Patents by Inventor Naoki Hatakeyama
Naoki Hatakeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11935559Abstract: This magnetic disk device is a 3.5-inch magnetic disk device equipped with magnetic disks formed from an aluminum alloy substrate. The magnetic disks arranged in a stacked manner have a thickness Td of 0.3 mm to 0.6 mm, the number N of magnetic disks involved is 10 to 16, and spacers disposed between the magnetic disks have an outside diameter 2 Rso of 35 mm to 65 mm. The outside diameter 2 Rso (mm) of the spacers satisfies 2 Rso??60 Td+70 and 2 Rso??0.5 N2?+16.5 N?73.Type: GrantFiled: November 11, 2021Date of Patent: March 19, 2024Assignees: UACJ CORPORATION, FURUKAWA ELECTRIC CO., LTD.Inventors: Naoki Kitamura, Kotaro Kitawaki, Hideyuki Hatakeyama, Ryohei Yamada, Toshihiro Nakamura
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Patent number: 11247630Abstract: Problem: To provide a side airbag apparatus which can prevent the deterioration of the neck damage value of a passenger during a side collision or sufficiently protect the waist of the passenger. Resolution Means: A side airbag apparatus 100 installed in a vehicle, including: a bag shaped cushion 114 which is housed in a seat back 104 of a vehicle seat 102 and expanded and deployed on the side of the vehicle seat utilizing gas supplied from an inflator 116; and a holding part 128 for retaining the shape in the housed state of the cushion, wherein the cushion is wound or folded in a long shape in the vertical direction of the vehicle and housed in the seat back in the shape with the upper part 126 thereof further folded back to the anterior of the vehicle, and wherein the holding part retains the upper part or lower part of the cushion which is folded back to the anterior of the vehicle.Type: GrantFiled: January 5, 2018Date of Patent: February 15, 2022Assignee: Autoliv Development ABInventors: Yuto Kobayashi, Makoto Fuma, Naoki Hatakeyama, Shotetsu Sen
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Patent number: 10766450Abstract: A side airbag device including an airbag (2); an inflator (3); and an inner tube (4) formed of a fabric and covering discharge holes (3a) of the inflator (3). The inner tube (4) protrudes toward a center of the airbag (2) in a deployed state and a first end (4b) is closed in the direction of gas discharge, and second ends (4c) that are in a vehicle height direction of the airbag (2) in the deployed state are open. The inner tube (4) is folded back at a folded-back portion (4d) inside the airbag (2) when the airbag (2) is folded in a case where the side airbag device is installed in a vehicle seat back.Type: GrantFiled: January 6, 2015Date of Patent: September 8, 2020Assignee: AUTOLIV DEVELOPMENT ABInventors: Naoki Hatakeyama, Atsushi Murai
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Patent number: 10618491Abstract: A side airbag device including: a bag-shaped airbag that deploys from a lateral portion of a vehicle seat toward a front side of a vehicle; and an inflator that supplies inflation gas into the airbag. The airbag has, at least at a lower portion thereof, a lower tuck-in region tucked into the airbag. Further, at least a part of the lower tuck-in region is folded into a fan shape and forms a radial folded region folded into a pleated shape along a line extending rearward in a radial direction from a central point of the fan shape positioned on a front side of the airbag.Type: GrantFiled: November 25, 2016Date of Patent: April 14, 2020Assignee: AUTOLIV DEVELOPMENT ABInventors: Naoki Hatakeyama, Atsushi Murai
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Publication number: 20190375365Abstract: Problem: To provide a side airbag apparatus which can prevent the deterioration of the neck damage value of a passenger during a side collision or sufficiently protect the waist of the passenger. Resolution Means: A side airbag apparatus 100 installed in a vehicle, including: a bag shaped cushion 114 which is housed in a seat back 104 of a vehicle seat 102 and expanded and deployed on the side of the vehicle seat utilizing gas supplied from an inflator 116; and a holding part 128 for retaining the shape in the housed state of the cushion, wherein the cushion is wound or folded in a long shape in the vertical direction of the vehicle and housed in the seat back in the shape with the upper part 126 thereof further folded back to the anterior of the vehicle, and wherein the holding part retains the upper part or lower part of the cushion which is folded back to the anterior of the vehicle.Type: ApplicationFiled: January 5, 2018Publication date: December 12, 2019Inventors: Yuto KOBAYASHI, Makoto FUMA, Naoki HATAKEYAMA, Shotetsu SEN
