Patents by Inventor Noah Hershkowitz
Noah Hershkowitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7875867Abstract: An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma.Type: GrantFiled: December 3, 2008Date of Patent: January 25, 2011Assignee: Wisconsin Alumni Research FoundationInventors: Noah Hershkowitz, Benjamin Longmier, Scott Baalrud
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Colloidal nanoparticles and apparatus for producing colloidal nanoparticles in a dense medium plasma
Patent number: 7807112Abstract: An apparatus is utilized for producing colloidal dispersions of nanoparticles of electrically conducting materials. The colloidal dispersions are produced in a dense media plasma reactor comprising at least one static electrode and at least one rotating electrode. The plasma reaction sputters off minute particles of the electrically conducting material from which the electrodes are made. Methods of using the colloidal dispersions thus made are also described. Colloidal dispersions of silver produced in this manner are highly effective for bactericidal purposes.Type: GrantFiled: September 22, 2006Date of Patent: October 5, 2010Assignee: Wisconsin Alumni Research FoundationInventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz -
Publication number: 20090140176Abstract: An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma.Type: ApplicationFiled: December 3, 2008Publication date: June 4, 2009Inventors: Noah Hershkowitz, Benjamin Longmier, Scott Baalrud
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Patent number: 7498592Abstract: An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma.Type: GrantFiled: June 28, 2006Date of Patent: March 3, 2009Assignee: Wisconsin Alumni Research FoundationInventors: Noah Hershkowitz, Benjamin Longmier, Scott Baalrud
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Publication number: 20080067430Abstract: An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma.Type: ApplicationFiled: June 28, 2006Publication date: March 20, 2008Inventors: Noah Hershkowitz, Benjamin Longmier, Scott Baalrud
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Colloidal nanoparticles and apparatus for producing colloidal nanoparticles in a dense medium plasma
Publication number: 20070013317Abstract: An apparatus is utilized for producing colloidal dispersions of nanoparticles of electrically conducting materials. The colloidal dispersions are produced in a dense media plasma reactor comprising at least one static electrode and at least one rotating electrode. The plasma reaction sputters off minute particles of the electrically conducting material from which the electrodes are made. Methods of using the colloidal dispersions thus made are also described. Colloidal dispersions of silver produced in this manner are highly effective for bactericidal purposes.Type: ApplicationFiled: September 22, 2006Publication date: January 18, 2007Inventors: Ferencz Denes, Sorin Manolache, Noah Hershkowitz -
Patent number: 7128816Abstract: A method and apparatus is utilized for producing colloidal dispersions of nanoparticles of electrically conducting materials. The colloidal dispersions are produced in a dense media plasma reactor comprising at least one static electrode and at least one rotating electrode. The plasma reaction sputters off minute particles of the electrically conducting material from which the electrodes are made. Methods of using the colloidal dispersions thus made are also described. Colloidal dispersions of silver produced in this manner are highly effective for bactericidal purposes.Type: GrantFiled: June 13, 2001Date of Patent: October 31, 2006Assignee: Wisconsin Alumni Research FoundationInventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz
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Patent number: 6764658Abstract: A plasma generator includes several plasma sources distributed in an array for plasma treatment of surfaces. Each plasma source includes first and second conductive electrodes. Each second electrode has a gas passage defined therein, and one of the first electrodes is situated within the gas passage in spaced relation from the second electrode, with each gas passage thereby constituting the free space for plasma generation between each pair of first and second electrodes. An insulating layer is interposed between the first and second electrodes to facilitate plasma formation via dielectric barrier discharge (DBD) in the gas passages between the first and second electrodes. The first electrodes may be provided in a monolithic structure wherein they all protrude from a common bed, and similarly the second electrodes may be monolithically formed by defining the gas passages within a common second electrode member.Type: GrantFiled: January 8, 2002Date of Patent: July 20, 2004Assignee: Wisconsin Alumni Research FoundationInventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz
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Publication number: 20030129107Abstract: A plasma generator includes several plasma sources distributed in an array for plasma treatment of surfaces. Each plasma source includes first and second conductive electrodes. Each second electrode has a gas passage defined therein, and one of the first electrodes is situated within the gas passage in spaced relation from the second electrode, with each gas passage thereby constituting the free space for plasma generation between each pair of first and second electrodes. An insulating layer is interposed between the first and second electrodes to facilitate plasma formation via dielectric barrier discharge (DBD) in the gas passages between the first and second electrodes. The first electrodes may be provided in a monolithic structure wherein they all protrude from a common bed, and similarly the second electrodes may be monolithically formed by defining the gas passages within a common second electrode member.Type: ApplicationFiled: January 8, 2002Publication date: July 10, 2003Inventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz
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Publication number: 20020037320Abstract: A method and apparatus is utilized for producing colloidal dispersions of nanoparticles of electrically conducting materials. The colloidal dispersions are produced in a dense media plasma reactor comprising at least one static electrode and at least one rotating electrode. The plasma reaction sputters off minute particles of the electrically conducting material from which the electrodes are made. Methods of using the colloidal dispersions thus made are also described. Colloidal dispersions of silver produced in this manner are highly effective for bactericidal purposes.Type: ApplicationFiled: June 13, 2001Publication date: March 28, 2002Inventors: Ferencz S. Denes, Sorin O. Manolache, Noah Hershkowitz
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Patent number: 6034781Abstract: A plasma probe enables simultaneous localized electrostatic measurements and optical emission spectroscopy. The probe has a support arm with an elongated longitudinally extending section and a bend section at the end of which is supported an electrical probe element composed of back-to-back charge collection plates separated by an insulating spacer. The inner plate faces an opening in the end of the elongated support arm section which defines a collimating channel. An optical fiber extends through the support arm and has an aperture in the collimating channel to receive light emitted from the plasma between the end of the elongated section of the support arm and the inner charge collection plate. The electrical probe element acts as a blocking element to block light emitted from the plasma outside of the region between the electrical probe element and the end of the support arm section.Type: GrantFiled: May 26, 1998Date of Patent: March 7, 2000Assignee: Wisconsin Alumni Research FoundationInventors: Moshe Sarfaty, Noah Hershkowitz
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Patent number: 5032205Abstract: A glow discharge etching apparatus includes a magnetic assembly for creating a surface magnetic field in close proximity to the walls of an etching chamber. An electrode is located within the chamber for supporting the object to the etched. A radio frequency signal is applied to the electrode so that it will emit secondary electrons upon bombardment by ions from an etching plasma created within the apparatus. A control plate may be positioned at various locations within the apparatus to regulate the amount of electron leakage to the control plate and thereby regulate the etching process. This apparatus provides improved uniformity and directionality of etching due to a low gas pressure and the surface magnetic field.Type: GrantFiled: May 5, 1989Date of Patent: July 16, 1991Assignee: Wisconsin Alumni Research FoundationInventors: Noah Hershkowitz, Moo-Hyun Cho