Abstract: Provided is a cleaner composition which causes no malfunction due to clogging even when contained in a pump foamer container, or the like, and repeatedly used, and is excellent in resilience and persistence of foam, and feeling after washing off. The cleaner composition includes a soap that is obtained by neutralizing a higher fatty acid with sodium N-methyltaurate, and a polymer including dimethyl diallyl ammonium chloride as a monomer unit and having a molecular weight of 200000 or less.

Abstract: An object of the present invention is to provide an abrasive slurry regeneration method capable of efficiently regenerating an abrasive slurry having a high polishing rate. The abrasive slurry regeneration method is an abrasive slurry regeneration method for polishing a polishing target containing silicon oxide as a main component using an abrasive slurry containing abrasive particles and a plurality of kinds of additives and then regenerating a collected abrasive slurry, characterized by including a regeneration step of collecting an additive having a molecular weight of 500 or more and an additive adsorbed by the abrasive particles among additives contained in the collected abrasive slurry together with the abrasive particles while an abrasive concentration (% by mass) is maintained within a range of 0.2 to 3000% with respect to an abrasive concentration (% by mass) of an unused abrasive slurry when being used for polishing a polishing target.

Abstract: Provided is a cleaner composition which causes no malfunction due to clogging even when contained in a pump foamer container, or the like, and repeatedly used, and is excellent in resilience and persistence of foam, and feeling after washing off. The cleaner composition includes a soap that is obtained by neutralizing a higher fatty acid with sodium N-methyltaurate, and a polymer including dimethyl diallyl ammonium chloride as a monomer unit and having a molecular weight of 200000 or less.

Abstract: The present invention addresses the problem of providing: a hydrogel particle which can be taken into a cell by the action of the cell and can control the release of a magnetic particle enclosed therein into the cell so as to retain the magnetic particle in the cell for a long period; a method for producing the hydrogel particle; a cell or a cell structure each enclosing the hydrogel particle therein; and a method for evaluating the activity of a cell using the hydrogel particle. The present invention solves the problem by a hydrogel particle including: a domain which is composed of a first hydrogel; a matrix which encloses the domain and is composed of a second hydrogel having a different crosslinking degree or composition from that of the first hydrogel; and a magnetic particle which is supported by at least the first hydrogel.

Abstract: The purpose of the present invention is to provide composite particles for imaging that have high biodegradability after imaging. To achieve the above purpose, the composite particles for imaging according to the present invention are configured such that the ratio (long-term residual amount/short-term residual amount) of a long-term residual amount, which is the average value of the contrast rate after six days in a cell and the contrast rate after 11 days in a cell of the same type, and a short-term residual amount, which is the contrast rate after two days in a cell of the same type, is less than 99%.

Abstract: Disclosed herein are gelatin particles that have been crosslinked without using a crosslinking agent and are easily taken up by cells themselves, and a method for producing such gelatin particles. The gelatin particles are made of self-crosslinked gelatin and have a particle diameter of 0.010 ?m or more but 5.0 ?m or less. The gelatin particles can be produced by discharging droplets of a liquid containing melted gelatin into air in a heating tube or a drying chamber and drying the droplets to form the gelatin into particles under conditions where a difference between the temperature in the heating tube or the drying chamber and the temperature of the liquid is 235° C. or less and further by crosslinking the gelatin forming the particles.

Abstract: A method for collecting an abrasive from an abrasive slurry which has been used for polishing an object including silicon as a main component includes: (i) adding a solvent to the abrasive slurry; (ii) dissolving particles of the polished object among components of the polished object contained in the abrasive slurry; and (iii) filtering the abrasive slurry to collect the abrasive, in which the steps (i) to (iii) are carried out without a pH adjuster to remove components of the polished object to collect the abrasive.

Abstract: A method for preparing a recycled abrasive slurry includes: polishing a material to be polished, which includes silicon as a main component, with an abrasive slurry including a plurality of kinds of additives added for different purposes; and preparing a recycled abrasive slurry from a collected abrasive slurry collected after the polishing, wherein the recycled abrasive slurry is prepared through: step 1 of removing, from the collected abrasive slurry, at least an additive B capable of decreasing a polishing rate among the plurality of additives, and step 2 of replenishing at least an additive A capable of increasing a polishing rate among the plurality of additives, to the abrasive slurry from which an additive has been removed, which has been prepared in step 1.

