Abstract: An ester compound of the following formula (1) is provided.

Abstract: A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

Abstract: The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z′ is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′ —OH or —NHCHR—R′ —OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers.

Abstract: A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

Abstract: A polymer bearing specific cyclic silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.

Abstract: A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

Abstract: A silacyclohexane compound of the formulas (I) ##STR1## wherein R represents an organic residue, ##STR2## represents an unsubstituted or substituted silicon-containing cyclohexylene group or a 1,4-cyclohexylene group, ##STR3## represents an unsubstituted or substituted phenylene, an unsubstituted or substituted silicon-containing cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, or a 1,4-cyclohexylene group provided that at least one of these residues represents a silicon-containing cyclohexylene group, j, k and l are, respectively, 0 or 1, L.sub.1 and L.sub.2, respectively, represent H or F, m and n are, respectively, 0, 1 or 2 provided that m+n=2, 3 or 4, and X represents H, F or Cl. A liquid crystal composition comprising the silacyclohexane compound of the above formula is also described, along with a liquid crystal device comprising the composition.

Abstract: The invention provides a high molecular weight silicone compound comprising recurring units of the general formula (1) and having a weight average molecular weight of 1,000-50,000. ##STR1## Z is a di- to hexavalent, monocyclic or polycyclic hydrocarbon group or bridged cyclic hydrocarbon group of 5-12 carbon atoms, R.sup.1 is a substituted or unsubstituted alkyl or alkenyl group of 1-8 carbon atoms, R.sup.2 is an acid labile group, m is 0 or an integer, n is an integer, satisfying m+n.ltoreq.5, x is an integer, p1 and p2 are positive numbers, q is 0 or a positive number, satisfying 0<p1/(p1+p2+q).ltoreq.0.9, 0<p2/(p1+p2+q).ltoreq.0.9, 0.ltoreq.q/(p1+p2+q).ltoreq.0.7, and p1+p2+q=1. A chemically amplified positive resist composition comprising the high molecular weight silicone compound as a base resin is sensitive to actinic radiation and has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV.

Abstract: A liquid crystal composition having a liquid crystal component with a chemical structure of two saturated rings connected directly to one another, and an additional structural isomer thereof having a silane atom in a different position from the first component and having the structure set forth in formula (1) hereinbelow. ##STR1## This composition provides an improved effect with respect to enhancement in both response speed and T.sub.NI (nematic-isotropic transition temperature) as a high voltage hold ratio as required for TFT driving in addition to also lowering the voltage.

Abstract: Liquid crystal compositions which can improve the low .DELTA.n (refractive index anisotropy) of conventional liquid crystal compositions containing a silacyclohexane compound and which retain a low viscosity and hence show no decrease in response speed. Liquid crystal compositions having a high .DELTA.n of 0.13 to 0.25, a low viscosity of 30 cp or less, a low threshold voltage and a high voltage holding ratio can be obtained by adding thereto, as a required component, a compound having both a silacyclohexane ring and a tolan structure, or a miture of a compound having a silacyclohexane ring and a compound having a tolan structure.

Abstract: This invention provides twisted nematic liquid crystal compositions obtained by adding a cyclohexane ring-containing optically active compound of the following general formula (1) to a mixture of nematic liquid crystal compounds including at least one silacyclohexane compound, as well as guest-host liquid crystal compositions and liquid crystal display devices utilizing the same.

Abstract: A liquid crystal composition comprising one or more types compounds represented by general formula II: ##STR1## and one or more types of compounds selected from the group consisting of: ##STR2## wherein R, rings A and B, X, Y1, Y2, Y3, Y4 and m are defined herein.

Abstract: An optically active silacyclohexane compound of the formula (I) ##STR1## wherein R represents an organic residue, X represents --CH.sub.2 -- or --O--; Z represents a chiral group having at least one chiral carbon atom; L.sub.1 and L.sub.2 independently represent H or F, n is 0 or 1; ##STR2## represents a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group whose silicon atom at the 1 or 4 position has H, F, Cl or CH.sub.3, or a 1,4-cyclohexylene group; and ##STR3## represents a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group whose silicon atom at the 1 or 4 position has H, F, Cl or CH.sub.3, a 1,4-cyclohexylene group or a 1,4-phenylene group provided that at least one of ##STR4## represents the trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group defined above. A liquid crystal composition comprising the compound defined above and a liquid crystal display device comprising the composition are also described.

