Patents by Inventor Naoyuki Iwasaki

Naoyuki Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240118633
    Abstract: An electrophotographic photosensitive member including: a support, a charge generating layer, and a charge transporting layer in this order, wherein the charge transporting layer contains: a compound represented by the formula (A-1), and at least one selected from the group consisting of a compound represented by the formula (A-2) and a compound represented by the formula (A-3).
    Type: Application
    Filed: September 8, 2023
    Publication date: April 11, 2024
    Inventors: TATSUYA OHSAWA, KUNIHIKO SEKIDO, SHUHEI IWASAKI, NAOYUKI MATSUMOTO
  • Publication number: 20240118655
    Abstract: An object of the present disclosure is to provide an electrophotographic photosensitive member with suppressed positive ghosts, and a process cartridge and an electrophotographic apparatus each including the electrophotographic photosensitive member. The present disclosure provides an electrophotographic photosensitive member having a support and a photosensitive layer on the support; the photosensitive layer comprises (?) a compound represented by the formula (1), and (?) at least one selected from the group consisting of a compound represented by the formula (2) and a compound represented by the formula (3), wherein a content of the (?) with respect to a content of the (?) is 50 to 850 mass ppm in the photosensitive layer.
    Type: Application
    Filed: September 8, 2023
    Publication date: April 11, 2024
    Inventors: KUNIHIKO SEKIDO, SHUHEI IWASAKI, TATSUYA OHSAWA, NAOYUKI MATSUMOTO, ATSUSHI OKUDA, TSUTOMU NISHIDA
  • Publication number: 20240111224
    Abstract: An object of the present disclosure is to provide an electrophotographic photosensitive member which can suppress the potential fluctuation due to repeated use even with the electrophotographic apparatus of high printing process speed. The present disclosure provides an electrophotographic photosensitive member comprising: a support, a charge generating layer, and a charge transporting layer in this order, wherein the charge transporting layer comprises: (?) a compound represented by the formula (C-1), and (?) at least one selected from the group consisting of a compound represented by the following formula (C-2) and a compound represented by the formula (C-3), wherein a content of the (?) in the charge transporting layer with respect to a total mass of the charge transporting layer is 250 to 610 mass ppm.
    Type: Application
    Filed: September 8, 2023
    Publication date: April 4, 2024
    Inventors: SHUHEI IWASAKI, KUNIHIKO SEKIDO, TATSUYA OHSAWA, NAOYUKI MATSUMOTO
  • Patent number: 9452478
    Abstract: A surface-coated cutting tool includes a body and a hard coating layer coating the cutting tool body. In the surface-coated cutting tool, the (Ti1-XAlX)(CYN1-Y) layer with a cubic crystal structure (X and Y are atomic ratio, and satisfy 0.60?X?0.90 and 0.0005?Y?0.005, respectively) is vapor-deposited on the body by a chemical vapor deposition method. The Al content XL is 0.55?XL?0.70, and the grain size DL is 0.1 ?m or less in the (Ti1-XAlX)(CYN1-Y) layer near the interface between the body and the complex carbonitride layer. The Al content XH 0.80?XH?0.95 and the average grain size DH is 0.5 ?m to 2 ?m in the (Ti1-XAlX)(CYN1-Y) layer near the outer surface side. Furthermore, the Al content ratio and the grain size in the (Ti1-XAlX)(CYN1-Y) layer gradually increase to the outer surface side.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: September 27, 2016
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Makoto Igarashi, Sho Tatsuoka, Naoyuki Iwasaki, Akira Osada
  • Patent number: 9415446
    Abstract: A coated tool with a hard coating layer, which has an excellent hardness and heat insulating effect; and exhibits an excellent chipping resistance and an excellent fracturing resistance for a long-term usage, is provided. The hard coating layer included in the coated tool has a chemically vapor deposited alternate laminated structure, which is made of: a region A layer and a region B layer, each of which is expressed by the composition formula of (Ti1-xAlx)(CyN1-y); and has the average total layer thickness of 1-10 ?m. In the region A layer, relationships, 0.70?x?0.80 and 0.0005?y?0.005, are satisfied; the average grain width W is 0.1 ?m or less; and the average grain length L is 0.1 ?m or less. In the region B layer, relationships, 0.85?x?0.95 and 0.0005?y?0.005, are satisfied; the average grain width W is 0.1-2.0 ?m; and the average grain length L is 0.5-5.0 ?m.
    Type: Grant
    Filed: August 28, 2013
    Date of Patent: August 16, 2016
    Assignee: Mitsubishi Materials Corporation
    Inventors: Sho Tatsuoka, Naoyuki Iwasaki, Kenji Yamaguchi, Akira Osada
  • Publication number: 20150217378
    Abstract: A coated tool with a hard coating layer, which has an excellent hardness and heat insulating effect; and exhibits an excellent chipping resistance and an excellent fracturing resistance for a long-term usage, is provided. The hard coating layer included in the coated tool has a chemically vapor deposited alternate laminated structure, which is made of: a region A layer and a region B layer, each of which is expressed by the composition formula of (Ti1-xAlx)(CYN1-y); and has the average total layer thickness of 1-10 ?m. In the region A layer, relationships, 0.70?x?0.80 and 0.0005?y?0.005, are satisfied; the average grain width W is 0.1 ?m or less; and the average grain length L is 0.1 ?m or less. In the region B layer, relationships, 0.85?x?0.95 and 0.0005?y?0.005, are satisfied; the average grain width W is 0.1-2.0 ?m; and the average grain length L is 0.5-5.0 ?m.
