Patents by Inventor Nandish Desai
Nandish Desai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11000696Abstract: The invention comprises a method and apparatus for scanning charged particles in a cancer therapy system, comprising the steps of: (1) providing a first and second dipole magnet system and a gap, the gap comprising a common gap length, along a path of the charged particles, within both the first and second dipole magnet systems, the gap comprising a progressively increasing x/y-plane cross-section area from an entrance area of the charged particles into the double dipole magnet system to an exit area of the double dipole magnet system, the x/y-plane perpendicular to a z-axis from a center of the entrance area to a center of the exit area; (2) scanning the positively charged particles along a first axis of the x/y-plane using the first dipole magnet system; and (3) scanning the positively charged particles along a second axis of the x/y-plane using the second dipole magnet system.Type: GrantFiled: October 15, 2019Date of Patent: May 11, 2021Inventors: Faye Hendley Elgart, Nick Ruebel, Mark R. Amato, Nandish Desai, W. Davis Lee
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Patent number: 10801125Abstract: An apparatus for controlling heat flow within a melt. The apparatus may include a crucible configured to contain the melt where the melt has an exposed surface. The apparatus may also include a heater disposed below a first side of the crucible and configured to supply heat through the melt to the exposed surface, and a heat diffusion barrier assembly comprising at least one heat diffusion barrier disposed within the crucible and defining an isolation region in the melt and an outer region in the melt.Type: GrantFiled: July 16, 2019Date of Patent: October 13, 2020Inventors: Peter L. Kellerman, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai
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Publication number: 20200038681Abstract: The invention comprises a method and apparatus for scanning charged particles in a cancer therapy system, comprising the steps of: (1) providing a first and second dipole magnet system and a gap, the gap comprising a common gap length, along a path of the charged particles, within both the first and second dipole magnet systems, the gap comprising a progressively increasing x/y-plane cross-section area from an entrance area of the charged particles into the double dipole magnet system to an exit area of the double dipole magnet system, the x/y-plane perpendicular to a z-axis from a center of the entrance area to a center of the exit area; (2) scanning the positively charged particles along a first axis of the x/y-plane using the first dipole magnet system; and (3) scanning the positively charged particles along a second axis of the x/y-plane using the second dipole magnet system.Type: ApplicationFiled: October 15, 2019Publication date: February 6, 2020Inventors: Faye Hendley Elgart, Nick Ruebel, Mark R. Amato, Nandish Desai, W. Davis Lee
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Publication number: 20190351258Abstract: The invention comprises a method and apparatus for steering/scanning charged particles, comprising: a double dipole scanning system, comprising: (1) a beam path chamber comprising an entrance side and an exit side, the entrance side comprising a smaller area than the exit side; (2) a first dipole magnet, the first dipole magnet comprising a first coil and a third coil on first opposite sides of the beam path chamber; and (3) a second dipole magnet, the second dipole magnet comprising a second coil and a fourth coil on second opposite sides of the beam path chamber, the beam path chamber further comprising a truncated square/rectangle pyramid shape, the smaller entrance side of the charged particles comprising a top of the truncated pyramid shape, the exit side of the charged particles comprising a larger bottom of the truncated pyramid shape.Type: ApplicationFiled: July 30, 2019Publication date: November 21, 2019Inventors: Faye Hendley Elgart, Nick Ruebel, Mark R. Amato, Nandish Desai, W. Davis Lee
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Publication number: 20190338442Abstract: An apparatus for controlling heat flow within a melt. The apparatus may include a crucible configured to contain the melt where the melt has an exposed surface. The apparatus may also include a heater disposed below a first side of the crucible and configured to supply heat through the melt to the exposed surface, and a heat diffusion barrier assembly comprising at least one heat diffusion barrier disposed within the crucible and defining an isolation region in the melt and an outer region in the melt.Type: ApplicationFiled: July 16, 2019Publication date: November 7, 2019Inventors: Peter L. Kellerman, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai
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Publication number: 20190284715Abstract: An apparatus for controlling heat flow within a melt. The apparatus may include a crucible configured to contain the melt where the melt has an exposed surface. The apparatus may also include a heater disposed below a first side of the crucible and configured to supply heat through the melt to the exposed surface, and a heat diffusion barrier assembly comprising at least one heat diffusion barrier disposed within the crucible and defining an isolation region in the melt and an outer region in the melt.Type: ApplicationFiled: March 27, 2014Publication date: September 19, 2019Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: Peter L. Kellerman, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai
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Patent number: 10415151Abstract: An apparatus for controlling heat flow within a melt. The apparatus may include a crucible configured to contain the melt where the melt has an exposed surface. The apparatus may also include a heater disposed below a first side of the crucible and configured to supply heat through the melt to the exposed surface, and a heat diffusion barrier assembly comprising at least one heat diffusion barrier disposed within the crucible and defining an isolation region in the melt and an outer region in the melt.Type: GrantFiled: March 27, 2014Date of Patent: September 17, 2019Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INCInventors: Peter L. Kellerman, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai
