Patents by Inventor Naomitsu Ozawa

Naomitsu Ozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060185976
    Abstract: A plating apparatus continuously plates a surface of a substrate with metal and performs its supplementary process in one housing unit. The plating apparatus comprises a cassette stage for placing a substrate cassette thereon, a pre-treatment unit for pre-treating a surface of a substrate, and a plating unit for plating a surface of the substrate pre-treated in the pre-treatment unit. The plating apparatus further comprises a first substrate stage disposed between the cassette stage and the pre-treatment unit, a cleaning and drying unit disposed between the cassette stage and the first substrate stage, a first transfer device, and a second transfer device. The first transfer device transfers a substrate between the substrate cassette, the cleaning and drying unit, and the first substrate stage. The second transfer device transfers a substrate between the first substrate stage, the pre-treatment unit, and the plating unit.
    Type: Application
    Filed: April 24, 2006
    Publication date: August 24, 2006
    Inventors: Satoshi Sendai, Kenya Tomioka, Katsumi Tsuda, Naomitsu Ozawa
  • Publication number: 20040089555
    Abstract: A plating apparatus continuously plates a surface of a substrate with metal and performs its supplementary process in one housing unit. The plating apparatus comprises a cassette stage for placing a substrate cassette thereon, a pre-treatment unit for pre-treating a surface of a substrate, and a plating unit for plating a surface of the substrate pre-treated in the pre-treatment unit. The plating apparatus further comprises a first substrate stage disposed between the cassette stage and the pre-treatment unit, a cleaning and drying unit disposed between the cassette stage and the first substrate stage, a first transfer device, and a second transfer device. The first transfer device transfers a substrate between the substrate cassette, the cleaning and drying unit, and the first substrate stage. The second transfer device transfers a substrate between the first substrate stage, the pre-treatment unit, and the plating unit.
    Type: Application
    Filed: October 16, 2003
    Publication date: May 13, 2004
    Inventors: Satoshi Sendai, Kenya Tomioka, Katsumi Tsuda, Naomitsu Ozawa
  • Patent number: 6660139
    Abstract: A plating apparatus continuously plates a surface of a substrate with metal and performs its supplementary process in one housing unit. The plating apparatus comprises a cassette stage for placing a substrate cassette thereon, a pre-treatment unit for pre-treating a surface of a substrate, and a plating unit for plating a surface of the substrate pre-treated in the pre-treatment unit. The plating apparatus further comprises a first substrate stage disposed between the cassette stage and the pre-treatment unit, a cleaning and drying unit disposed between the cassette stage and the first substrate stage, a first transfer device, and a second transfer device. The first transfer device transfers a substrate between the substrate cassette, the cleaning and drying unit, and the first substrate stage. The second transfer device transfers a substrate between the first substrate stage, the pre-treatment unit, and the plating unit.
    Type: Grant
    Filed: November 7, 2000
    Date of Patent: December 9, 2003
    Assignee: Ebara Corporation
    Inventors: Satoshi Sendai, Kenya Tomioka, Katsumi Tsuda, Naomitsu Ozawa
  • Patent number: 6500317
    Abstract: The present invention provides a conductivity sensing device capable of detecting the conductivity (contact state) of the plurality of feeder contacts contacting the conductive area of the substrate, and a plating apparatus capable of forming a plating film of uniform thickness by supplying a uniform plating current through a plurality of feeder contacts.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: December 31, 2002
    Assignee: Ebara Corporation
    Inventors: Junichiro Yoshioka, Satoshi Sendai, Atsushi Chono, Mitsuo Tada, Akihisa Hongo, Yoshitaka Mukaiyama, Kenya Tomioka, Akira Ogata, Kenichi Suzuki, Naomitsu Ozawa
  • Patent number: 6365020
    Abstract: The present invention is to provide a wafer plating jig for a plating apparatus having a simple construction and capable of sealing conducting pins from the plating solution completely. The wafer plating jig for gripping a wafer, comprises a main jig body (11) having a plurality of gripping mechanisms (13) and a plurality of conducting pins disposed thereon. A seal packing (20) is provided to surround each of the conducting pins. When the wafer is gripped by the gripping mechanisms (13), each end of the conducting pins individually contacts conductive film formed on the wafer and being sealed by the seal packing (20).
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: April 2, 2002
    Assignee: Ebara Corporation
    Inventors: Junichiro Yoshioka, Kenya Tomioka, Satoshi Sendai, Atsushi Chono, Naomitsu Ozawa
  • Patent number: 4545740
    Abstract: An automatic operating system for a pump driven by an internal combustion engine is disclosed in which the engine is kept in operation at a low and economical speed automatically disconnecting the pump from the engine when delivery pressure from the pump is not required and connecting the pump automatically when delivery pressure from the pump is required. Such automatic control is effected by a valve block in which a safety valve is incorporated, the movement of the valve body of which is utilized to control the connection and disconnection of the pump, the movement of the valve body being dependent on the pressure in the discharge line of the pump.
    Type: Grant
    Filed: September 20, 1984
    Date of Patent: October 8, 1985
    Assignee: Ebara Corporation
    Inventors: Kenji Nishikiori, Naomitsu Ozawa