Patents by Inventor Nagayoshi Ichikawa

Nagayoshi Ichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8731131
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: May 20, 2014
    Assignees: Kabushiki Kaisha Toshiba, Ishikawajima-Harima Heavy Industries Co., Ltd., The Tokyo Electric Power Company, Incorporated
    Inventors: Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Patent number: 8731132
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: May 20, 2014
    Assignees: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Company, Incorporated
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Patent number: 8681925
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: March 25, 2014
    Assignees: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Company, Incorporated
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Patent number: 8440876
    Abstract: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.
    Type: Grant
    Filed: February 6, 2007
    Date of Patent: May 14, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masami Enda, Nagayoshi Ichikawa, Masayuki Kaneda, Takeshi Kanasaki, Toshihiro Yoshii, Yumi Yaita, Ichiro Inami
  • Publication number: 20130070888
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 21, 2013
    Applicants: KABUSHIKI KAISHA TOSHIBA, THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD.
    Inventors: Seiji YAMAMOTO, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Patent number: 8320514
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: November 27, 2012
    Assignees: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Company, Incorporated
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Patent number: 8295426
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: October 23, 2012
    Assignees: Kabushiki Kaisha Toshiba, Ishikawajima-Harima Heavy Industries Co., Ltd., The Tokyo Electric Power Company, Incorporated
    Inventors: Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Publication number: 20120263269
    Abstract: In a method of reducing corrosion of a material constituting a nuclear reactor structure, an electrochemical corrosion potential is controlled by injecting a solution or a suspension containing a substance generating an excitation current by an action of at least one of radiation, light, and heat existing in a nuclear reactor, or a metal or a metallic compound forming the substance generating the excitation current under the condition in the nuclear reactor to allow the substance generating the excitation current to adhere to the surface of the nuclear reactor structural material, and by injecting hydrogen in cooling water of the nuclear reactor while controlling the hydrogen concentration in a feed water.
    Type: Application
    Filed: December 10, 2004
    Publication date: October 18, 2012
    Applicants: Kabushiki Kaisha Toshiba, THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Ishikawajima-Harima Heavy Industries Co., Ltd.
    Inventors: Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Tetsuo Oosato, Masato Okamura, Junichi Takagi, Kenji Yamazaki, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Takeshi Shibano, Takashi Hirano, Yuichi Fukaya
  • Publication number: 20120128886
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Applicants: THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Kabushiki Kaisha Toshiba
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Publication number: 20120128111
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Applicants: THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED, Kabushiki Kaisha Toshiba
    Inventors: Masato OKAMURA, Tetsuo OOSATO, Seiji YAMAMOTO, Tadasu YOTSUYANAGI, Nagayoshi ICHIKAWA, Kenji YAMAZAKI, Junichi TAKAGI, Hidehiro URATA, Shunichi SUZUKI, Kenro TAKAMORI, Junichi SUZUKI
  • Publication number: 20100168497
    Abstract: A chemical decontamination apparatus of the present invention chemically dissolves radioactive substance-containing oxide films formed or adhering on the surface of a decontamination object by using ozone water to conduct decontamination. The chemical decontamination apparatus includes an ozone generating unit for generating ozone gas, an ozone supplying device for supplying the generated ozone gas to an ozone supplying unit in water, and a sintered metal element 37 which is disposed in the ozone supplying unit and to which ozone gas is supplied from the ozone supplying device. The ozone gas supplied to a sintered metal element interior from the ozone supplying device is allowed to flow out of the element into water so as to generate ozone water.
    Type: Application
    Filed: February 6, 2007
    Publication date: July 1, 2010
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masami Enda, Nagayoshi Ichikawa, Masayuki Kaneda, Takeshi Kanasaki, Toshihiro Yoshii, Yumi Yaita, Ichiro Inami
  • Patent number: 7449101
    Abstract: In a method of reducing corrosion of a metal material, a substance such as semiconductor for generating an electric current by thermal excitation is coated or adhered on a metal material surface, to be exposed to a water having a high temperature of 150° C. or more, of a boiler and ducts or pipes, to which hot water heated by the boiler contacts, of a thermal electric power plant or a nuclear reactor structural material or ducts or pipes surrounding the reactor in a nuclear power plant.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: November 11, 2008
    Assignees: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Company, Incorporated, Ishikawajima - Harima Heavy Industries Co., Ltd.