    Type: Application
    Filed: August 28, 2013
    Publication date: August 6, 2015
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Sho Tatsuoka, Naoyuki Iwasaki, Kenji Yamaguchi, Akira Osada
  • Publication number: 20150158094
    Abstract: A surface-coated cutting tool includes a body and a hard coating layer coating the cutting tool body. In the surface-coated cutting tool, the (Ti1-XAlX)(CYN1-Y) layer with a cubic crystal structure (X and Y are atomic ratio, and satisfy 0.600?X?0.90 and 0.0005?Y?0.005, respectively) is vapor-deposited on the body by a chemical vapor deposition method. The Al content XL is 0.55?XL?0.70, and the grain size DL is 0.1 ?m or less in the (Ti1-XAlX)(CYN1-Y) layer near the interface between the body and the complex carbonitride layer. The Al content XH 0.80?XH?0.95 and the average grain size DH is 0.5 ?m to 2 ?m in the (Ti1-XAlX)(CYN1-Y) layer near the outer surface side. Furthermore, the Al content ratio and the grain size in the (Ti1-XAlX)(CYN1-Y) layer gradually increase to the outer surface side.
    Type: Application
    Filed: March 11, 2013
    Publication date: June 11, 2015
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Makoto Igarashi, Sho Tatsuoka, Naoyuki Iwasaki, Akira Osada
  • Patent number: 7777197
    Abstract: Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber, a heating device in communication with the vacuum chamber, and combinations thereof are provided. In one embodiment, the vacuum chamber comprises an electron source wherein the electron source comprises a cathode connected to a high voltage source, an anode connected to a low voltage source, and a substrate support. In another embodiment, the vacuum chamber comprises a grid located between the anode and the substrate support. In one embodiment the heating device comprises a first parallel light array and a second light array positioned such that the first parallel light array and the second light array intersect. In one embodiment the thermocouple assembly comprises a temperature sensor made of aluminum nitride.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: August 17, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Amir Al-Bayati, Lester A. D'Cruz, Alexandros T. Demos, Dale R. Dubois, Khaled A. Elsheref, Naoyuki Iwasaki, Hichem M'Saad, Juan Carlos Rocha-Alvarez, Ashish Shah, Takashi Shimizu
  • Publication number: 20060289795
    Abstract: Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber; and a heating device in communication with the vacuum chamber and combinations thereof are provided. In one embodiment, the vacuum chamber comprises a cathode, an anode, and a substrate support. In another embodiment, the vacuum chamber comprises a grid located between the anode and the substrate support. In one embodiment the heating device comprises a first parallel light array and a second light array positioned such that the first parallel light array and the second light array intersect. In one embodiment the thermocouple assembly comprises a temperature sensor made of aluminum nitride.
    Type: Application
    Filed: May 15, 2006
    Publication date: December 28, 2006
    Inventors: Dale Dubois, Juan Rocha-Alvarez, Amir Al-Bayati, Khaled Elsheref, Alexandros Demos, Lester D'Cruz, Hichem M'Saad, Ashish Shah, Takashi Shimizu, Naoyuki Iwasaki
  • Publication number: 20060272772
    Abstract: Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber, a heating device in communication with the vacuum chamber, and combinations thereof are provided. In one embodiment, the vacuum chamber comprises an electron source wherein the electron source comprises a cathode connected to a high voltage source, an anode connected to a low voltage source, and a substrate support. In another embodiment, the vacuum chamber comprises a grid located between the anode and the substrate support. In one embodiment the heating device comprises a first parallel light array and a second light array positioned such that the first parallel light array and the second light array intersect. In one embodiment the thermocouple assembly comprises a temperature sensor made of aluminum nitride.
    Type: Application
    Filed: June 22, 2006
    Publication date: December 7, 2006
    Inventors: Amir Al-Bayati, Lester D'Cruz, Alexandros Demos, Dale Dubois, Khaled Elsheref, Naoyuki Iwasaki, Hichem M'Saad, Juan Rocha-Alvarez, Ashish Shah, Takashi Shimizu
  • Patent number: 5188645
    Abstract: A method and apparatus for dew point adjustment using dry dehumidifiers wherein fixed dew point adjustment of drying air can be ensured from the time immediately after the start of coating until the establishment of a steady operating state, even if dry dehumidifiers of low control response are used. As a result, air having a fixed dew point can be always sent to a drying apparatus at a low drying cost. Air received from the drying apparatus is dehumidified to a dew point below the desired steady-state dew point, and then humidified to the desired dew point. After steady-state operation is reached, the humidification is discontinued.
    Type: Grant
    Filed: June 3, 1991
    Date of Patent: February 23, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shinji Fukuhori, Naoyuki Iwasaki