Abstract: A method for removing deposits in a mass spectrometer ion source housing includes delivering a liquid from a liquid source to a surface within the ion source housing. The surface including an ultrasonic transducer embedded within the surface. The method further includes activating the ultrasonic transducer to ultrasonically remove the deposit.

Abstract: A tuning system may acquire, from a mass spectrometer during a batch of one or more analytical runs performed with the mass spectrometer, tune data associated with an operating characteristic of the mass spectrometer. The tuning system may determine, based on the tune data, a value of an operating parameter configured to adjust the operating characteristic of the mass spectrometer and set the operating parameter to the determined value.

Abstract: A tuning system may acquire, from a mass spectrometer during a batch of one or more analytical runs performed with the mass spectrometer, tune data associated with an operating characteristic of the mass spectrometer. The tuning system may determine, based on the tune data, a value of an operating parameter configured to adjust the operating characteristic of the mass spectrometer and set the operating parameter to the determined value.

Abstract: A tuning system may acquire, from a mass spectrometer during a batch of one or more analytical runs performed with the mass spectrometer, tune data associated with an operating characteristic of the mass spectrometer. The tuning system may determine, based on the tune data, a value of an operating parameter configured to adjust the operating characteristic of the mass spectrometer and set the operating parameter to the determined value.

Abstract: A method for removing deposits in a mass spectrometer ion source housing includes delivering a liquid from a liquid source to a surface within the ion source housing. The surface including an ultrasonic transducer embedded within the surface. The method further includes activating the ultrasonic transducer to ultrasonically remove the deposit.

Abstract: A mass spectrometry apparatus includes an ion source configured to generate ions; an ion guide configured to guide ions from the ion source towards a detector; the ion detector configured to detect ions; and a mass spectrometry controller. The mass spectrometry controller is configured to generate a tune curve for the ion guide; determine an observed low mass cutoff for the ion guide from the tune curve; calculate an effective r0 for the ion guide based on the observed low mass cutoff; determine an RF voltage based on the effective r0; apply the RF voltage to the ion guide; and perform a mass analysis of ions in a sample.

Abstract: A mass spectrometry apparatus includes an ion source configured to generate ions; an ion guide configured to guide ions from the ion source towards a detector; the ion detector configured to detect ions; and a mass spectrometry controller. The mass spectrometry controller is configured to generate a tune curve for the ion guide; determine an observed low mass cutoff for the ion guide from the tune curve; calculate an effective r0 for the ion guide based on the observed low mass cutoff; determine an RF voltage based on the effective r0; apply the RF voltage to the ion guide; and perform a mass analysis of ions in a sample.

Abstract: A mass spectrometry apparatus includes an ion source configured to generate ions; an ion guide configured to guide ions from the ion source towards a detector; the ion detector configured to detect ions; and a mass spectrometry controller. The mass spectrometry controller is configured to generate a tune curve for the ion guide; determine an observed low mass cutoff for the ion guide from the tune curve; calculate an effective r0 for the ion guide based on the observed low mass cutoff; determine an RF voltage based on the effective r0 and the RF frequency; apply the RF voltage to the ion guide; and perform a mass analysis of ions in a sample.

Abstract: A non-arcing modular dielectric array having an electrically conductive substrate mounting a multiplicity of spaced dielectric elements, such as second surface mirrors or solar cells, with outer dielctric surfaces spaced and electrically isolated from the substrate which tend to accumulate electrical charges in a plasma environment creating between the substrate and element surfaces large potential differences which induce arc discharges between the surfaces and substrate. The gaps between adjacent dielectric elements are filled with a resilient filler which provides about the individual elements conductive frames grounded to the substrate for bleeding charges from the element surfaces to the substrate to suppress arc discharges therebetween.