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Patent number: 10369957Abstract: A side airbag for enhancing protection of a shoulder area of a vehicle occupant having an airbag (10) which deploys beside an occupant toward the vehicle front, and an inflator (20). Before deploying, the airbag (10) is in a state having: an overlapping part (12) formed by overlapping a portion near an end part by accordion-folding or rolling; a folded-back part (14) on an inner side of the overlapping part (12) in a vehicle width direction and extended toward the front of the vehicle and folded back toward the rear of the vehicle; and a bent part (16) formed by bending a portion of the folded-back part (14), protruding from the overlapping part (12) toward the front of the vehicle toward an outer side in the vehicle width direction and covering at least part of the overlapping part (12).Type: GrantFiled: July 28, 2015Date of Patent: August 6, 2019Assignee: AUTOLIV DEVELOPMENT ABInventors: Naoki Hatakeyama, Keita Eguchi, Yuto Kobayashi
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Publication number: 20190084515Abstract: A side airbag device including: a bag-shaped airbag that deploys from a lateral portion of a vehicle seat toward a front side of a vehicle; and an inflator that supplies inflation gas into the airbag. The airbag has, at least at a lower portion thereof, a lower tuck-in region tucked into the airbag. Further, at least a part of the lower tuck-in region is folded into a fan shape and forms a radial folded region folded into a pleated shape along a line extending rearward in a radial direction from a central point of the fan shape positioned on a front side of the airbag.Type: ApplicationFiled: November 25, 2016Publication date: March 21, 2019Applicant: AUTOLIV DEVELOPMENT ABInventors: NAOKI HATAKEYAMA, ATSUSHI MURAI
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Publication number: 20170274861Abstract: A side airbag for enhancing protection of a shoulder area of a vehicle occupant having an airbag (10) which deploys beside an occupant toward the vehicle front, and an inflator (20). Before deploying, the airbag (10) is in a state having: an overlapping part (12) formed by overlapping a portion near an end part by accordion-folding or rolling; a folded-back part (14) on an inner side of the overlapping part (12) in a vehicle width direction and extended toward the front of the vehicle and folded back toward the rear of the vehicle; and a bent part (16) formed by bending a portion of the folded-back part (14), protruding from the overlapping part (12) toward the front of the vehicle toward an outer side in the vehicle width direction and covering at least part of the overlapping part (12).Type: ApplicationFiled: July 28, 2015Publication date: September 28, 2017Inventors: Naoki Hatakeyama, Keita Eguchi, Yuto Kobayashi
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Publication number: 20170001594Abstract: A side airbag device including an airbag (2); an inflator (3); and an inner tube (4) formed of a fabric and covering discharge holes (3a) of the inflator (3). The inner tube (4) protrudes toward a center of the airbag (2) in a deployed state and a first end (4b) is closed in the direction of gas discharge, and second ends (4c) that are in a vehicle height direction of the airbag (2) in the deployed state are open. The inner tube (4) is folded back at a folded-back portion (4d) inside the airbag (2) when the airbag (2) is folded in a case where the side airbag device is installed in a vehicle seat back.Type: ApplicationFiled: January 6, 2015Publication date: January 5, 2017Applicant: AUTOLIC DEVELOPMENT ABInventors: Naoki Hatakeyama, Atsushi Murai
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Patent number: 9090962Abstract: A silicon seed rod assembly used for producing polycrystalline silicon by means of a vapor deposition method includes two rod-shape silicon seed rods; and a silicon connection member bridging the silicon seed rods, wherein an opening-end peripheral edge of a through-hole on one side surface of the connection member is sharper than that on the other side surface thereof, and an opening-end peripheral surface on the one side surface thereof is formed into a flat contact surface disposed in a direction perpendicular to a perforation direction of the through-hole, and wherein a upper end portion of the silicon seed rod is inserted into the through-hole so that the contact surface comes into contact with the support surface of the silicon seed rod.Type: GrantFiled: April 8, 2013Date of Patent: July 28, 2015Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Masayuki Tebakari, Naoki Hatakeyama
