Patents by Inventor Naoto Kihara
Naoto Kihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10501369Abstract: A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.Type: GrantFiled: November 5, 2015Date of Patent: December 10, 2019Assignee: AGC Inc.Inventors: Takahiro Mashimo, Naoto Kihara, Kazunobu Maeshige, Teruo Fujiwara, Masahiro Kishi, Nobuhiro Nakamura, Mamoru Isobe
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Publication number: 20180296988Abstract: To provide a cell-trapping filter which has a high cell trapping efficiency and which is excellent in water resistance. A cell-trapping filter comprising a substrate and a cell-separating mechanism by size, wherein the substrate has, at least on its surface, a layer formed of a fluorinated polymer having units having a biocompatible group, having a fluorine atom content of from 5 to 60 mass % and having a proportion P represented by the following formula of from 0.Type: ApplicationFiled: June 21, 2018Publication date: October 18, 2018Applicants: Asahi Glass Company, Limited, National University Corporation Nagoya UniversityInventors: Naoto KIHARA, Ryohei KOGUCHI, Hajime EGUCHI, Masaru HORI, Hiromasa TANAKA, Kenji ISHIKAWA, Yoshinobu BABA, Hiroshi YUKAWA, Daisuke ONOSHIMA, Tetsunari HASE, Daiki KUBOYAMA
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Publication number: 20160060162Abstract: A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.Type: ApplicationFiled: November 5, 2015Publication date: March 3, 2016Applicant: Asahi Glass Company, LimitedInventors: Takahiro MASHIMO, Naoto KIHARA, Kazunobu MAESHIGE, Teruo FUJIWARA, Masahiro KISHI, Nobuhiro NAKAMURA, Mamoru ISOBE
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Publication number: 20140050864Abstract: To provide a method for producing a laminate excellent in weather resistance, gas barrier property and long-term stability of adhesion between layers. A method for producing a laminate comprising a substrate sheet containing a fluororesin and a gas barrier film directly laminated on at least one side of the substrate sheet, wherein the gas barrier film contains as the main component an inorganic compound comprising at least one member selected from the group consisting of oxygen, nitrogen and carbon, and silicon or aluminum, and the gas barrier film is formed on the substrate sheet by a high-frequency plasma chemical vapor deposition method at a frequency of 27.12 MHz.Type: ApplicationFiled: October 28, 2013Publication date: February 20, 2014Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Naoto KIHARA, Takuya NAKAO
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Patent number: 8586174Abstract: To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.Type: GrantFiled: February 1, 2013Date of Patent: November 19, 2013Assignee: Asahi Glass Company, LimitedInventors: Naoto Kihara, Takuya Nakao, Hiroshi Aruga, Eiji Shidoji
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Patent number: 8435633Abstract: To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.Type: GrantFiled: July 27, 2012Date of Patent: May 7, 2013Assignee: Asahi Glass Company, LimitedInventors: Naoto Kihara, Takuya Nakao, Hiroshi Aruga, Eiji Shidoji
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Publication number: 20120315488Abstract: To provide a laminate which is excellent in weather resistance and moisture-proofing property and also excellent in interlayer adhesion and its long-term stability, and a process for its production. A laminate which comprises a substrate sheet containing a fluororesin, an adhesion layer containing an acrylic resin, and a moisture-proofing layer containing, as its main component, at least one inorganic compound selected from the group consisting of inorganic oxides, inorganic nitrides and inorganic oxynitrides, laminated in this order, wherein the surface composition (as measured by X-ray photoelectron spectroscopy) of the surface in contact with the adhesion layer, of the substrate sheet, is such that the atomic percentage of nitrogen is at least 0.2 at % and at most 3.0 at %, and the atomic percentage of oxygen is at least 1.0 at % and at most 5.0 at %.Type: ApplicationFiled: August 23, 2012Publication date: December 13, 2012Applicant: Ashai Glass Company, Ltd.Inventors: Eiji SHIDOJI, Naoto Kihara, Takuya Nakao, Hiroshi Aruga
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Publication number: 20120295116Abstract: To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.Type: ApplicationFiled: July 27, 2012Publication date: November 22, 2012Applicant: Asahi Glass Company, LimitedInventors: Naoto KIHARA, Takuya Nakao, Hiroshi Aruga, Eiji Shidoji
