Patents by Inventor Neeta Jha

Neeta Jha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5225024
    Abstract: Magnetic confinement of electrons in a plasma reactor is effected using electro-magnetic coils and other magnets which generate respective magnetic fields which are mutually opposed and substantially orthogonal on their common axis to the major plane of a wafer being processed, instead of being aligned and parallel to the major plane as in prior magnetically enhanced plasma reactors. The respective magnetic fields combine to yield a net magnetic field which is nearly parallel to the wafer away from the magnetic axis so that electrons are confined in the usual manner. In addition, a magnetic mirror provides confinement near the magnetic axis. The E.times.B cross product defines a circumferential drift velocity urging electrons about a closed path about the magnetic axis.
    Type: Grant
    Filed: August 22, 1991
    Date of Patent: July 6, 1993
    Assignee: Applied Materials, Inc.
    Inventors: Peter R. Hanley, Stephen E. Savas, Karl B. Levy, Neeta Jha, Kevin Donohoe