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Patent number: 8790429Abstract: The reactor for polycrystalline silicon is a reactor for polycrystalline silicon in which a silicon seed rod installed inside the reactor is heated by supplying electricity, a raw material gas supplied inside the reactor is allowed to react, thereby producing polycrystalline silicon on the surface of the silicon seed rod, and specifically, the reactor for polycrystalline silicon is provided with a raw material gas supply port installed on the bottom of the reactor and a raw material gas supply nozzle attached to the raw material gas supply port so as to be communicatively connected and extending upward, in which the upper end of the raw material gas supply nozzle is set to a height in a range from ?10 cm to +5 cm on the basis of the upper end of the electrode which retains the silicon seed rod.Type: GrantFiled: June 27, 2012Date of Patent: July 29, 2014Assignee: Mitsubishi Materials CorporationInventors: Toshihide Endoh, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
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Patent number: 8481135Abstract: This engaging member includes a male part and a female part each of which is capable of engaging with each other, in which each of the male part and the female part has a welded part to a main body of a bag and a part other than the welded part, at least the welded part is formed by a resin composition including (A) a polypropylene type resin having a maximum melting peak temperature measured by a differential calorimeter of not more than 145° C., and a melt flow rate ranging from 0.5 g/10 min. to 20 g/10 min., and (B) a polybutene type resin having a maximum melting peak temperature measured by a differential calorimeter of not more than 130° C., and a melt flow rate ranging from 0.1 g/10 min. to 20 g/10 min.Type: GrantFiled: June 27, 2005Date of Patent: July 9, 2013Assignee: C.I. Kasei Company, LimitedInventors: Masayoshi Nakajima, Naoki Hatakeyama
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Patent number: 8329132Abstract: A polycrystalline silicon manufacturing apparatus efficiently produces high-quality polycrystalline silicon. There is provided a polycrystalline silicon manufacturing apparatus, in which a plurality of gas supplying ports 6A for ejecting raw gas upward in a reactor 1 and gas exhausting ports 7 for exhausting exhaust gas after a reaction are provided on an inner bottom of the reactor 1 in which a plurality of silicon seed rods 4 are stood, the silicon seed rods 4 are heated and the polycrystalline silicon is deposited from the raw gas on the surfaces.Type: GrantFiled: November 21, 2008Date of Patent: December 11, 2012Assignee: Mitsubishi Materials CorporationInventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
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Publication number: 20120266820Abstract: The reactor for polycrystalline silicon is a reactor for polycrystalline silicon in which a silicon seed rod installed inside the reactor is heated by supplying electricity, a raw material gas supplied inside the reactor is allowed to react, thereby producing polycrystalline silicon on the surface of the silicon seed rod, and specifically, the reactor for polycrystalline silicon is provided with a raw material gas supply port installed on the bottom of the reactor and a raw material gas supply nozzle attached to the raw material gas supply port so as to be communicatively connected and extending upward, in which the upper end of the raw material gas supply nozzle is set to a height in a range from ?10 cm to +5 cm on the basis of the upper end of the electrode which retains the silicon seed rod.Type: ApplicationFiled: June 27, 2012Publication date: October 25, 2012Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Toshihide Endoh, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
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Patent number: 8231724Abstract: The reactor for polycrystalline silicon is a reactor for polycrystalline silicon in which a silicon seed rod installed inside the reactor is heated by supplying electricity, a raw material gas supplied inside the reactor is allowed to react, thereby producing polycrystalline silicon on the surface of the silicon seed rod, and specifically, the reactor for polycrystalline silicon is provided with a raw material gas supply port installed on the bottom of the reactor and a raw material gas supply nozzle attached to the raw material gas supply port so as to be communicatively connected and extending upward, in which the upper end of the raw material gas supply nozzle is set to a height in a range from ?10 cm to +5 cm on the basis of the upper end of the electrode which retains the silicon seed rod.Type: GrantFiled: September 19, 2008Date of Patent: July 31, 2012Assignee: Mitsubishi Materials CorporationInventors: Toshihide Endoh, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