Abstract: A cyclohexanone compound of the following general formula (I) is provided ##STR1## wherein Ar represents a phenyl group or a tolyl group, and R represents a phenyl group, a tolyl group, a linear alkyl group having from 1 to 10 carbon atoms, a mono or difluoroalkyl group having from 1 to 10 carbon atoms, a branched alkyl group having from 3 to 8 carbon atoms or an alkoxyalkyl group having from 2 to 7 carbon atoms. The preparation of the cyclohexanone compound is also described along with processes for preparing liquid crystal compounds from the cyclohexanone compound.

Abstract: A silacyclohexane compound represented by the following general formula (I): ##STR1## wherein R denotes a mono- or di-fluoroalkyl group with 1-10 carbons: ##STR2## denotes a trans-1-silacyclohexylene or a trans-4-silacyclohexylene group whose silicon at position 1 or position 4 has a substitutional group of H, F, Cl or CH.sub.3 ;X denotes a CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, (O).sub.3 CY.sub.1 .dbd.CX.sub.1 X.sub.2 (X.sub.1 and Y.sub.1 denote H, F or Cl, and X.sub.2 denotes F or Cl) (O).sub.3 C.sub.p H.sub.q F.sub.r (p denotes 2, 3 or 4, and q and r are integers which satisfy the equation q+r=2p+1, and s denotes 0 or 1), the aforementioned R, or an alkyl or alkoxy group with 1-5 carbons;Y denotes H or F; andZ denotes H or F;and process of manufacturing same.

Abstract: Silacyclohexane compounds of the following formula (I) or (II) along with intermediate compounds therefor are described ##STR1## wherein R is an organic residue, one of ##STR2## represents a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group having a substituent of H, F, Cl or CH.sub.3, and the other represents a trans-1,4-cyclohexylene group, or such a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group as defined above, n is 0 or 1, L.sub.1 represents H or F, L.sub.2 represents H, F or Cl, and Z represents CN, F, Cl or an organic residue, and ##STR3## The processes for preparing the compounds (I) and (II) are also described along with liquid crystal compositions comprising the compounds and the liquid crystal devices comprising the compositions.

Abstract: A silacyclohexane compound of the following formula (I) ##STR1## wherein R is an unsubstituted or substituted organic residue, W is H, F, Cl or methyl, X is CN, F, Cl or an unsubstituted or substituted organic residue, and Y and Z independently represent H, F or Cl. The silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.

Abstract: A silacyclohexanone compound represented by the following general formula (I). ##STR1## wherein Ar denotes a phenyl group or a tolyl group. R denotes a tolyl group, a linear-chain alkyl group with a carbon number of 2-10, a mono- or di-fluoroalkyl group with a carbon number of 1-10, a branched-chain alkyl group with a carbon number of 3-8 or an alkoxyalkyl group with a carbon number of 2-7. Also, a method of manufacturing silacyclohexane-type liquid crystal compounds represented by the general formula (II) ##STR2## and the general formula (III) ##STR3## which are derived from this compound.

Abstract: A silacyclohexane compound of the following formula (I) or (II) ##STR1## wherein R is an organic residue, ##STR2## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, L.sub.1 and L.sub.2 independently represent H, F, Cl or CH.sub.3 ; and X represents an organic residue, CN, F or Cl, or ##STR3## wherein R, L.sub.1, L.sub.2 and X are, respectively, as defined above, and at least one of ##STR4## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, and the other may be a trans-1,4-cyclohexylene group. The preparation of these compounds is described along with a composition comprising the compound (I) and/or (II) and a display device comprising the composition.

Abstract: A silacyclohexane compound of the following formula (I) ##STR1## wherein R represents an organic residue; ##STR2## represents a trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group having a substituent of H, F, Cl or CH.sub.3 ; L.sub.1 represents F, L.sub.2 and L.sub.3 independently represent H, F, Cl or CH.sub.3 ; X represents an organic residue, F or Cl; and n is an integer of 0, 1, or 2 and a and b are, respectively, 0 or 1 provided that a+b=1. Silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.