Patents by Inventor Noboru Okazaki

Noboru Okazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5382356
    Abstract: The feature of the present invention resides in that when a polyelectrolyte coagulant is added to sludge to dewater the sludge in a sewage treatment plant, the dosage level of the polyelectrolyte coagulant to be to the sludge is controlled most properly, whereby moisture content of dewatered cake can be minimized.
    Type: Grant
    Filed: June 10, 1992
    Date of Patent: January 17, 1995
    Assignees: Tokyo Metropolitan, Tokyo Metropolitan Sewerage Service Corp., Japan Organo Co., Ltd.
    Inventors: Makoto Thogho, Tamotsu Hattori, Noboru Okazaki, Kozaburo Akamatus, Tomoyuki Hayashi, Tomohiko Kusumi
  • Patent number: 4174222
    Abstract: A gallic acid alkyl ester or a gallic acid aryl ester is reacted in an inert solvent with 3 equivalents of naphthoquinone-(1,2)-diazido-(2)-sulfonyl chloride in the presence of an alkali to effect sulfonylation of 3 hydroxyl groups in the gallic acid moiety whereby a photodecomposable naphthoquinone-(1,2)-diazido-(2)-sulfonic acid ester is obtained. The new naphthoquinonediazido derivative thus obtained is mixed with an alkali-soluble phenol resin such as m-cresol novolac resin or phenol novolac resin to prepare a positive-type photoresist composition having high sensitivity and high resolving power as well as excellent dimensional accuracy and etching-resistance. In addition, this composition forms a good photosensitive film and can be a good ink receptor.
    Type: Grant
    Filed: February 27, 1978
    Date of Patent: November 13, 1979
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventors: Takashi Komine, Akira Yokota, Hisashi Nakane, Shingo Asaumi, Noboru Okazaki