Patents by Inventor Nitigya Kathuria

Nitigya Kathuria has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical measurement of opening dimensions in a wafer
    Patent number: 10157457
    Abstract: A method of generating 3D information of a sample using an optical microscope includes: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps, capturing an image at each pre-determined step, determining a characteristic value of each pixel in each captured image, determining a first captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image, and determining a measurement of an opening in the first surface of the sample based on the first captured image. The first surface of the sample and the second surface of the sample are within a field of view of each of the captured images. The first captured image includes a pattern overlay. In another example, the opening measurement is determined using a second captured image without a pattern overlay.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: December 18, 2018
    Assignee: KLA-TENCOR CORPORATION
    Inventors: James Jianguo Xu, Ronny Soetarman, Ken Kinsun Lee, Nitigya Kathuria
  • OPTICAL MEASUREMENT OF OPENING DIMENSIONS IN A WAFER
    Publication number: 20180047148
    Abstract: A method of generating 3D information of a sample using an optical microscope includes: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps, capturing an image at each pre-determined step, determining a characteristic value of each pixel in each captured image, determining a first captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image, and determining a measurement of an opening in the first surface of the sample based on the first captured image. The first surface of the sample and the second surface of the sample are within a field of view of each of the captured images. The first captured image includes a pattern overlay. In another example, the opening measurement is determined using a second captured image without a pattern overlay.
    Type: Application
    Filed: October 31, 2016
    Publication date: February 15, 2018
    Inventors: James Jianguo Xu, Ronny Soetarman, Ken Kinsun Lee, Nitigya Kathuria