of one light emitting layer by at least one kind of fluorescent material, the light with the wavelength of ?3 is emitted and then mixed together with the light with the other wavelength so as to output the white light for use. Then, the fluorescent material formed on the light emitting layer of the light emitting device is packed together with said light emitting device, and then the assembly is the white light emitting device with high color rendering index of this invention.

Abstract: A light-emitting gallium nitride-based III-V group compound semiconductor device with high light extraction efficiency that features on a substrate with concave and /or convex surface, a texturing surface layer, and a transparent conductive window layer. Therefore, the operating voltage is decreased and the efficiency of light extracting is improved.