Abstract: A gas port assembly is provided for supplying or removing one or more gases to a powered electrode in a plasma processing chamber. The chamber has at least one electrode (11) to which an alternating electrical potential is applied in use, the assembly being electrically insulated from the electrode(s). The assembly comprises, a number of dielectric members (15) and a number of electrically conductive members (16). The members are arranged in a stack of alternating dielectric and electrically conductive members. Each member comprises at least one gas pathway for the passage of the gas(es), such that when stacked, the gas pathways are in communication with each other and the gas(es) are able to pass between an outer side of the stack and a chamber side of the stack. The members act as a capacitive divider to reduce high voltages within the assembly.

Abstract: A gas port assembly is provided for supplying or removing one or more gases to a powered electrode in a plasma processing chamber. The chamber has at least one electrode (11) to which an alternating electrical potential is applied in use, the assembly being electrically insulated from the electrode(s). The assembly comprises, a number of dielectric members (15) and a number of electrically conductive members (16). The members are arranged in a stack of alternating dielectric and electrically conductive members. Each member comprises at least one gas pathway for the passage of the gas(es), such that when stacked, the gas pathways are in communication with each other and the gas(es) are able to pass between an outer side of the stack and a chamber side of the stack. The members act as a capacitive divider to reduce high voltages within the assembly.

Abstract: Plasma processing apparatus is provided having a chamber (1), first (3) and second (8) electrodes, and power supply (10) to generate the plasma. The first electrode (3) is formed from a nickel alloy having substantially planar upper (16) and lower (17) surfaces. A heater (4) heats at least the first electrode (3) to a processing temperature. The heater (4) comprises one or more heating members (15) arranged in a substantially planar manner, the heater (4) and first electrode (3) forming an assembly such that the parts of the one or more heating members (15) that are closest to an upper surface (16) of the first electrode (3), define a first plane (18) that is separated from the upper surface (16) by a distance Y, the parts of the one or more heating members (15) that are furthest from the upper surface (16) of the first electrode (3), define a second plane (19), where in the separation of the first (18) and second (19) planes defines a heater thickness X and wherein Y lies in the range 1.2X to 3X.