Patents by Inventor Nihat Okulan

Nihat Okulan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210257539
    Abstract: Semiconductor strain gages fabricated on Silicon-on-insulator (SOI) material, and the method of making them. Force sensing elements are uniformly batch-fabricated at wafer level and singulated individually by a wire bonding method. In another method, they are singulated by plucking them off the wafer from their attachment site.
    Type: Application
    Filed: December 4, 2020
    Publication date: August 19, 2021
    Applicant: ADVANCED NANOSTRUCTURES, LLC
    Inventor: Nihat Okulan
  • Patent number: 10879449
    Abstract: Semiconductor strain gages fabricated on Silicon-on-insulator (SOI) material, and the method of making them. Force sensing elements are uniformly batch-fabricated at wafer level and singulated individually by a wire bonding method. In another method, they are singulated by plucking them off the wafer from their attachment site.
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: December 29, 2020
    Inventor: Nihat Okulan
  • Publication number: 20190383677
    Abstract: Semiconductor strain gages fabricated on Silicon-on-insulator (SOI) material, and the method of making them. Force sensing elements are uniformly batch-fabricated at wafer level and singulated individually by a wire bonding method. In another method, they are singulated by plucking them off the wafer from their attachment site.
    Type: Application
    Filed: May 11, 2017
    Publication date: December 19, 2019
    Inventor: Nihat Okulan
  • Patent number: 8857247
    Abstract: A probe assembly for an instrument and a method of manufacture includes a substrate and a cantilever having a length that is independent of typical alignment error during fabrication. In one embodiment, the probe assembly includes a buffer section interposed between the substrate and the cantilever. The cantilever extends from the buffer section and a portion of the buffer section extends beyond an edge of the substrate. The portion of the buffer section is more stiff than the cantilever. The corresponding method of producing the probe assembly facilitates batch fabrication without compromising probe performance.
    Type: Grant
    Filed: May 19, 2008
    Date of Patent: October 14, 2014
    Assignee: Bruker Nano, Inc.
    Inventors: Kevin J. Kjoller, Ami Chand, Nihat Okulan
  • Publication number: 20110306853
    Abstract: A body fluid sampling or fluid delivery system includes a polymeric support and an array of polymeric microneedles coupled to the support, each of a microneedle having a height of 500 to 2000 ?m and a tapering angle of 60 to 90°. A plurality of polymeric microchannels are provided with being associated with a microneedle. The plurality of polymeric microchannels are integrally formed with the array of polymeric microneedles without bonding. At least one polymeric reservoir is coupled to the plurality of microchannels.
    Type: Application
    Filed: March 21, 2011
    Publication date: December 15, 2011
    Inventors: Michael Darryl Black, Anita Margarette Chambers, Richard Chambers, Nihat Okulan
  • Publication number: 20080282819
    Abstract: A probe assembly for an instrument and a method of manufacture includes a substrate and a cantilever having a length that is independent of typical alignment error during fabrication. In one embodiment, the probe assembly includes a buffer section interposed between the substrate and the cantilever. The cantilever extends from the buffer section and a portion of the buffer section extends beyond an edge of the substrate. The portion of the buffer section is more stiff than the cantilever. The corresponding method of producing the probe assembly facilitates batch fabrication without compromising probe performance.
    Type: Application
    Filed: May 19, 2008
    Publication date: November 20, 2008
    Inventors: Kevin J. Kjoller, Ami Chand, Nihat Okulan
  • Patent number: 7370515
    Abstract: Probes for use in a scanning probe microscope and methods of manufacturing such probes. Each probe includes a probe tip having a substantially vertical sidewall formed by an anisotropic etching process and a flared post underlying the probe tip that is formed by an etching process that is not anisotropic. A source gas comprising a bromine-containing gas and an oxygen-containing gas is used to etch the probe tip and flared post of the probe in a batch process. The probe tips may be qualified using any suitable criterion for use by a customer in an atomic force microscope without individual inspection.
    Type: Grant
    Filed: June 21, 2004
    Date of Patent: May 13, 2008
    Assignee: Veeco Instruments Inc.
