Patents by Inventor Nirmalya Moitra

Nirmalya Moitra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing surface-modified base material, method for producing joined body, new hydrosilane compound, surface treatment agent, surface treatment agent kit, and surface-modified base material
    Patent number: 10227493
    Abstract: The method for producing a surface-modified base material according to the present invention includes a step of bringing a base material having a polar group present on a surface thereof into contact with a hydrosilane compound having a molecular structure A and having a Si—H group composed of a silicon atom of the molecular structure A and a hydrogen atom bonded to the silicon atom in the presence of a borane catalyst so as to allow a dehydrocondensation reaction to take place between the base material and the compound, thereby forming the base material surface-modified with the molecular structure A. This production method is capable of surface-modifying a base material at a lower temperature in a shorter time than conventional methods and allows a wide variety of options for the form, type, and application of the base material, the mode of the modification reaction, and the type of the molecular structure with which the base material is surface-modified.
    Type: Grant
    Filed: March 9, 2015
    Date of Patent: March 12, 2019
    Assignee: KYOTO UNIVERSITY
    Inventors: Kazuki Nakanishi, Nirmalya Moitra, Kazuyoshi Kanamori, Toyoshi Shimada
  • METHOD FOR PRODUCING SURFACE-MODIFIED BASE MATERIAL, METHOD FOR PRODUCING JOINED BODY, NEW HYDROSILANE COMPOUND, SURFACE TREATMENT AGENT, SURFACE TREATMENT AGENT KIT, AND SURFACE-MODIFIED BASE MATERIAL
    Publication number: 20170022223
    Abstract: The method for producing a surface-modified base material according to the present invention includes a step of bringing a base material having a polar group present on a surface thereof into contact with a hydrosilane compound having a molecular structure A and having a Si—H group composed of a silicon atom of the molecular structure A and a hydrogen atom bonded to the silicon atom in the presence of a borane catalyst so as to allow a dehydrocondensation reaction to take place between the base material and the compound, thereby forming the base material surface-modified with the molecular structure A. This production method is capable of surface-modifying a base material at a lower temperature in a shorter time than conventional methods and allows a wide variety of options for the form, type, and application of the base material, the mode of the modification reaction, and the type of the molecular structure with which the base material is surface-modified.
    Type: Application
    Filed: March 9, 2015
    Publication date: January 26, 2017
    Inventors: Kazuki NAKANISHI, Nirmalya MOITRA, Kazuyoshi KANAMORI, Toyoshi SHIMADA
  • Functionalisable Polysilylated Organosilane Precursors
    Publication number: 20150232489
    Abstract: The present invention concerns a funtionalisable polysilylated organosilane precursors with formula (I): in which: Z1 represents a moiety with formula (a) and Z2 represents a moiety with formula (b) Z1 and Z2 simultaneously represent a moiety chosen from the moieties R7R8Si(OH), R9Si(OH)2, Si(OH)3, R7R8SiO1/2, R9SiO or Si03/2; U represents a moiety chosen from the moieties with formulas (U1), (U2), (U3), (U4), (U5), (U6), (U7), (U8).
    Type: Application
    Filed: July 8, 2013
    Publication date: August 20, 2015
    Applicants: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.), ECOLE NATIONALE SUPERIEURE DE CHIMIE DE DE MONTPEILLIER, UNIVERSITE MONTPELLIER 2, SCIENCES ET TECHNIQUES
    Inventors: Michel Wong Chi Man, Xavier Cattoen, Nirmalya Moitra, Kristyna Burglova, Jana Hodacova