Abstract: A radiation detector of a compact size and producing almost no image defect is disclosed, comprising a first radiation-transmissive substrate, a first adhesive layer, a second radiation-transmissive substrate, a scintillator layer and an output substrate provided with a photoelectric conversion element layer which are provided sequentially in this order, wherein an arrangement region of the scintillator layer in a planar direction of the layer includes an arrangement region of the photoelectric conversion element layer in a planar direction of the layer and an arrangement region of the first substrate in a planar direction of the substrate, and the arrangement region of the first substrate includes the arrangement region of the photoelectric conversion element layer; and when the arrangement region of the scintillator layer is divided to plural areas, a coefficient of variation of filling factor is 20% or less which is defined as a standard deviation of filling factor of phosphor of the plural areas, divided

Abstract: Disclosed are a radiation scintillator and a radiation image detector comprising the radiation scintillator. The radiation scintillator which exhibits enhanced sharpness and luminance and is excellent in shock resistance, comprises, on the substrate, a scintillator layer containing a phosphor and formed by a process of gas phase deposition, and the scintillator layer exhibits a thickness of 100 to 500 ?m, a filling factor of the phosphor of 75 to 90% by mass and a layer thickness distribution of not more than 20%.

Abstract: A radiation detector of a compact size and producing almost no image defect is disclosed, comprising a first radiation-transmissive substrate, a first adhesive layer, a second radiation-transmissive substrate, a scintillator layer and an output substrate provided with a photoelectric conversion element layer which are provided sequentially in this order, wherein an arrangement region of the scintillator layer in a planar direction of the layer includes an arrangement region of the photoelectric conversion element layer in a planar direction of the layer and an arrangement region of the first substrate in a planar direction of the substrate, and the arrangement region of the first substrate includes the arrangement region of the photoelectric conversion element layer; and when the arrangement region of the scintillator layer is divided to plural areas, a coefficient of variation of filling factor is 20% or less which is defined as a standard deviation of filling factor of phosphor of the plural areas, divided

Abstract: Disclosed are a radiation scintillator and a radiation image detector comprising the radiation scintillator. The radiation scintillator which exhibits enhanced sharpness and luminance and is excellent in shock resistance, comprises, on the substrate, a scintillator layer containing a phosphor and formed by a process of gas phase deposition, and the scintillator layer exhibits a thickness of 100 to 500 ?m, a filling factor of the phosphor of 75 to 90% by mass and a layer thickness distribution of not more than 20%.

Abstract: A photothermographic material is disclosed, comprising on one side of a support a light-sensitive layer comprising a light sensitive silver halide, light-insensitive silver salts of aliphatic carboyxlic acids, a reducing agent and a binder resin and a light-insensitive layer and on the other side of the support a light-insensitive layer, wherein the light-insensitive layer on the light-sensitive layer side and the light-insensitive layer on the other side of the support comprises a silicon-containing polymer lubricant and a fluorine-containing compound represented by formula (SF): [Rf-(L1)m1-]p-(L2)n1-(A)q??Formula (SF).

Abstract: A photothermographic material comprising on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and on the other side of the support a back coating layer, wherein a dry thickness of the light-sensitive layer is 9 to 16 ?m; a centerline average roughness (Ra(B)) of an outermost surface of a back coating layer side is 100 to 150 nm; and the back coating layer contains a lubricant having a molecular weight of 550 to 10000.

Abstract: A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and a light-insensitive layer and on the other side of the support a back coating layer; the thermal processor uses a transport system in which a feed roller is disposed with being in contact with a bundle of plural stacked film sheets of the photothermographic material so as to feed the uppermost film sheet of the bundle of film sheets through rotation of the feed roller to expose and develop the fed film sheet; the light-insensitive layer or the back coating layer contains a lubricant having a mass average molecular weight of 550 or more.

Abstract: A photothermographic material is disclosed, comprising on one side of a support a light-sensitive layer comprising a light sensitive silver halide, light-insensitive silver salts resin and a light-insensitive layer and on the other side of the supporr a light-insensitive layer, wherein the light-insensitive layer on the light-sensitive layer side and the light-insensitive layer on the other side of the support comprises a silicon-containing polymer lubricant and a fluorine-containing compound represented by formula (SF): [Rf-(L1)m1-]p-(L2)n1-(A)q ??Formula (SF)

Abstract: An objective is to provide an electromagnetic wave shielding material exhibiting an excellent electromagnetic wave shielding property, and also to provide a manufacturing method with quick and simple processing, in which a thin-line-state picture image can easily be formed. An electromagnetic wave shielding material exhibiting an excellent near-infrared shielding property can further be provided if desired. Disclosed is an electromagnetic wave shielding material possessing a support and provided thereon, a conductive metal layer, wherein the conductive metal layer satisfies at least one of the following conditions; (1) a void ratio of the conductive metal layer is 0.1-15%, (2) Glossiness of the conductive metal layer is 50-300%, and (3) Center line average surface roughness (Ra) of the conductive metal layer is 1-50 nm.