Abstract: Disclosed herein are gelatin particles that have been crosslinked without using a crosslinking agent and are easily taken up by cells themselves, and a method for producing such gelatin particles. The gelatin particles are made of self-crosslinked gelatin and have a particle diameter of 0.010 ?m or more but 5.0 ?m or less. The gelatin particles can be produced by discharging droplets of a liquid containing melted gelatin into air in a heating tube or a drying chamber and drying the droplets to form the gelatin into particles under conditions where a difference between the temperature in the heating tube or the drying chamber and the temperature of the liquid is 235° C. or less and further by crosslinking the gelatin forming the particles.

Abstract: An object of the present invention is to provide an abrasive slurry regeneration method capable of efficiently regenerating an abrasive slurry having a high polishing rate. The abrasive slurry regeneration method is an abrasive slurry regeneration method for polishing a polishing target containing silicon oxide as a main component using an abrasive slurry containing abrasive particles and a plurality of kinds of additives and then regenerating a collected abrasive slurry, characterized by including a regeneration step of collecting an additive having a molecular weight of 500 or more and an additive adsorbed by the abrasive particles among additives contained in the collected abrasive slurry together with the abrasive particles while an abrasive concentration (% by mass) is maintained within a range of 0.2 to 3000% with respect to an abrasive concentration (% by mass) of an unused abrasive slurry when being used for polishing a polishing target.

Abstract: An object of the present invention is to provide a cerium oxide abrasive material containing cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, the cerium oxide abrasive particles having a spherical shape and high polishing performance (polishing rate and polishing precision of the polished surface), a method for producing the cerium oxide abrasive material, and a polishing method. The cerium oxide abrasive material according to the present invention comprises spherical cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, wherein the cerium oxide abrasive particles have a spherical shape having an average aspect ratio within the range of 1.00 to 1.15.

Abstract: A method for collecting an abrasive from an abrasive slurry which has been used for polishing an object including silicon as a main component includes: (i) adding a solvent to the abrasive slurry; (ii) dissolving particles of the polished object among components of the polished object contained in the abrasive slurry; and (iii) filtering the abrasive slurry to collect the abrasive, in which the steps (i) to (iii) are carried out without a pH adjuster to remove components of the polished object to collect the abrasive.

Abstract: Gelatin particles include: gelatin that serves as a main component; and an auxiliary component carried on the gelatin, the gelatin particles being configured such that where the particle size of the gelatin particles is X, the ratio A/B of the average concentration A (mass %) of the auxiliary component contained in a surface part having a thickness of 0.01X from the surface of the gelatin particles based on the total mass of the gelatin particles to the average concentration B (mass %) of the auxiliary component contained in an inner part of the particles deeper than the surface part based on the total mass of the gelatin particles is less than 0.25.

Abstract: A method for preparing a recycled abrasive slurry includes: polishing a material to be polished, which includes silicon as a main component, with an abrasive slurry including a plurality of kinds of additives added for different purposes; and preparing a recycled abrasive slurry from a collected abrasive slurry collected after the polishing, wherein the recycled abrasive slurry is prepared through: step 1 of removing, from the collected abrasive slurry, at least an additive B capable of decreasing a polishing rate among the plurality of additives, and step 2 of replenishing at least an additive A capable of increasing a polishing rate among the plurality of additives, to the abrasive slurry from which an additive has been removed, which has been prepared in step 1.

Abstract: An object of the present invention is to provide a cerium oxide abrasive material containing cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, the cerium oxide abrasive particles having a spherical shape and high polishing performance (polishing rate and polishing precision of the polished surface), a method for producing the cerium oxide abrasive material, and a polishing method. The cerium oxide abrasive material according to the present invention comprises spherical cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, wherein the cerium oxide abrasive particles have a spherical shape having an average aspect ratio within the range of 1.00 to 1.15.

Abstract: A polishing material comprising a polishing material particle including cerium, wherein, the polishing material particle is a secondary particle obtained by baking a primary particle which is a polishing material precursor particle; the primary particle is a sphere shape; an average particle size of the primary particle is within a range of 100 to 1000 nm; and an average particle size of the secondary particle is within a range of 300 to 10000 nm.