Abstract: A stage apparatus which can highly accurately measure the position of a stage, while achieving a high throughput, and an exposure apparatus provided with the stage apparatus. A stage apparatus is provided with: air-conditioning apparatuses (28X, 28Y) that supply temperature controlled air (down flow), which comes from a +Z direction to a ?Z direction, to a light path of a laser beam radiated from a laser interferometer onto moving mirrors (26X, 26Y) provided on a wafer stage (WST); and an air conditioning apparatus (29) that supplies temperature controlled air (lower layer side flow), which comes from a ?Y direction to a +Y direction, to a space lower than the light path of the laser beam. Furthermore, an air conditioning apparatus (34), which supplied temperature controlled air to a light path of an autofocusing sensor composed of an irradiation optical system (33a) and a light receiving optical system (33b), is provided.

Abstract: The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Abstract: The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Abstract: A scanning type exposure apparatus, which is used to expose a wafer with an image of a pattern on a reticle by synchronously moving the reticle and the wafer, comprises a second gas conditioner for circulating a temperature-controlled gas in a subsidiary chamber which encloses an optical path of an interferometer for measuring a position of a reticle stage. The apparatus comprises a third gas conditioner for supplying a temperature-controlled gas to an internal space of a pedestal including a wafer stage and an optical path of an interferometer for measuring a position of the wafer stage. A positional error of the stage, which would be otherwise caused by temperature-dependent fluctuation of the gas on the optical path of the interferometer, is reduced. A heat insulating material is installed on a top plate of the pedestal so as to intercept heat transfer from a heat source on the pedestal to the internal space of the pedestal.

Abstract: A gas turbine apparatus has a gas turbine and a plurality of burners for providing combustion gas to drive the turbine. A flow control means of each burner for fuel or combustion air is adjusted by control means to control each said burner individually in dependence on a predetermined combustion characteristic of the respective burner. Sensed quantities relating to the combustion performance of the burners are input to the control means which adjusts the flow control means of each burner in dependence on the sensed quantities and the predetermined combustion characteristic of the respective burner.

Abstract: A steam governing valve includes a valve body constituting a main valve together with a main valve seat formed on a casing body and having a smaller valve seat inside thereof, a valve rod movable in the valve body in an axial direction of the valve and constituting a smaller valve together with the smaller valve seat, a sleeve arranged in the casing body and guiding the valve body in an axial direction, and a pressure chamber defined by the casing body, the valve body and the sleeve. The pressure chamber communicates with an entrance chamber through a clearance provided on the sliding portions of the sleeve and valve body, and the main valve is opened by lifting the valve rod beyond the fully open position of the smaller valve. The valve body is formed on the cylindrical outer surface thereof with a plurality of axially extending grooves arranged at equal intervals in a circumferential direction.

Abstract: A fluid leakage detecting element comprises a heat generating resistive member and a temperature compensating resistive member disposed on a substrate. Each of the resistive members is prepared in the form of a paste of a metal which has a high temperature coefficient and a high thermal conductivity and whose melting point is higher than the baking temperature of the substrate. These resistive members are printed in thick film form on the substrate which is sufficiently electrical insulating and has a high thermal conductivity.