Patents by Inventor Nikolaos Vourdas

Nikolaos Vourdas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the fabrication of periodic structures on polymers using plasma processes
    Patent number: 8951428
    Abstract: This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O2) or sulphur hexafluoride (SF6) or a mixture of oxygen (O2) and sulphur hexafluoride (SF6), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).
    Type: Grant
    Filed: June 15, 2009
    Date of Patent: February 10, 2015
    Inventors: Evangelos Gogolides, Angeliki Tserepi, Vassilios Constantoudis, Nikolaos Vourdas, Georgios Boulousis, Maria-Elena Vlachopoulou, Aikaterini Tsougeni, Dimitrios Kontziampasis
  • Method for the fabrication of periodic structures on polymers using plasma processes
    Publication number: 20110165382
    Abstract: This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O2) or sulphur hexafluoride (SF6) or a mixture of oxygen (O2) and sulphur hexafluoride (SF6), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).
    Type: Application
    Filed: June 15, 2009
    Publication date: July 7, 2011
    Applicant: NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS"
    Inventors: Evangelos Gogolides, Aagelike Tserepi, Vassilios Constantoudis, Nikolaos Vourdas, Georgios Boulousis, Maria-Elenma Vlachopoulou LACHOPOULOU, Aikaterini Tsougeni, Dimitrios Kontziampasis
  • Method For the Fabrication of High Surface Area Ratio and High Aspect Ratio Surfaces on Substrates
    Publication number: 20080296260
    Abstract: This invention provides a method for the fabrication of surfaces of high surface area ratio on polymeric/plastic materials, and their application in the control of the wetting properties of surfaces, of the transport of liquids on such fabricated surfaces, or of the separation of liquids in microchannels of said surfaces. The fabrication of surfaces of high surface area ratio comprises the following steps: (a) selection of a polymer/plastic layer which contains two or more components differing in their plasma etching behaviour (b) exposure of said polymer/plastic layer to an etching plasma to provide selective removal of one polymer component versus a second plasma-resistant component so as to result in a randomly rough columnar-like surface. In addition, exposure of the said surface to an oxidizing plasma or to a fluorocarbon. depositing plasma renders the surface fully hydrophilic or en super-hydrophobic, respectively.
    Type: Application
    Filed: March 8, 2006
    Publication date: December 4, 2008
    Inventors: Angeliki Tserepi, Evangelos Gogolidis, Konstantinos Misiakos, Maria-Elena Vlachopoulou, Nikolaos Vourdas