Patents by Inventor NexGen Semi Holding, Inc.

NexGen Semi Holding, Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS AND METHOD FOR CONFORMAL MASK MANUFACTURING
    Publication number: 20130040458
    Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
    Type: Application
    Filed: October 2, 2012
    Publication date: February 14, 2013
    Applicant: NEXGEN SEMI HOLDING, INC.
    Inventor: NexGen Semi Holding, Inc.