Patents by Inventor NGANHAU YUNG

NGANHAU YUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11220098
    Abstract: The invention relates to an imageable coating layer, thermal negative-working lithography printing plate, and platemaking method. The coating layer includes constituents in parts by weight: a radically polymerizable compound 20-60 parts, a radiation-absorbing compound 0.5-12 parts, a free radical initiator 1-25 parts, a binding agent 10-70 parts, and a development accelerator 0.5-15 parts. The platemaking method includes the steps: S1, preparing a printing plate precursor that includes a substrate having a hydrophilic surface or is provided with a hydrophilic layer and imageable coating layer covering the substrate; S2, patternedly exposing the printing plate precursor, forming an exposed area and an unexposed area; and S3, removing the unexposed area via a development process.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: January 11, 2022
    Assignee: ZHEJIANG KONITA NEW MATERIALS CO., LTD.
    Inventors: Ting Tao, Nganhau Yung, Zuoting Ying, Ying Huang, Miao Gao, Nengping Xu, Chongshuang Liu
  • Publication number: 20190176460
    Abstract: The invention relates to an imageable coating layer, thermal negative-working lithography printing plate, and platemaking method. The coating layer includes constituents in parts by weight: a radically polymerizable compound 20-60 parts, a radiation-absorbing compound 0.5-12 parts, a free radical initiator 1-25 parts, a binding agent 10-70 parts, and a development accelerator 0.5-15 parts. The platemaking method includes the steps: S1, preparing a printing plate precursor that includes a substrate having a hydrophilic surface or is provided with a hydrophilic layer and imageable coating layer covering the substrate; S2, patternedly exposing the printing plate precursor, forming an exposed area and an unexposed area; and S3, removing the unexposed area via a development process.
    Type: Application
    Filed: August 17, 2017
    Publication date: June 13, 2019
    Inventors: TING TAO, NGANHAU YUNG, ZUOTING YING, YING HUANG, MIAO GAO, NENGPING XU, CHONGSHUANG LIU