Abstract: A patterning slit sheet assembly to perform a deposition process to deposit a thin film on a substrate in a fine pattern. A patterning slit sheet assembly includes a patterning slit sheet including a slit unit, and a non-slit region that is located along edges of the slit unit, the patterning slit sheet being smaller than the substrate in at least one of a first direction or a second direction perpendicular to the first direction; a frame combined with the patterning slit sheet to support the patterning slit sheet; and a shielding unit extending on at least one inner side of the frame and overlapping an area including the edges of the slit unit.

Abstract: A thin film deposition apparatus is disclosed. In one embodiment, the apparatus includes i) a deposition source configured to discharge a deposition material, ii) a deposition source nozzle unit disposed at a side of the deposition source and comprising a plurality of deposition source nozzles arranged in a first direction and iii) a patterning slit sheet disposed opposite to the deposition source nozzle unit and comprising a plurality of patterning slits arranged in a second direction substantially perpendicular to the first direction. The patterning slit sheet may include: i) a base sheet, in which a plurality of sub-patterning slits are formed in the second direction and ii) a plurality of patterning bars disposed between adjacent sub-patterning slits to form the patterning slits. Further, the deposition apparatus is configured to perform deposition while the substrate is moved relative to the thin film deposition apparatus in the first direction.

Abstract: A deposition apparatus includes a deposition unit including a plurality of deposition assemblies, which are separated from a substrate at a predetermined distance and deposit a material onto the substrate while a first transfer unit transfers the substrate. Each of the plurality of deposition assemblies includes a patterning slit sheet facing a deposition source nozzle unit, a positional information obtaining unit obtaining positional information regarding a position of the substrate transferred by the first transfer unit, and a sheet stage adjusting a position of the patterning slit sheet with respect to the substrate transferred by the first transfer unit according to the positional information.

Abstract: A thin film deposition apparatus includes: a chamber; a mask stage in the chamber and configured to support a mask; a jig in the chamber and above the mask stage, the jig being configured to move in a direction of the mask stage; and a rail in the chamber and configured to support the movement of the jig. Another thin film deposition apparatus includes a chamber, a mask stage positioned within the chamber and configured to support a mask, a camera part proximate to a side of the mask stage, and a jig above the mask stage and configured to move in a direction of the mask stage and over the camera part. The jig is further configured to radiate laser beams in a downward direction from the jig to obtain first scanning data regarding the mask stage and second scanning data regarding the camera part.

Abstract: A thin film deposition apparatus that may prevent a patterning slit sheet from sagging and increase a tensile force of the patterning slit sheet, and a method of manufacturing an organic light-emitting display device using the same.

Abstract: Provided are a method of preparing iron oxide nanoparticles, iron oxide nanoparticles prepared thereby, and an anode material including the iron oxide nanoparticles.

Abstract: A patterning slit sheet assembly for performing a deposition process to form a thin film on a substrate in a desired fine pattern. The patterning slit sheet assembly includes a patterning slit sheet having a plurality of slits, a frame combined with the patterning slit sheet to support the patterning slit sheet, and a support unit including an upper member that is allowed to be moved or fixed to support the patterning slit sheet when a gravitational force is applied to the patterning slit sheet and a lower member disposed more apart from the patterning slit sheet than the upper member, wherein the upper member is fixed on the lower member.

Abstract: A patterning slit sheet assembly for performing a deposition process to form a thin film on a substrate in a desired fine pattern. The patterning slit sheet assembly includes a patterning slit sheet having a plurality of slits, a frame combined with the patterning slit sheet to support the patterning slit sheet, and a support unit including an upper member that is allowed to be moved or fixed to support the patterning slit sheet when a gravitational force is applied to the patterning slit sheet and a lower member disposed more apart from the patterning slit sheet than the upper member, wherein the upper member is fixed on the lower member.

Abstract: An organic layer deposition assembly, an organic layer deposition apparatus, an organic light-emitting display apparatus, and a method of manufacturing the organic light-emitting display apparatus, in order to improve a characteristic of a deposited layer, the organic layer deposition assembly including a deposition source for discharging a deposition material; a deposition source nozzle unit disposed at a side of the deposition source, and including a plurality of deposition source nozzles; and a patterning slit sheet disposed while facing the deposition source nozzle unit, and including a plurality of patterning slits and one or more alignment confirmation pattern slits that are formed at edge portions of the plurality of patterning slits, wherein the deposition material that is discharged from the deposition source passes through the patterning slit sheet and then is formed on the substrate, while a deposition process is performed.