Abstract: Several sheets of sheet-shaped photosensitive material 1 are stacked on a paper tray container 2 prepared by press-forming stencil paper sheet, the photosensitive material 1 stacked on said paper tray container is inserted into a moisture-proof and light-shielding bag 3 made of a photosensitive material packaging material having moisture-proof and light-shielding properties and having an aluminum thin foil layer, and the moisture-proof and light-shielding bag 3 is sealed tight under a reduced pressure vacuum.

Abstract: A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and a light-insensitive layer and on the other side of the support a back coating layer; the thermal processor uses a transport system in which a feed roller is disposed with being in contact with a bundle of plural stacked film sheets of the photothermographic material so as to feed the uppermost film sheet of the bundle of film sheets through rotation of the feed roller to expose and develop the fed film sheet; the light-insensitive layer or the back coating layer contains a lubricant having a mass average molecular weight of 550 or more.

Abstract: A silver salt photothermographic dry imaging material including non-photosensitive aliphatic carboxylic acid silver salts; a photosensitive emulsion containing photosensitive silver halide grains; a silver ion reducing agent; a binder; and a cyan coloring leuco dye. A percentage of the photosensitive silver halide grains having a mean particle size of 0.01 or more ?m and 0.04 ?m or less is 5% or more by mass and 50% or less by mass of total photosensitive silver halide grains by conversion into a silver amount.

Abstract: A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and a light-insensitive layer and on the other side of the support a back coating layer; the thermal processor uses a transport system in which a feed roller is disposed with being in contact with a bundle of plural stacked film sheets of the photothermographic material so as to feed the uppermost film sheet of the bundle of film sheets through rotation of the feed roller to expose and develop the fed film sheet; and the back coating layer contains a matting agent of an organic resin.

Abstract: A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise exposing the photothermographic material to light to form a latent image; and simultaneously or sequentially heating the exposed photothermographic material to develop the latent image, wherein at least two matting agents are contained on one surface of the support, and an average particle size LA of Matting agent A and an average particle size LB of Matting agent B satisfy the following relationship: 1.5?LB/LA?6.0, provided that Matting agent A is the matting agent having a largest weight ratio; and Matting agent B is the matting agent having a second largest weight ratio.

Abstract: A method of forming an image comprising the steps of: (a) exposing a photothermographic material comprising a support having thereon an image forming layer comprising organic silver salt grains, silver halide grains, a reducing agent, a development accelerator and a binder, the image forming layer being formed by application of a coating composition comprising more than 30% water as a solvent of the coating composition, and (b) conducting thermal development of the exposed photothermographic material employing a thermal developing device at a distance of 0 to 50 cm between an exposing section and a developing section to obtain a maximum density of 3.8 to 5.0 of the photothermographic material after the thermal development.

Abstract: A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and a light-insensitive layer and on the other side of the support a back coating layer; the thermal processor uses a transport system in which a feed roller is disposed with being in contact with a bundle of plural stacked film sheets of the photothermographic material so as to feed the uppermost film sheet of the bundle of film sheets through rotation of the feed roller to expose and develop the fed film sheet; and the back coating layer contains a matting agent of an organic resin.

Abstract: A heat-developable photosensitive material comprising a support, providing thereon, an organic silver salt, silver halide, a binder and a reducing agent, wherein a value of Rz(E)/Rz(B) is from 0.1 to 0.7 in which Rz(E) is the ten-point average roughness of the outermost surface of the image forming layer side and Rz(B) is the ten-point average roughness of the outermost surface of the side of the support opposite to the side of the image forming layer.

Abstract: An objective is to provide an electromagnetic wave shielding material exhibiting an excellent electromagnetic wave shielding property, and also to provide a manufacturing method with quick and simple processing, in which a thin-line-state picture image can easily be formed. An electromagnetic wave shielding material exhibiting an excellent near-infrared shielding property can further be provided if desired. Disclosed is an electromagnetic wave shielding material possessing a support and provided thereon, a conductive metal layer, wherein the conductive metal layer satisfies at least one of the following conditions; (1) a void ratio of the conductive metal layer is 0.1-15%, (2) Glossiness of the conductive metal layer is 50-300%, and (3) Center line average surface roughness (Ra) of the conductive metal layer is 1-50 nm.

Abstract: A photothermographic imaging material including a support having thereon an image forming layer containing light-insensitive organic silver salt grains, photosensitive silver halide grains, a reducing agent for silver ions and a binder, wherein: (i) each of the photosensitive silver halide grains produces a larger number of latent images in a surface portion of the grain than in an inner portion of the grain by exposure to light; (ii) each of the photosensitive silver halide grains produces a larger number of latent images in the inner portion of the grain than in the surface portion of the grain after being subjected to a thermal development; (iii) a surface photographic speed of each of the photosensitive silver halide grains decreases after being subjected to the thermal development; and (iv) the photothermographic imaging material contains a reducible silver salt compound represented by Formula (I) described in the specification.

Abstract: A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise exposing the photothermographic material to light to form a latent image; and simultaneously or sequentially heating the exposed photothermographic material to develop the latent image, wherein at least two matting agents are contained on one surface of the support, and an average particle size LA of Matting agent A and an average particle size LB of Matting agent B satisfy the following relationship: 1.5?LB/LA?6.0, provided that Matting agent A is the matting agent having a largest weight ratio; and Matting agent B is the matting agent having a second largest weight ratio.