Patents by Inventor NATIONAL APPLIED RESEARCH LABORATORI

NATIONAL APPLIED RESEARCH LABORATORI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130084530
    Abstract: A method for fabricating a patterned layer is disclosed. Firstly, a semiconductor substrate is provided. Then, a precursory gas on the semiconductor substrate is formed. Finally, a patterned layer on the semiconductor substrate is deposited by reacting the precursory gas with at least one electron beam or at least one ion beam. The present invention not only fabricates a patterned layer on the substrate in a single step but also achieves a high lithographic resolution and avoids remains of contaminations by using the properties of the electron beam or the ion beam and the precursory gas.
    Type: Application
    Filed: November 21, 2012
    Publication date: April 4, 2013
    Applicant: NATIONAL APPLIED RESEARCH LABORATORIES
    Inventor: NATIONAL APPLIED RESEARCH LABORATORI