Abstract: Provided is an in-vehicle power conversion device in which a smoothing capacitor includes a first electrical connection portion, a second electrical connection portion, a mechanical connection portion, and a smoothing capacitor main body. The first electrical connection portion is electrically connected to a first conductor. The second electrical connection portion is electrically connected to a second conductor. The mechanical connection portion functions as an additional electrical connection portion configured to fix the smoothing capacitor main body to the first conductor or the second conductor to be electrically connected to a fixing destination of the smoothing capacitor main body.

Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

Abstract: A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition.

Abstract: To provide a vehicle window structure in which a light emitting device can be disposed outside the laminated glass. A vehicle window structure to be installed at an opening of a vehicle, which comprises a first glass plate and a light emitting device, wherein at least a part of the light emitting device is disposed in a space formed between the first glass plate, an adhesive bonding the first glass plate and a body flange of the vehicle, and an interior material of the vehicle.

Abstract: A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.

Abstract: A configuration ensuring a connector to be fixed to a connector housing with high water-tightness, free of damaging or breaking due to external force, and achieving high shielding performance and reliability is provided. The connector includes a terminal that is conductive, an intermediate insulating member that contains the terminal, and an outer conductor that is conductive and contains the intermediate insulating member. The connector housing includes an outer conductor holding part provided with an outer conductor insertion hole through which the outer conductor is inserted and a front outer conductor containing cavity that is formed on a front side of the outer conductor holding part and has a larger cross-sectional area than the outer conductor insertion hole.

Abstract: A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

Abstract: An evacuation running assistance system includes a road shoulder evacuation possibility determiner to determine if an own vehicle can be evacuated to a road shoulder; an own vehicle situation determiner to determine a current situation of an own vehicle in accordance with a time limit and the road shoulder evacuation possibility, a controller to control an own vehicle in accordance with the situation of the own vehicle; and a road shoulder evacuation possibility road determiner to acquire evacuation space information from a past running history of the own vehicle. The own vehicle situation determiner determines that the own vehicle is in the situation to be controlled to perform the on-lane stopping when the road shoulder evacuation possibility road determiner does not determine within the provisional time that the evacuation of the own vehicle to the road shoulder is possible.

Abstract: An evacuation running assistance system includes a peripheral environment recognizer to recognize at least a space of a road shoulder and a free space as a non-traffic portion, a time limit setter to set a time limit on the own vehicle for continuing evacuation running, and an evacuation place setter to determine at least one of the road shoulder space and the free space recognized by the peripheral environment recognizer as an evacuation place where the own vehicle is evacuated. A situation determiner determines a situation of an own vehicle as being in one of situations in which evacuation running is to be continued, running of an own vehicle is to be stopped on a lane, and road shoulder evacuation is to be performed based on the time limit. A controller controls the own vehicle based on the situation of the own vehicle determined by the situation determiner.

Abstract: A chemically amplified resist composition contains (A) a polymer compound containing one or two or more kinds of repeating units, at least one kind of the repeating units is polymerized from a polymerizable monomer with not more than 1000 ppm of a residual oligomer in a form of dimer to hexamer. An object of the present invention is to provide: a chemically amplified resist composition capable of achieving favorable resolution, pattern profile, and line edge roughness, and simultaneously suppressing development-residue defect, which would otherwise cause mask defect; and a method for forming a resist pattern by using this composition.

Abstract: A connector 10 includes: a first housing 11A, a first terminal 51A attached to the first housing 11A; a second housing 11B separate from the first housing 11A; a second terminal 51B attached to the second housing 11B; a flexible member 81 where the first terminal 51A and second terminal 51B are connected to two ends, and connecting the first housing 11A and second housing 11B; and an aligning member 41 having a flexible member insertion cavity 44 where the flexible member 81 is inserted, and that is movably arranged between the first housing 11A and second housing 11B in a condition where the flexible member 81 is inserted.

Abstract: A chemically amplified positive resist composition is provided comprising a base polymer which contains a polymer comprising an acid generating unit, a phenolic hydroxy group-containing unit, a unit containing a phenolic hydroxy group protected with an acid labile group, and a unit containing a carboxy group protected with an acid labile group. A resist pattern with a high resolution, reduced LER, improved rectangularity, and minimized influence of develop loading can be formed.

Abstract: A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.

Abstract: A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom.

Abstract: A chemically amplified negative resist composition comprising an alcohol compound of specific structure as a crosslinker has a high sensitivity and dissolution contrast and forms a pattern of good profile with reduced values of LER and CDU.

Abstract: A guidance system provides a driver of a vehicle with guidance on a driving operation, and includes a server device that accumulates past traveling records on a traveling road on which the vehicle travels, an acquisition device that acquires a current state of the vehicle, and a notification device that notifies the driver, while driving, of the operation content determined based on the current state of the vehicle and the past traveling records.

Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

Abstract: An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(?O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

Abstract: A novel sulfonium compound has formula (A). A positive resist composition comprising a polymer and a quencher containing the sulfonium compound is improved in resolution and LER during pattern formation and has storage stability. In formula (A), R1, R2, R3, and R4 are independently a C1-C20 monovalent hydrocarbon group, p is an integer of 0-5, q is an integer of 0-5, and r is an integer of 0-4.

Abstract: A semiconductor device includes a first lower line and a second lower line on a substrate, the first and second lower lines extending in a first direction, being adjacent to each other, and being spaced apart along a second direction, orthogonal the first direction, an airgap between the first and second lower lines and spaced therefrom along the second direction, a first insulating spacer on a side wall of the first lower line facing the second lower line, wherein a distance from the first airgap to the first lower line along the second direction is equal to or greater than an overlay specification of a design rule of the semiconductor device, and a second insulating spacer between the airgap and the second lower line.