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Patent number: 10030317Abstract: An apparatus may include a crucible configured to contain the melt, the melt having an exposed surface separated from a floor of the crucible by a first distance, a housing comprising a material that is non-contaminating to the melt, the housing comprising a plurality of sidewalls and a top that are configured to contact the melt, and a plurality of heating elements isolated from the melt and disposed along a transverse direction perpendicular to a pulling direction of the crystalline sheet, the plurality of heating elements being individually powered, wherein the plurality of heating elements are disposed at a second set of distances from the exposed surface of the melt that are less than the first distance, and wherein the plurality of heating elements are configured to vary a heat flux profile along the transverse direction when power is supplied individually to the plurality of heating elements.Type: GrantFiled: October 17, 2014Date of Patent: July 24, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Peter L. Kellerman, Frederick M. Carlson, David Morrell, Brian Mackintosh, Nandish Desai
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Patent number: 9957636Abstract: A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.Type: GrantFiled: March 27, 2014Date of Patent: May 1, 2018Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: Peter L. Kellerman, Brian Mackintosh, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai, Dawei Sun, Frank Sinclair
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Publication number: 20180104510Abstract: The invention comprises a method and apparatus for scanning charged particles in a cancer therapy system, comprising the steps of: (1) providing a first and second dipole magnet system and a gap, the gap comprising a common gap length, along a path of the charged particles, within both the first and second dipole magnet systems, the gap comprising a progressively increasing x/y-plane cross-section area from an entrance area of the charged particles into the double dipole magnet system to an exit area of the double dipole magnet system, the x/y-plane perpendicular to a z-axis from a center of the entrance area to a center of the exit area; (2) scanning the positively charged particles along a first axis of the x/y-plane using the first dipole magnet system; and (3) scanning the positively charged particles along a second axis of the x/y-plane using the second dipole magnet system.Type: ApplicationFiled: December 19, 2017Publication date: April 19, 2018Inventors: Faye Hendley Elgart, Nick Ruebel, Mark R. Amato, Nandish Desai, W. Davis Lee
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Publication number: 20180099156Abstract: The invention comprises a method and apparatus for steering/scanning charged particles, comprising: a double dipole scanning system, comprising: (1) a beam path chamber comprising an entrance side and an exit side, the entrance side comprising a smaller area than the exit side; (2) a first dipole magnet, the first dipole magnet comprising a first coil and a third coil on first opposite sides of the beam path chamber; and (3) a second dipole magnet, the second dipole magnet comprising a second coil and a fourth coil on second opposite sides of the beam path chamber, the beam path chamber further comprising a truncated square/rectangle pyramid shape, the smaller entrance side of the charged particles comprising a top of the truncated pyramid shape, the exit side of the charged particles comprising a larger bottom of the truncated pyramid shape.Type: ApplicationFiled: December 11, 2017Publication date: April 12, 2018Inventors: Faye Hendley Elgart, Nick Ruebel, Mark R. Amato, Nandish Desai, W. Davis Lee
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Publication number: 20180047864Abstract: A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.Type: ApplicationFiled: March 27, 2014Publication date: February 15, 2018Applicant: Varian Semiconductor Equipment Associates, Inc.Inventors: Peter L. Kellerman, Brian Mackintosh, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai, Dawei Sun, Frank Sinclair
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Patent number: 9587324Abstract: An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.Type: GrantFiled: May 12, 2014Date of Patent: March 7, 2017Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Frederick M. Carlson, Peter L. Kellerman, David Morrell, Brian Mackintosh, Nandish Desai
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Publication number: 20160108549Abstract: An apparatus may include a crucible configured to contain the melt, the melt having an exposed surface separated from a floor of the crucible by a first distance, a housing comprising a material that is non-contaminating to the melt, the housing comprising a plurality of sidewalls and a top that are configured to contact the melt, and a plurality of heating elements isolated from the melt and disposed along a transverse direction perpendicular to a pulling direction of the crystalline sheet, the plurality of heating elements being individually powered, wherein the plurality of heating elements are disposed at a second set of distances from the exposed surface of the melt that are less than the first distance, and wherein the plurality of heating elements are configured to vary a heat flux profile along the transverse direction when power is supplied individually to the plurality of heating elements.Type: ApplicationFiled: October 17, 2014Publication date: April 21, 2016Inventors: Peter L. Kellerman, Frederick M. Carlson, David Morrell, Brian Mackintosh, Nandish Desai
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Publication number: 20150322590Abstract: An apparatus for processing a melt may include a crucible configured to contain the melt, where the melt has an exposed surface that is separated from a floor of the crucible by a first distance. The apparatus may further include a submerged heater comprising a heating element and a shell disposed between the heating element and the melt, wherein the heating element does not contact the melt. The heating element may be disposed at a second distance with respect to the exposed surface of the melt that is less than the first distance.Type: ApplicationFiled: May 12, 2014Publication date: November 12, 2015Applicant: Varian Semiconductor Equipment Associates, Inc.Inventors: Frederick M. Carlson, Peter L. Kellerman, David Morrell, Brian Mackintosh, Nandish Desai