Abstract: Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.

Abstract: A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.

Abstract: Embodiments of exhaust liner systems are provided herein. In some embodiments, an exhaust liner system for use in a process chamber includes a lower exhaust liner having an annular body with a central opening; an upper flange, a central flange, and a lower flange extending outward from the annular body, wherein the lower flange and the central flange partially define a first plenum, and wherein the central flange and the upper flange partially define a second plenum; a plurality of exhaust holes from the central opening to the first plenum; and at least one cutout in the central flange to provide a flow path from the first plenum to the second plenum, wherein the lower exhaust liner defines a gas flow path from the central opening to the first plenum via the plurality of exhaust holes and from the first plenum to the second plenum via the least one cutout.

Abstract: Embodiments disclosed herein relate to a thermal processing chamber having a substrate monitoring system. In one embodiment, a temperature monitoring system is disclosed herein. The temperature monitoring system includes a housing and a window defining an interior volume. The temperature monitoring system further includes two or more light sources, a camera, and a polarizer. The two or more light sources are disposed in the interior volume, beneath the window. A first light source of the two or more light sources has a first wavelength. A second light source of the two or more light sources has a second wavelength. A camera is disposed opposite the two or more light sources. The camera to captures a plurality of frames of two or more light beams received from the two or more light sources. The polarizer disposed in an optical path of the two or more light beams.

Abstract: Embodiments disclosed herein relate to a thermal processing chamber having a substrate monitoring system. In one embodiment, a temperature monitoring system is disclosed herein. The temperature monitoring system includes a housing and a window defining an interior volume. The temperature monitoring system further includes two or more light sources, a camera, and a polarizer. The two or more light sources are disposed in the interior volume, beneath the window. A first light source of the two or more light sources has a first wavelength. A second light source of the two or more light sources has a second wavelength. A camera is disposed opposite the two or more light sources. The camera to captures a plurality of frames of two or more light beams received from the two or more light sources. The polarizer disposed in an optical path of the two or more light beams.