Abstract: Methods of determining relative spatial parameters between two substrates in a process of alignment are described. Generally, multiple alignment data may be collected from phase information using a pair of alignment marks.

Abstract: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.

Abstract: The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.

Abstract: In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.

Abstract: A microstructured antireflective texture is disclosed comprised of an engineered array of protuberances arranged on a non-periodic lattice. The average distance between said protuberances is in the subwavelength regime of the waveband for which the antireflective effect is desired. The non-periodic arrangement of protuberances acts to suppress blue-green backscattered light that is commonly seen diffracting from antireflective textures that use strictly periodic lattice arrangements. Embodiments of the invention include the randomized square pattern, and the quasicrystal pattern.

Abstract: A method employing a photolithography mask for producing microtextured antireflective surfaces is disclosed. The photolithography mask is used during the exposure of photoresist to a pattern of ultraviolet light. The exposed photoresist is subsequently processed to obtain a microtextured surface possessing antireflective properties. The antireflective surface profile comprises an array of sub-micron protuberances that may reside in a periodic arrangement, a quasiperiodic arrangement, or in an arbitrary non-periodic arrangement. The antireflective surface is designed for visible light. It may be scaled-up to large areas, and is suitable for replication into inexpensive polymer materials.

Abstract: A microstructured antireflective texture is disclosed comprised of an engineered array of protuberances arranged on a non-periodic lattice. The average distance between said protuberances is in the subwavelength regime of the waveband for which the antireflective effect is desired. The non-periodic arrangement of protuberances acts to suppress blue-green backscattered light that is commonly seen diffracting from antireflective textures that use strictly periodic lattice arrangements. Embodiments of the invention include the randomized square pattern, and the quasicrystal pattern.