Abstract: An organic layer deposition apparatus capable of protecting or preventing a patterning slit sheet from sagging, and a frame sheet assembly for the organic layer deposition apparatus.

Abstract: A patterning slit sheet assembly to perform a deposition process to deposit a thin film on a substrate in a fine pattern. A patterning slit sheet assembly includes a patterning slit sheet including a slit unit, and a non-slit region that is located along edges of the slit unit, the patterning slit sheet being smaller than the substrate in at least one of a first direction or a second direction perpendicular to the first direction; a frame combined with the patterning slit sheet to support the patterning slit sheet; and a shielding unit extending on at least one inner side of the frame and overlapping an area including the edges of the slit unit.

Abstract: A patterning slit sheet assembly for performing a deposition process to form a thin film on a substrate in a desired fine pattern. The patterning slit sheet assembly includes a patterning slit sheet having a plurality of slits, a frame combined with the patterning slit sheet to support the patterning slit sheet, and a support unit including an upper member that is allowed to be moved or fixed to support the patterning slit sheet when a gravitational force is applied to the patterning slit sheet and a lower member disposed more apart from the patterning slit sheet than the upper member, wherein the upper member is fixed on the lower member.

Abstract: An organic layer deposition apparatus including: a deposition source configured to discharge a deposition material; a deposition source nozzle unit arranged at a side of the deposition source and including a plurality of deposition source nozzles; a patterning slit sheet facing the deposition source nozzle unit and including a plurality of patterning slits, the patterning slit sheet being smaller than the substrate in at least one of a first direction or a second direction perpendicular to the first direction; a blocking member configured to be disposed between the substrate and the deposition source to block at least a portion of the substrate; and a heating member on the blocking member and configured to heat the blocking member, and the substrate is spaced apart from the organic layer deposition apparatus by a predetermined distance, and the substrate or the organic layer deposition apparatus is movable relative to the other.

Abstract: A thin film deposition apparatus is disclosed. In one embodiment, the apparatus includes i) a deposition source configured to discharge a deposition material, ii) a deposition source nozzle unit disposed at a side of the deposition source and comprising a plurality of deposition source nozzles arranged in a first direction and iii) a patterning slit sheet disposed opposite to the deposition source nozzle unit and comprising a plurality of patterning slits arranged in a second direction substantially perpendicular to the first direction. The patterning slit sheet may include: i) a base sheet, in which a plurality of sub-patterning slits are formed in the second direction and ii) a plurality of patterning bars disposed between adjacent sub-patterning slits to form the patterning slits. Further, the deposition apparatus is configured to perform deposition while the substrate is moved relative to the thin film deposition apparatus in the first direction.

Abstract: A thin film deposition apparatus that may prevent a patterning slit sheet from sagging and increase a tensile force of the patterning slit sheet, and a method of manufacturing an organic light-emitting display device using the same.

Abstract: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

Abstract: The present inventive concept provides a substrate treating apparatus and an exposing apparatus that a chuck member, a chuck cleaning member including a cleaning tool removing a foreign substance on a substrate loading surface of the chuck member and a tool cleaning member cleaning a cleaning tool are disposed to be adjacent to each other inside a treating room. The present inventive concept also provides a method of cleaning a cleaning tool using a tool cleaning member. According to the above the apparatuses and the method, contamination of a chuck member by a cleaning tool is prevented and a defocus phenomenon caused by a particle on a chuck member during an exposing process can be minimized.

Abstract: A PSK modulator employs a waveform of the overlapped raised cosine type which results in reduced adjacent channel interference. Waveforms of the overlapped raised cosine type include the overlapped raised cosine waveform itself as well as waveforms substantially similar thereto. Such waveforms can be produced, in a PSK modulator, by employing a Thomson filter with a single attenuation pole. Employing such a filter with a time bandwidth product (BT) of 1.2 provides the overlapped raised cosine waveform. However, changing the Thomson filter's BT product to 1.0 to thereby generate a waveform of the overlapped raised cosine type provides even further improvements in adjacent channel interference.