Patents by Inventor Nicola Huesing

Nicola Huesing has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photo-definable self-assembled materials
    Patent number: 7332264
    Abstract: The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
    Type: Grant
    Filed: February 26, 2003
    Date of Patent: February 19, 2008
    Assignee: STC.UNM
    Inventors: Dhaval Doshi, Hongyou Fan, Nicola Huesing, Alan Hurd, Charles Jeffrey Brinker
  • PHOTO-DEFINABLE SELF-ASSEMBLED MATERIALS
    Publication number: 20070287104
    Abstract: The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
    Type: Application
    Filed: February 26, 2003
    Publication date: December 13, 2007
    Inventors: Dhaval Doshi, Hongyou Fan, Nicola Huesing, Alan Hurd, Charles Brinker
  • Photo-definable self-assembled materials
    Patent number: 6808867
    Abstract: The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: October 26, 2004
    Assignee: Science & Technology Corporation @ University of New Mexico
    Inventors: Dhaval Doshi, Hongyou Fan, Nicola Huesing, Alan Hurd, Charles Jeffrey Brinker
  • Photo-definable self-assembled materials
    Publication number: 20020127498
    Abstract: The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.
    Type: Application
    Filed: March 19, 2002
    Publication date: September 12, 2002
    Inventors: Dhaval Doshi, Hongyou Fan, Nicola Huesing, Alan Hurd, Charles Jeffrey Brinker