Patents by Inventor Muhran Nasser-Ghodsi

Muhran Nasser-Ghodsi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis
    Patent number: 7304302
    Abstract: Various systems configured to reduce distortion of a resist during a metrology process are provided. The systems include an electron beam metrology tool configured to measure one or more characteristics of one or more resist features formed on a specimen. The electron beam metrology tool may be configured as a scanning electron microscope. The resist may be designed for exposure at a wavelength of about 193 nm. One system includes a cooling subsystem configured to alter a temperature of the specimen during measurements by the tool such that the resist feature(s) are not substantially distorted during the measurements. Another system includes a drying subsystem that is configured to reduce moisture proximate the specimen during measurements by the electron beam metrology tool such that the resist feature(s) are not substantially distorted during the measurements. An additional system may include both the cooling subsystem and the drying subsystem.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: December 4, 2007
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Peter Nunan, Muhran Nasser-Ghodsi, Mark Borowicz, Rudy F. Garcia, Tzu Chin Chuang, Herschel Marchman, David Soltz