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Patent number: 7745784Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: GrantFiled: June 25, 2007Date of Patent: June 29, 2010Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mitsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Publication number: 20090050822Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: ApplicationFiled: June 25, 2007Publication date: February 26, 2009Applicant: EBARA CORPORATIONInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Patent number: 7247848Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: GrantFiled: May 28, 2003Date of Patent: July 24, 2007Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Patent number: 7183562Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.Type: GrantFiled: April 25, 2006Date of Patent: February 27, 2007Assignee: Nikon CorporationInventors: Hiroshi Nishimura, Naoto Kihara, Kinya Kato, Toru Takagi, Akihiro Goto, Junji Ikeda, Kazuya Okamoto
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Publication number: 20060192120Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.Type: ApplicationFiled: April 25, 2006Publication date: August 31, 2006Inventors: Hiroshi Nishimura, Naoto Kihara, Kinya Kato, Toru Takagi, Akihiro Goto, Junji Ikeda, Kazuya Okamoto
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Patent number: 7064339Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.Type: GrantFiled: March 31, 2004Date of Patent: June 20, 2006Assignee: Nikon CorporationInventors: Hiroshi Nishimura, Naoto Kihara, Kinya Kato, Toru Takagi, Akihiro Goto, Junji Ikeda, Kazuya Okamoto
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Publication number: 20040251428Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.Type: ApplicationFiled: March 31, 2004Publication date: December 16, 2004Applicant: Nikon Corporation.Inventors: Hiroshi Nishimura, Naoto Kihara, Kinya Kato, Toru Takagi, Akihiro Goto, Junji Ikeda, Kazuya Okamoto
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Publication number: 20040227077Abstract: Electron microscopes (e.g., scanning electron microscopes, mapping SEMs) are disclosed in which the amount of charging of the specimen is controlled to between a minimum amount needed to view an image and a maximum amount beyond which a viewable image cannot be obtained, and such that the image has low distortion and the specimen is not damaged. Multiple irradiation-electron beams, or multiple segments of a single irradiation-electron beam, are directed to a specimen surface. The irradiation beams (or segments) are decelerated by a retarding voltage applied by a cathode lens and are incident on the specimen surface. The respective current and incident energy of each irradiation beam (or segment thereof) are controlled independently to a predetermined relationship so as to impart predetermined amounts of charging to different insulator regions of the specimen.Type: ApplicationFiled: February 13, 2004Publication date: November 18, 2004Applicant: Nikon CorporationInventors: Toru Takagi, Naoto Kihara
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Patent number: 6765217Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective optical system and the E×B in a different direction to a detector via an imaging optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.Type: GrantFiled: April 28, 1999Date of Patent: July 20, 2004Assignee: Nikon CorporationInventors: Hiroshi Nishimura, Naoto Kihara, Kinya Kato, Toru Takagi, Akihiro Goto, Junji Ikeda, Kazuya Okamoto
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Patent number: 6717145Abstract: Mapping electron microscopes are disclosed in which the amount of charging of the specimen is controlled to between a minimum amount needed to view an image and a maximum amount beyond which a viewable image cannot be obtained that has low distortion or that does not result in specimen damage. Multiple irradiation-electron beams, or multiple segments of a single irradiation-electron beam, are directed to a specimen surface. The irradiation beams (or segments) are decelerated by a retarding voltage applied by a cathode lens and are incident on the specimen surface. The respective current and incident energy of each irradiation beam (or segment thereof) are controlled independently to a predetermined relationship so as to impart predetermined amounts of charging to different insulator regions of the specimen.Type: GrantFiled: May 26, 2000Date of Patent: April 6, 2004Assignee: Nikon CorporationInventors: Toru Takagi, Naoto Kihara
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Publication number: 20030207475Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: ApplicationFiled: May 28, 2003Publication date: November 6, 2003Applicants: EBARA CORPORATION, NIKON CORPORATIONInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Patent number: 6593152Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: GrantFiled: November 2, 2001Date of Patent: July 15, 2003Assignees: Ebara Corporation, Nikon CorporationInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura