Patents by Inventor Nathan S. Jacobson

Nathan S. Jacobson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon based substrate with environmental/ thermal barrier layer
    Patent number: 6410148
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: June 25, 2002
    Assignees: General Electric Co., United Technologies Corp., The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Nanottam P. Bansal, Elizabeth J. Opila, James L. Smialek, Kang N. Lee, Irene T. Spitsberg, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Silicon based substrate with environmental/thermal barrier layer
    Patent number: 6387456
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: May 14, 2002
    Assignees: General Electric Company, United Technologies Corporation, The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Narottam P. Bansal, Elizabeth J. Opila, James L. Smialek, Kang N. Lee, Irene T. Spitsberg, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Silicon based substrate with yttrium silicate environmental/thermal barrier layer
    Patent number: 6312763
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: November 6, 2001
    Assignees: United Technologies Corporation, General Electric Co., NASA
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Kang N. Lee, Elizabeth J. Opila, James L. Smialek, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Silicon based substrate with yttrium silicate environmental/thermal barrier layer
    Patent number: 6296941
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: October 2, 2001
    Assignees: General Electric Company, United Technologies Corporation, NASA
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Nathan S. Jacobson, Kang N. Lee, Elizabeth J. Opila, James L. Smialek, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Silicon based substrate with calcium aluminosilicate environmental/thermal barrier layer
    Patent number: 6296942
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumino silicate.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: October 2, 2001
    Assignees: General Electric Company, United Technologies Corporation, NASA
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Robert Alden Miller, Nathan S. Jacobson, James L. Smialek, Elizabeth J. Opila, Kang N. Lee, Bangalore A. Nagaraj, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Silicon based substrate with calcium aluminosilicate/thermal barrier layer
    Patent number: 6284325
    Abstract: A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a calcium alumino silicate.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: September 4, 2001
    Assignees: General Electric Company, United Technologies Corporation, The United States of America as represented by the United States National Aeronautics and Space Administration
    Inventors: Harry Edwin Eaton, Jr., William Patrick Allen, Robert Alden Miller, Nathan S. Jacobson, James L. Smialek, Elizabeth J. Opila, Kang N. Lee, Bangalore A. Nagaraj, Hongyu Wang, Peter Joel Meschter, Krishan Lal Luthra
  • Plasma sprayed mullite coatings on silicon-base ceramics
    Patent number: 5496644
    Abstract: A silicon-base ceramic substrate is provided with a mullite chemical barrier/thermal barrier coating uniformly bonded to a surface. The coating is substantially free of amorphous mullite.
    Type: Grant
    Filed: December 20, 1993
    Date of Patent: March 5, 1996
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Kang N. Lee, Robert A. Miller, Nathan S. Jacobson
  • Plasma sprayed mullite coatings on silicon-base ceramics
    Patent number: 5391404
    Abstract: A silicon-base ceramic substrate is provided with a mullite coating by flame-spraying heated crystalline mullite powders onto a substrate that is preheated to a temperature in excess of 800.degree. C. The mullite immediately crystallizes as it solidifies.
    Type: Grant
    Filed: March 15, 1993
    Date of Patent: February 21, 1995
    Assignee: The United States of America as represented by the National Aeronautics and Space Administration
    Inventors: Kang N. Lee, Robert A. Miller, Nathan S. Jacobson