Patents by Inventor Niek Elout De Kruijf

Niek Elout De Kruijf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method
    Patent number: 10656536
    Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: May 19, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Niek Elout De Kruijf, Mircea Dusa, Martijn Houben, Johannes Gerardus Maria Mulder, Thomas Poiesz, Marco Adrianus Peter Van Den Heuvel, Paul Van Dongen, Justin Johannes Hermanus Gerritzen, Antonie Hendrik Verweij, Abraham Alexander Soethoudt
  • SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170192359
    Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
    Type: Application
    Filed: April 23, 2015
    Publication date: July 6, 2017
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Martinus Hendrikus Antonius LEENDERS, Niek Elout DE KRUIJF, Mircea DUSA, Martijn HOUBEN, Johannes Gerardus Maria MULDER, Thomas POIESZ, Marco Adrianus Peter VAN DEN HEUVEL, Paul VAN DONGEN, Justin Johannes Hermanus GERRITZEN, Antonie Hendrik VER WEIJ, Abraham Alexander SOETHOUDT
  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8823919
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf
  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8659741
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: February 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110199592
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Application
    Filed: November 15, 2010
    Publication date: August 18, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graff, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110116060
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Application
    Filed: November 15, 2010
    Publication date: May 19, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf