Patents by Inventor Nilay Anil Pradhan

Nilay Anil Pradhan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FinFET device fabrication using thermal implantation
    Patent number: 8722431
    Abstract: A method of forming a FinFET device. The method may include providing a substrate having a single crystalline region, heating the substrate to a substrate temperature effective for dynamically removing implant damage during ion implantation, implanting ions into the substrate while the substrate is maintained at the substrate temperature, and patterning the single crystalline region so as to form a single crystalline fin.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: May 13, 2014
    Inventors: Nilay Anil Pradhan, Stanislav S. Todorov, Kurt Decker-Lucke, Klaus Petry, Benjamin Colombeau, Baonian Guo
  • Finfet Device Fabrication Using Thermal Implantation
    Publication number: 20130252349
    Abstract: A method of forming a FinFET device. The method may include providing a substrate having a single crystalline region, heating the substrate to a substrate temperature effective for dynamically removing implant damage during ion implantation, implanting ions into the substrate while the substrate is maintained at the substrate temperature, and patterning the single crystalline region so as to form a single crystalline fin.
    Type: Application
    Filed: March 22, 2012
    Publication date: September 26, 2013
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Nilay Anil Pradhan, Stanislav S. Todorov, Kurt Decker-Lucke, Klaus Petry, Benjamin Colombeau, Baonian Guo