Patents by Inventor Niels Vergeer
Niels Vergeer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230207259Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.Type: ApplicationFiled: December 23, 2022Publication date: June 29, 2023Applicant: ASML Netherlands B.V.Inventors: Erwin SLOT, Niels VERGEER, Vincent Sylvester KUIPER
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Patent number: 10054863Abstract: The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined wavelengType: GrantFiled: February 25, 2015Date of Patent: August 21, 2018Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido De Boer, Niels Vergeer
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Publication number: 20170277043Abstract: The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.Type: ApplicationFiled: June 12, 2017Publication date: September 28, 2017Inventors: Guido de Boer, Thomas Adriaan Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Patent number: 9760028Abstract: A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.Type: GrantFiled: March 8, 2013Date of Patent: September 12, 2017Assignee: MAPPER LITHOGRAPHY IP B.V.Inventor: Niels Vergeer
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Patent number: 9690215Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.Type: GrantFiled: May 19, 2015Date of Patent: June 27, 2017Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Patent number: 9678443Abstract: The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.Type: GrantFiled: March 30, 2012Date of Patent: June 13, 2017Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido de Boer, Thomas Adriaan Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Patent number: 9665014Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.Type: GrantFiled: March 8, 2013Date of Patent: May 30, 2017Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Paul Ijmert Scheffers, Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper, Niels Vergeer
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Patent number: 9551563Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.Type: GrantFiled: September 26, 2013Date of Patent: January 24, 2017Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Godefridus Cornelius Antonius Couweleers, Thomas Adriaan Ooms, Niels Vergeer
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Patent number: 9484188Abstract: Methods and systems for verification of a mark written on a target surface during a multiple beam lithography process, and for verifying beam position of individual beams on the target surface based on mark verification are disclosed. A mark can be verified by scanning an optical beam over the mark and measuring the reflected optical beam and the position of the target with respect to the optical beam. By comparing the intensity of the reflected light as a function of distance over the mark with reference mark data representing an intended definition of the mark, and any deviation between the measured representation and the reference mark data are determined. If any deviation deviate more than the predetermined limit, incorrectly positioned beams can be verified from the data.Type: GrantFiled: March 11, 2015Date of Patent: November 1, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventor: Niels Vergeer
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Publication number: 20160268099Abstract: Methods and systems for verification of a mark written on a target surface during a multiple beam lithography process, and for verifying beam position of individual beams on the target surface based on mark verification are disclosed. A mark can be verified by scanning an optical beam over the mark and measuring the reflected optical beam and the position of the target with respect to the optical beam. By comparing the intensity of the reflected light as a function of distance over the mark with reference mark data representing an intended definition of the mark, and any deviation between the measured representation and the reference mark data are determined. If any deviation deviate more than the predetermined limit, incorrectly positioned beams can be verified from the data.Type: ApplicationFiled: March 11, 2015Publication date: September 15, 2016Inventor: Niels VERGEER
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Patent number: 9395635Abstract: The invention relates to a substrate for use in a lithography system, said substrate being provided with an at least partially reflective position mark comprising an array of structures, the array extending along a longitudinal direction of the mark, characterized in that said structures are arranged for varying a reflection coefficient of the mark along the longitudinal direction, wherein said reflection coefficient is determined for a predetermined wavelength. In an embodiment a specular reflection coefficient varies along the substrate, wherein high order diffractions are substantially absorbed by the substrate. A position of a beam on a substrate can thus be determined based on the intensity of its reflection in the substrate. The invention further relates to a positioning device and lithography system for cooperation with the substrate, and a method of manufacture of the substrate.Type: GrantFiled: April 23, 2012Date of Patent: July 19, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido De Boer, Niels Vergeer
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Patent number: 9395636Abstract: The invention relates to a lithography system for processing a target, such as a wafer. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system connected to the final projection system and arranged for detecting a position mark on a surface.Type: GrantFiled: April 23, 2012Date of Patent: July 19, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido De Boer, Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
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Patent number: 9383662Abstract: The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.Type: GrantFiled: May 11, 2012Date of Patent: July 5, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Niels Vergeer, Guido de Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
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Patent number: 9261800Abstract: The invention relates to alignment of an interferometer module for use in an exposure tool. An alignment method is provided for aligning an interferometer to the tool while outside of the too. Furthermore, the invention provides a dual interferometer module, an alignment frame use in the alignment method, and an exposure tool provided with first mounting surfaces for cooperative engagement with second mounting surfaces of an interferometer module.Type: GrantFiled: March 30, 2012Date of Patent: February 16, 2016Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido de Boer, Thomas Adriaan Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Patent number: 9201315Abstract: The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system arranged for detecting a position mark on a surface.Type: GrantFiled: April 23, 2012Date of Patent: December 1, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido De Boer, Niels Vergeer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg
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Publication number: 20150268032Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.Type: ApplicationFiled: May 19, 2015Publication date: September 24, 2015Inventors: Guido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Publication number: 20150241200Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.Type: ApplicationFiled: September 26, 2013Publication date: August 27, 2015Inventors: Godefridus Cornelius Antonius Couweleers, Thomas Adriaan Ooms, Niels Vergeer
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Patent number: 9069265Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.Type: GrantFiled: March 30, 2012Date of Patent: June 30, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido de Boer, Thomas Adrian Ooms, Niels Vergeer, Godefridus Cornelius Antonius Couweleers
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Patent number: RE49241Abstract: A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.Type: GrantFiled: September 11, 2019Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventor: Niels Vergeer
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Patent number: RE49732Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. i.e., 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.Type: GrantFiled: May 30, 2019Date of Patent: November 21, 2023Assignee: ASML Netherlands B.V.Inventors: Paul IJmert Scheffers, Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper, Niels Vergeer