Patents by Inventor Nobuaki Sasaki

Nobuaki Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6716993
    Abstract: The invention provides novel compounds which show high sensitivity to near-infrared rays in the region of 750-950 nm and, when processed to give films and so forth, undergo only slight discoloration and retain high transparency, hence can be used as near-infrared absorbing materials, together with an intermediate thereof. Thus provided are polymethine compounds of the general formula (I): wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, R3 represents an alkyl group, which may optionally be substituted, L represents an alkylene group necessary for the formation of a cyclic structure, X represents a hydrogen atom, a halogen atom or a substituted amino group, and Z represents an acidic residue, as well as near-infrared absorbing materials comprising the same.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: April 6, 2004
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Shigeo Fujita, Yasuhisa Iwasaki
  • Publication number: 20030232999
    Abstract: The invention provides novel compounds which show high sensitivity to near-infrared rays in the region of 750-950 nm and, when processed to give films and so forth, undergo only slight discoloration and retain high transparency, hence can be used as near-infrared absorbing materials, together with an intermediate thereof.
    Type: Application
    Filed: June 4, 2003
    Publication date: December 18, 2003
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Shigeo Fujita, Yasuhisa Iwasaki
  • Publication number: 20020051939
    Abstract: The invention provides a near-infrared absorbing material showing a high sensitivity to a YAG laser having an emission wavelength of 900˜1100 nm as well as a high photothermal conversion efficiency, an original plate for direct printing plate making which utilizes the near-infrared absorbing material, and a novel polymethine compound represented by the following general formula (1), of which the above near-infrared absorbing material is comprised.
    Type: Application
    Filed: September 11, 2001
    Publication date: May 2, 2002
    Inventors: Nobuaki Sasaki, Sayuri Wada, Shigeo Fujita, Yasuhisa Iwasaki
  • Patent number: 6342335
    Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.
    Type: Grant
    Filed: June 20, 2000
    Date of Patent: January 29, 2002
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki
  • Patent number: 6261737
    Abstract: The invention provides near infrared absorbers showing high light-to-heat conversion efficiency and high sensitivity to laser beams whose emission region is within the range of 750 nm to 900 nm, plates for direct printing plate making, and novel compounds which can be used in such absorbers or plates. The compounds are polymethine compounds of the general formula (I) shown below and the near infrared absorbers comprise the polymethine compounds.
    Type: Grant
    Filed: November 23, 1999
    Date of Patent: July 17, 2001
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Shigeo Fujita, Nobuaki Sasaki, Yasuhisa Iwasaki
  • Patent number: 5990353
    Abstract: The arylsulfonylureide compound which is of value as a color developer is provided in high yield and high purity by a simple procedure. The technology of the invention for producing an arylsulfonylureide compound of general formula (1)(Ar.sup.1 --SO.sub.2 NHCONH).sub.n --Ar.sup.2 (1)wherein Ar.sup.1 represents an aromatic residue; Ar.sup.2 represents a bivalent or trivalent aromatic residue; n represents an integer of 2 or 3 comprises reacting an arylsulfonamide alkali metal salt of general formula (2)Ar.sup.1 --SO.sub.2 NH.B (2)wherein B represents an alkali metal with an aromatic isocyanate compound of general formula (3)Ar.sup.2 --(NCO).sub.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: November 23, 1999
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Nobuaki Sasaki, Bunji Sawano, Mansuke Matsumoto, Toshihiko Kawabata
  • Patent number: 5710335
    Abstract: A process for preparing a 3-(N,N-disubstituted amino)phenol is herein disclosed which comprises reacting resorcin with a primary amine represented by formula (2):R.sup.1 NH.sub.2 (2)wherein R.sup.1 is an alkyl group, a cycloalkyl group, an alkenyl group, an alkoxyalkyl group, an aryl group or an aralkyl group,terminating the reaction when the conversion of resorcin is 50 mol % or more and when the amount of an N,N'-disubstituted-m-phenylenediamine as a by-product is 2 mol % or less of the amount of used resorcin, adding an alkyl halide represented by formula (3):R.sup.2 X (3)wherein R.sup.2 is an alkyl group or a cycloalkyl group; and X is a halogen atom,to the obtained reaction mixture, adding an aqueous alkaline solution to the resultant reaction mixture to dissolve unreacted resorcin in the aqueous phase, extracting the 3-(N,N-disubstituted amino)phenol with an organic solvent, and then recovering unreacted resorcin from the aqueous phase.
    Type: Grant
    Filed: October 4, 1996
    Date of Patent: January 20, 1998
    Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.
    Inventors: Kenichiro Horiuchi, Bunji Sawano, Nobuaki Sasaki, Mansuke Matsumoto
  • Patent number: 5691272
    Abstract: A heat-sensitive recording material which has a support and a heat-sensitive recording layer containing at least one carboxylate represented by the following formula (1) or (2) ##STR1## wherein a ring X is an aromatic residue which may have a substitute; the other substituents are as defined herein. The heat-sensitive recording material exhibits excellent color image stability and can provide an optically character-readable sharp image.
    Type: Grant
    Filed: August 14, 1996
    Date of Patent: November 25, 1997
    Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.
    Inventors: Mansuke Matsumoto, Nobuaki Sasaki, Bunji Sawano, Kiyoharu Hasegawa, Kazuyoshi Kikkawa
  • Patent number: 5559247
    Abstract: A carboxylate is herein disclosed which is represented by the formula (1) or (2) ##STR1## wherein a ring X is an aromatic residue which may have a substituent; the other substitutents are as defined herein. A heat-sensitive recording material comprising this carboxylate is excellent in the stability of the color image and can provide an optically character-readable sharp color image.
    Type: Grant
    Filed: April 14, 1995
    Date of Patent: September 24, 1996
    Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.
    Inventors: Mansuke Matsumoto, Nobuaki Sasaki, Bunji Sawano, Kiyoharu Hasegawa, Kazuyoshi Kikkawa
  • Patent number: RE39105
    Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: May 23, 2006
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki