Abstract: An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability, a method for producing the silica particle, a silica sol containing the silica particles, and a polishing composition containing the silica sol. Another object of the present invention is to provide a polishing method, a method for producing a semiconductor wafer, and a method for producing a semiconductor device, which are excellent in productivity of an object to be polished. The silica particle in the present invention satisfies formula (1): y?4.2 where a d value measured by wide-angle X-ray scattering is y ?.

Abstract: An object of the present invention is to provide a silica particle, a silica sol containing the silica particle, and a polishing composition containing the silica sol, which prevent secondary aggregation, have excellent dispersion stability, and are suitable for polishing. The present invention relates to a silica particle in which an average value of a circularity coefficient measured by a field-emission scanning electron microscope is 0.90 or more, and a standard deviation of the circularity coefficient is 0.05 or less.

Abstract: An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability. The present invention relates to a silica particle in which a proportion of silanol groups present on a surface represented by (x/y)×100% is 15% or less, where a content of silanol groups on the surface is x mass % and a content of bulk silanol groups is y mass %.

Abstract: An object of the present invention is to provide a silica particle having excellent polishing characteristics and storage stability, a method for producing the silica particle, a silica sol containing the silica particles, and a polishing composition containing the silica sol. Another object of the present invention is to provide a polishing method, a method for producing a semiconductor wafer, and a method for producing a semiconductor device, which are excellent in productivity of an object to be polished. The silica particle in the present invention satisfies formula (1): y?4.2 where a d value measured by wide-angle X-ray scattering is y ?.

Abstract: The present invention provides a polyhydric phenol compound which has an excellent alkali resistance and which does not cause a deterioration in color even when used as a resin raw material or a color developer. The polyhydric phenol compound includes: a bisphenol compound (A) represented by the following Formula (1) and a trisphenol compound (B) represented by the following Formula (2): [wherein R1 represents a monovalent aliphatic hydrocarbon group having from 6 to 24 carbon atoms; each of R2, R3, R4, R5 and R6 represents a monovalent hydrocarbon group having from 1 to 15 carbon atoms; and each of a, b, c, d and e represents an integer from 0 to 4]; wherein the trisphenol compound (B) is contained in an amount, in terms of absorption intensity ratio at 254 nm, of less than 1.6% by area with respect to the amount of the bisphenol compound (A).

Abstract: The present invention provides a polyhydric phenol compound which has an excellent alkali resistance and which does not cause a deterioration in color even when used as a resin raw material or a color developer. The polyhydric phenol compound includes: a bisphenol compound (A) represented by the following Formula (1) and a trisphenol compound (B) represented by the following Formula (2): [wherein R1 represents a monovalent aliphatic hydrocarbon group having from 6 to 24 carbon atoms; each of R2, R3, R4, R5 and R6 represents a monovalent hydrocarbon group having from 1 to 15 carbon atoms; and each of a, b, c, d and e represents an integer from 0 to 4]; wherein the trisphenol compound (B) is contained in an amount, in terms of absorption intensity ratio at 254 nm, of less than 1.6% by area with respect to the amount of the bisphenol compound (A).

Abstract: The present invention provides a polyhydric phenol compound which has an excellent alkali resistance and which does not cause a deterioration in color even when used as a resin raw material or a color developer. The polyhydric phenol compound includes: a bisphenol compound (A) represented by the following Formula (1) and a trisphenol compound (B) represented by the following Formula (2): [wherein R1 represents a monovalent aliphatic hydrocarbon group having from 6 to 24 carbon atoms; each of R2, R3, R4, R5 and R6 represents a monovalent hydrocarbon group having from 1 to 15 carbon atoms; and each of a, b, c, d and e represents an integer from 0 to 4]; wherein the trisphenol compound (B) is contained in an amount, in terms of absorption intensity ratio at 254 nm, of less than 1.6% by area with respect to the amount of the bisphenol compound (A).

Abstract: The invention relates to a resin composition which comprises a polymer having a divalent oligofluorene as a repeating unit therein, wherein the divalent oligofluorene contains at least two fluorene units optionally having a substituent, and the 9-positioned carbon atoms of the fluorene units bond to each other via a direct bond or via an alkylene group optionally having a substituent, an arylene group optionally having a substituent, or an aralkylene group optionally having a substituent, and a ratio of a retardation measured at a wavelength of 450 nm (Re450) to a retardation measured at a wavelength of 550 nm (Re550) satisfies the following formula (2): Re450/Re550?1.0.

Abstract: The present invention provides a polymerizable inorganic particle dispersant that can achieve an inorganic-organic composite particle and inorganic-organic resin composite material, which have a high refractive index and a high Abbe's number, i.e., which can achieve both of a high refractive index and a high Abbe's number that is non-conventional in a composite with an inorganic particle. The present invention relates to a polymerizable inorganic particle dispersant comprising a compound which includes the following functional groups A, B and Q: A: Polymerizable functional group; B: Carboxyl group, Oxo acid group containing a phosphorous or Oxo acid group containing sulfur; and C: Sulfur-containing divalent or more aliphatic hydrocarbon group, which may contain a hetero atom other than sulfur.

Abstract: The invention relates to a resin composition which comprises a polymer having a divalent oligofluorene as a repeating unit therein, wherein the divalent oligofluorene contains at least two fluorene units optionally having a substituent, and the 9-positioned carbon atoms of the fluorene units bond to each other via a direct bond or via an alkylene group optionally having a substituent, an arylene group optionally having a substituent, or an aralkylene group optionally having a substituent, and a ratio of a retardation measured at a wavelength of 450 nm (Re450) to a retardation measured at a wavelength of 550 nm (Re550) satisfies the following formula (2): Re450/Re550?1.0.

Abstract: The present invention provides a polymerizable inorganic particle dispersant that can achieve an inorganic-organic composite particle and inorganic-organic resin composite material, which have a high refractive index and a high Abbe's number, i.e., which can achieve both of a high refractive index and a high Abbe's number that is non-conventional in a composite with an inorganic particle. The present invention relates to a polymerizable inorganic particle dispersant comprising a compound which includes the following functional groups A, B and Q: A: Polymerizable functional group; B: Carboxyl group, Oxo acid group containing a phosphorous or Oxo acid group containing sulfur; and C: Sulfur-containing divalent or more aliphatic hydrocarbon group, which may contain a hetero atom other than sulfur.

Abstract: It is an object of the present invention to provide a novel method for producing a steroid compound. The present invention provides a method for producing 5?-3,7-dioxocholanic acid or an ester derivative thereof, using, as a raw material, a sterol having double bonds at position 5 and at position 24, such as cholesta-5,7,24-trien-3?-ol, ergosta-5,7,24(28)-trien-3?-ol, desmosterol, fucosterol, or ergosta-5,24(28)-dien-3?-ol, via the following 4 steps: (I) a step involving oxidation of a hydroxyl group at position 3 and isomerization of a double bond at position 5 to position 4; (II) a step involving the oxidative cleavage of a side chain to convert position 24 to a carboxyl group or an ester derivative thereof; (III) a step of introducing an oxygen functional group into position 7; and (IV) a step of constructing a 5? configuration by reductive saturation of a double bond at position 4.

Abstract: The invention provides a novel pest control agent having a high systemic activity and a high safety with reduced adverse influences on the environment neighboring the place to which the agent is applied, and a process for producing the same. Namely, the present invention relates to a novel 1-aryl-3-cyano-5-heteroarylalkylaminopyrazole derivative represented by the following general formula (1) and a process for producing the same, and a pest control agent containing the same as an active ingredient. (wherein X represents N or C-halogen, R1 represents an alkyl group, an alkenyl group, an alkynyl group, or a haloalkyl group, R2 represents hydrogen atom, an alkyl group, or an acyl group, R3 represents hydrogen atom or an alkyl group, A represents any one of the groups represented by A-1 to A-4, R4 represents hydrogen atom, an alkyl group, a halogen atom, and n represents 0, 1, or 2, provided that R1 is a haloalkyl group except a perhaloalkyl group when A is A-1 and n is 0, and that n is not 0 when A is A-4.

Abstract: The invention provides a novel pest control agent having a high systemic activity and a high safety with reduced adverse influences on the environment neighboring the place to which the agent is applied, and a process for producing the same.

Abstract: A process for producing 1,4-butanedial monoacetal by reacting acrolein acetal with a synthesis gas containing carbon monoxide and hydrogen, in the presence of a rhodium catalyst and an accelerator of formula (I) ##STR1## wherein R.sup.1 and R.sup.2 each, independently, denote a hydrogen atom, a C.sub.1 -C.sub.20 alkyl group or a C.sub.6 -C.sub.20 aryl group, or R.sup.1 and R.sup.2 together form a --(CH.sub.2).sub.n -- group, n is an integer of from 2 to 7, R.sup.3 and R.sup.4 each, independently, denote halogen or a trifluoromethyl group, and p and q are each, independently, an integer of from 0 to 3, which process can also be extended to the hydroformylation of other compounds which contain an olefin group in a terminal position.

Abstract: A modified strongly acidic ion exchange resin of a sulfonic acid type is disclosed. Modification is conducted by ionically binding a particular N,N-di-substituted mercaptoalkylamine to a strongly acidic ion exchange resin of a sulfonic acid type. The N,N-di-substituted mercaptoalkylamine is specifically represented by the following formulae: ##STR1## wherein R.sup.1 represents hydrogen or a C.sub.1-6 alkyl group, R.sup.2 and R.sup.3 independently represent a C.sub.1-10 alkyl group, a and b denote 0-3, respectively, a+b denotes 2 or 3, and m denotes 4 or 5. The modified ion exchange resin makes an improved catalyst in the preparation of a bisphenol by the condensation reaction of a phenol with a ketone.

Abstract: A process for preparing 2-hexene-1,6-dial comprising dimerizing 2-propenal in the presence of an organometallic compound of the group VIII metal. The desired compound can be obtained under mild conditions with industrial advantages.