Patents by Inventor Myung-Hun Yang

Myung-Hun Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist supply apparatus capable of controlling flow length of photoresist and method of supplying photoresist using the same
    Patent number: 6817486
    Abstract: A photoresist supply apparatus and a method of supplying photoresist using the same are provided. The photoresist supply apparatus includes a flow length measurer for measuring the flow length of photoresist remaining at the tip of a nozzle unit; a measured data processor for converting data measured by the flow length measurer into an electrical signal; and a valve controller for finely controlling the flow length of photoresist by controlling the amount of air flowing into an automatic on/off valve in response to the electrical signal fed back from the measured data processor. Accordingly, by measuring the flow length of photoresist at the tip of nozzle unit in real time and feeding back the measured flow length, a faulty process due to an irregular flow length of photoresist can be prevented, and a fixed amount of photoresist can be ejected.
    Type: Grant
    Filed: September 10, 2002
    Date of Patent: November 16, 2004
    Assignee: Nano Fa Co., Ltd.
    Inventor: Myung-Hun Yang
  • Photoresist supply apparatus capable of controlling flow length of photoresist and method of supplying photoresist using the same
    Publication number: 20030047136
    Abstract: A photoresist supply apparatus and a method of supplying photoresist using the same are provided. The photoresist supply apparatus includes a flow length measurer for measuring the flow length of photoresist remaining at the tip of a nozzle unit; a measured data processor for converting data measured by the flow length measurer into an electrical signal; and a valve controller for finely controlling the flow length of photoresist by controlling the amount of air flowing into an automatic on/off valve in response to the electrical signal fed back from the measured data processor. Accordingly, by measuring the flow length of photoresist at the tip of nozzle unit in real time and feeding back the measured flow length, a faulty process due to an irregular flow length of photoresist can be prevented, and a fixed amount of photoresist can be ejected.
    Type: Application
    Filed: September 10, 2002
    Publication date: March 13, 2003
    Inventor: Myung-Hun Yang