Abstract: Examples of the disclosure relate to vapour chambers. Examples of the disclosure can provide an apparatus comprising: at least a first vapour chamber portion and a second vapour chamber portion wherein the vapour chamber portions comprise walls housing an internal volume where the internal volume is configured to enable vapour flow; at least one hinge formed from walls of the first vapour chamber portion and walls of the second vapour chamber portion and configured to enable the first vapour chamber portion to be moved relative to the second vapour chamber portion; and wherein the hinge is thermally conductive and configured to enable heat to be transferred from the first vapour chamber portion to the second vapour chamber portion.

Abstract: According to examples of the disclosure there is provided a vapour chamber comprising one or more ducts extending between a condenser and an evaporator. Powder can be provided within the one or more ducts wherein the powder is configured to control flow of a working fluid through the one or more ducts.

Abstract: Examples of the disclosure relate to vapour chambers. Examples of the disclosure can provide an apparatus comprising: at least a first vapour chamber portion and a second vapour chamber portion wherein the vapour chamber portions comprise walls housing an internal volume where the internal volume is configured to enable vapour flow; at least one hinge formed from walls of the first vapour chamber portion and walls of the second vapour chamber portion and configured to enable the first vapour chamber portion to be moved relative to the second vapour chamber portion; and wherein the hinge is thermally conductive and configured to enable heat to be transferred from the first vapour chamber portion to the second vapour chamber portion.

Abstract: An apparatus comprising a top substrate having a first surface and a bottom substrate having a second surface facing the first surface. The apparatus comprises a layer of metal located between facing regions of the first and second surfaces and connecting the facing regions to form sidewalls of channels located between the top and bottom substrates, the layer of metal having a different composition than the top and bottom surfaces.

Abstract: A device, comprising a flow controller. The flow controller includes a body having walls that define a channel within the body, and a passive flow control valve. The passive control valve has a moveable member that includes a thermal shape memory material, the moveable member configured to change an aperture size in the channel in response to a reversible temperature-induced shape transformation of the thermal shape memory material.

Abstract: A device, comprising a flow controller. The flow controller includes a body having walls that define a channel within the body, and a passive flow control valve. The passive control valve has a moveable member that includes a thermal shape memory material, the moveable member configured to change an aperture size in the channel in response to a reversible temperature-induced shape transformation of the thermal shape memory material.