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Patent number: 8043660Abstract: A method for manufacturing polycrystalline silicon with high quality by effectively preventing undesired shape such as giving an rough surface to silicon rods or an irregularity in diameter of the silicon rods. The method for manufacturing polycrystalline silicon includes: an initial stabilizing step of deposition wherein a velocity of ejecting the raw material gas from the gas ejection ports is gradually increased; the shaping step wherein first the ejection velocity is increased at a rate higher than that in the stabilizing step and then the ejection velocity is gradually increased at a rate lower than the previous increasing rate; and a growing step wherein, after the shaping step, the ejection velocity is made slower than that at the end of the shaping step until the end of the deposition.Type: GrantFiled: November 26, 2008Date of Patent: October 25, 2011Assignee: Mitsubishi Materials CorporationInventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
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Publication number: 20090226119Abstract: This packaging bag with a fastener is one which is produced by fusing a fastener including a male member and a female member being engageable with each other, a joining portion whereby an end of a non-opening side flange portion of the male member is joined with an end of a non-opening side flange portion of the female member, and a ridge portion formed between the joining portion and the flange portion, in which the joining portion has a thickness ranging from not less than 10 ?m to not more than 100 ?m, the ridge portion has a thickness ranging from not less than 200 ?m to not more than 2 mm, the joining portion is thinner than the flange portion, and the ridge portion is thicker than the flange portion, to a bag to form a packaging bag.Type: ApplicationFiled: August 5, 2005Publication date: September 10, 2009Applicant: C.I. KASEI COMPANY, LIMITEDInventor: Naoki Hatakeyama
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Publication number: 20090165704Abstract: A silicon seed rod assembly used for producing polycrystalline silicon by means of a vapor deposition method includes two rod-shape silicon seed rods; and a silicon connection member bridging the silicon seed rods, wherein an opening-end peripheral edge of a through-hole on one side surface of the connection member is sharper than that on the other side surface thereof, and an opening-end peripheral surface on the one side surface thereof is formed into a flat contact surface disposed in a direction perpendicular to a perforation direction of the through-hole, and wherein a upper end portion of the silicon seed rod is inserted into the through-hole so that the contact surface comes into contact with the support surface of the silicon seed rod.Type: ApplicationFiled: December 23, 2008Publication date: July 2, 2009Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Masayuki Tebakari, Naoki Hatakeyama
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Publication number: 20090136666Abstract: A method for manufacturing polycrystalline silicon with high quality by effectively preventing undesired shape such as giving an rough surface to silicon rods or an irregularity in diameter of the silicon rods. The method for manufacturing polycrystalline silicon includes: an initial stabilizing step of deposition wherein a velocity of ejecting the raw material gas from the gas ejection ports is gradually increased; the shaping step wherein first the ejection velocity is increased at a rate higher than that in the stabilizing step and then the ejection velocity is gradually increased at a rate lower than the previous increasing rate; and a growing step wherein, after the shaping step, the ejection velocity is made slower than that at the end of the shaping step until the end of the deposition.Type: ApplicationFiled: November 26, 2008Publication date: May 28, 2009Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama
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Publication number: 20090136408Abstract: A polycrystalline silicon manufacturing apparatus efficiently produces high-quality polycrystalline silicon. There is provided a polycrystalline silicon manufacturing apparatus, in which a plurality of gas supplying ports 6A for ejecting raw gas upward in a reactor 1 and gas exhausting ports 7 for exhausting exhaust gas after a reaction are provided on an inner bottom of the reactor 1 in which a plurality of silicon seed rods 4 are stood, the silicon seed rods 4 are heated and the polycrystalline silicon is deposited from the raw gas on the surfaces.Type: ApplicationFiled: November 21, 2008Publication date: May 28, 2009Applicant: Mitsubishi Materials CorporationInventors: Toshihide Endoh, Masayuki Tebakari, Toshiyuki Ishii, Masaaki Sakaguchi, Naoki Hatakeyama