    Inventors: Nihat Okulan, Ami Chand
  • Patent number: 7210330
    Abstract: A characterizer for determining the shape of a probe tip for an atomic force microscope and methods of fabricating and using the characterizer. The characterizer includes a micromachined crystalline structure with opposed edges separated by a width suitable for characterizing a dimension of the probe tip. At least one of the opposed edges overhangs an undercut region of the micromachined crystalline structure by an overhang distance that is greater than one third of the width. The probe tip is scanned across the edges of the characterizer for shape determination. The characterizer is formed by serially deep reactive ion etching and anisotropic etching (100) single crystal silicon. The opposed edges may be oxidation sharpened for use in profiling an end or side of the probe tip.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: May 1, 2007
    Assignee: Veeco Instruments, Inc.
    Inventors: Ami Chand, Nihat Okulan
  • Publication number: 20060277972
    Abstract: A characterizer for determining the shape of a probe tip for an atomic force microscope and methods of fabricating and using the characterizer. The characterizer includes a micromachined crystalline structure with opposed edges separated by a width suitable for characterizing a dimension of the probe tip. At least one of the opposed edges overhangs an undercut region of the micromachined crystalline structure by an overhang distance that is greater than one third of the width. The probe tip is scanned across the edges of the characterizer for shape determination. The characterizer is formed by serially deep reactive ion etching and anisotropic etching (100) single crystal silicon. The opposed edges may be oxidation sharpened for use in profiling an end or side of the probe tip.
    Type: Application
    Filed: August 24, 2006
    Publication date: December 14, 2006
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Ami Chand, Nihat Okulan
  • Publication number: 20060213289
    Abstract: A probe assembly for an instrument and a method of manufacture includes a substrate and a cantilever having a length independent of typical alignment error during fabrication. In one embodiment, the probe assembly includes a buffer section interposed between the substrate and the cantilever. The cantilever extends from the buffer section and a portion of the buffer section extends beyond an edge of the substrate. The portion of the buffer section is more stiff than the cantilever. The corresponding method of producing the probe assembly facilitates batch fabrication without compromising probe performance.
    Type: Application
    Filed: March 24, 2005
    Publication date: September 28, 2006
    Inventors: Kevin Kjoller, Ami Chand, Nihat Okulan
  • Patent number: 7096711
    Abstract: A characterizer for determining the shape of a probe tip for an atomic force microscope and methods of fabricating and using the characterizer. The characterizer includes a micromachined crystalline structure with opposed edges separated by a width suitable for characterizing a dimension of the probe tip. At least one of the opposed edges overhangs an undercut region of the micromachined crystalline structure by an overhang distance that is greater than one third of the width. The probe tip is scanned across the edges of the characterizer for shape determination. The characterizer is formed by serially deep reactive ion etching and anisotropic etching (100) single crystal silicon. The opposed edges may be oxidation sharpened for use in profiling a bottom surface of the probe tip.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: August 29, 2006
    Assignee: Veeco Instruments Inc.
    Inventors: Ami Chand, Nihat Okulan
  • Publication number: 20050279729
    Abstract: Probes for use in a scanning probe microscope and methods of manufacturing such probes. Each probe includes a probe tip having a substantially vertical sidewall formed by an anisotropic etching process and a flared post underlying the probe tip that is formed by an etching process that is not anisotropic. A source gas comprising a bromine-containing gas and an oxygen-containing gas is used to etch the probe tip and flared post of the probe in a batch process. The probe tips may be qualified using any suitable criterion for use by a customer in an atomic force microscope without individual inspection.
    Type: Application
    Filed: June 21, 2004
    Publication date: December 22, 2005
    Applicant: Veeco Instruments Inc.
    Inventors: Nihat Okulan, Ami Chand
  • Publication number: 20050252282
    Abstract: A characterizer for determining the shape of a probe tip for an atomic force microscope and methods of fabricating and using the characterizer. The characterizer includes a micromachined crystalline structure with opposed edges separated by a width suitable for characterizing a dimension of the probe tip. At least one of the opposed edges overhangs an undercut region of the micromachined crystalline structure by an overhang distance that is greater than one third of the width. The probe tip is scanned across the edges of the characterizer for shape determination. The characterizer is formed by serially deep reactive ion etching and anisotropic etching (100) single crystal silicon. The opposed edges may be oxidation sharpened for use in profiling a bottom surface of the probe tip.
    Type: Application
    Filed: May 12, 2004
    Publication date: November 17, 2005
    Applicant: Veeco Instruments, Inc.
    Inventors: Ami Chand, Nihat Okulan