    Inventors: Masato Okamura, Yukio Henmi, Nagayoshi Ichikawa, Tetsuo Oosato, Seiji Yamamoto, Kazuo Murakami, Kenji Yamazaki, Junichi Takagi, Tadasu Yotsuyanagi, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Yuichi Fukaya, Takasi Hirano
  • Patent number: 7346140
    Abstract: A photocatalytic substance having the properties of an n-type semiconductor is deposited on a surface of a metal base made of a stainless steel or Inconel. When necessary, the hydrogen concentration of the reactor water is increased. A current produced by the photocatalytic substance when the same is irradiated with light or radioactive rays in a nuclear reactor flows through the metal base to reduce corrosion current. When necessary, the photocatalytic substance is provided on its surface with at least one of Pt, Rh, Ru and Pd.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: March 18, 2008
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Nagayoshi Ichikawa, Yukio Hemmi, Tetsuo Oosato, Junichi Takagi, Kenji Yamazaki
  • Publication number: 20060146975
    Abstract: In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
    Type: Application
    Filed: December 8, 2005
    Publication date: July 6, 2006
    Applicants: Kabushiki Kaisha Toshiba, THE TOKYO ELECTRIC POWER COMPANY, INCORPORATED
    Inventors: Masato Okamura, Tetsuo Oosato, Seiji Yamamoto, Tadasu Yotsuyanagi, Nagayoshi Ichikawa, Kenji Yamazaki, Junichi Takagi, Hidehiro Urata, Shunichi Suzuki, Kenro Takamori, Junichi Suzuki
  • Publication number: 20060050833
    Abstract: A photocatalytic substance having the properties of an n-type semiconductor is deposited on a surface of a metal base made of a stainless steel or Inconel. When necessary, the hydrogen concentration of the reactor water is increased. A current produced by the photocatalytic substance when the same is irradiated with light or radioactive rays in a nuclear reactor flows through the metal base to reduce corrosion current. When necessary, the photocatalytic substance is provided on its surface with at least one of Pt, Rh, Ru and Pd.
    Type: Application
    Filed: June 27, 2005
    Publication date: March 9, 2006
    Inventors: Nagayoshi Ichikawa, Yukio Hemmi, Tetsuo Oosato, Junichi Takagi, Kenji Yamazaki
  • Patent number: 6940939
    Abstract: A photocatalytic substance having the properties of an n-type semiconductor is deposited on a surface of a metal base made of a stainless steel or Inconel. When necessary, the hydrogen concentration of the reactor water is increased. A current produced by the photocatalytic substance when the same is irradiated with light or radioactive rays in a nuclear reactor flows through the metal base to reduce corrosion current. When necessary, the photocatalytic substance is provided on its surface with at least one of Pt, Rh, Ru and Pd.
    Type: Grant
    Filed: June 22, 2000
    Date of Patent: September 6, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Nagayoshi Ichikawa, Yukio Hemmi, Tetsuo Oosato, Junichi Takagi, Kenji Yamazaki
  • Publication number: 20030180180
    Abstract: In a method of reducing corrosion of a metal material, a substance such as semiconductor for generating an electric current by thermal excitation is coated or adhered on a metal material surface, to be exposed to a water having a high temperature of 150° C. or more, of a boiler and ducts or pipes, to which hot water heated by the boiler contacts, of a thermal electric power plant or a nuclear reactor structural material or ducts or pipes surrounding the reactor in a nuclear power plant.
    Type: Application
    Filed: February 5, 2003
    Publication date: September 25, 2003
    Applicants: Kabushiki Kaisha Toshiba, The Tokyo Electric Power Co. Inc., Ishikawajima-Harima Heavy Industries Co., Ltd.
    Inventors: Masato Okamura, Yukio Henmi, Nagayoshi Ichikawa, Tetsuo Oosato, Seiji Yamamoto, Kazuo Murakami, Kenji Yamazaki, Junichi Takagi, Tadasu Yotsuyanagi, Shunichi Suzuki, Kenro Takamori, Mitsuru Sambongi, Yuichi Fukaya, Takasi Hirano
  • Patent number: 6137854
    Abstract: There is provided a reactor control rod which is capable of suppressing an excessive frictional force acting on passive state oxide films formed on the surfaces of neutron absorber elements, and also reducing the possibility to cause electrochemical problems, and a method of manufacturing the same. The reactor control rod comprises a wing having a sheath which has a substantially U-shaped cross-section. A top end structure is secured to a longitudinal top end of the sheath. A bottom end structure is secured to a longitudinal bottom end of the sheath. An opening portion of the sheath is secured to a central structure. A neutron absorber element is made of neutron absorbing material. The neutron absorber element is charged in the sheath. A supporting rod through hole is formed in the neutron absorber element, so as to penetrate the neutron absorber element. A supporting rod fitting hole is formed in the sheath. A load supporting rod is inserted into the supporting rod through hole.
    Type: Grant
    Filed: October 16, 1998
    Date of Patent: October 24, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Makoto Ueda, Shinichi Ishizato, Satoko Tajima, Nagayoshi Ichikawa, Masato Takahashi