Patents by Inventor Nash W. ANDERSON

Nash W. ANDERSON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SINGLE CRYSTAL METAL OXIDE PLASMA CHAMBER COMPONENT
    Publication number: 20220392753
    Abstract: A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.
    Type: Application
    Filed: October 21, 2020
    Publication date: December 8, 2022
    Inventors: Lin XU, Douglas DETERT, John DAUGHERTY, Pankaj HAZARIKA, Satish SRINIVASAN, Nash W. ANDERSON, John Michael KERNS, Robin KOSHY, David Joseph WETZEL, Lei LIU, Eric A. PAPE
  • Long lifetime thermal spray coating for etching or deposition chamber application
    Patent number: 9790582
    Abstract: In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: October 17, 2017
    Assignee: Lam Research Corporation
    Inventors: Chin-Yi Liu, Russell Ormond, Nash W. Anderson, David M. Schaefer
  • USE OF PLASMA-RESISTANT ATOMIC LAYER DEPOSITION COATINGS TO EXTEND THE LIFETIME OF POLYMER COMPONENTS IN ETCH CHAMBERS
    Publication number: 20160379806
    Abstract: In accordance with this disclosure, there are provided several inventions, including an apparatus and method for depositing plasma resistant coatings on polymer materials used in a plasma processing chamber. In a particular example, such a coating may be made on a portion of an electrostatic chuck, where the polymer material is a bead surrounding an adhesive between a chuck base and a ceramic top plate.
    Type: Application
    Filed: June 25, 2015
    Publication date: December 29, 2016
    Inventors: Lin XU, Nash W. ANDERSON, John DAUGHERTY, Thomas R. STEVENSON, John Michael KERNS
  • LONG LIFETIME THERMAL SPRAY COATING FOR ETCHING OR DEPOSITION CHAMBER APPLICATION
    Publication number: 20160312351
    Abstract: In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).
    Type: Application
    Filed: April 27, 2015
    Publication date: October 27, 2016
    Inventors: Chin-Yi LIU, Russell ORMOND, Nash W. ANDERSON, David M. SCHAEFER