Patents by Inventor Nelson C. Yew

Nelson C. Yew has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High throughput/high resolution particle beam system
    Patent number: 4445039
    Abstract: A particle beam lithographic system and method using smaller address structure particle beam for generating masks for integrated circuit technology utilizing an electrostatic deflector system to sweep the beam in the serpentine path for increased throughput.
    Type: Grant
    Filed: July 6, 1981
    Date of Patent: April 24, 1984
    Assignee: The Perkin-Elmer Corp.
    Inventor: Nelson C. Yew