Patents by Inventor Nobuhide Tominaga

Nobuhide Tominaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9594302
    Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: March 14, 2017
    Assignee: ADEKA CORPORATION
    Inventors: Takeo Oishi, Koichi Kimijima, Nobuhide Tominaga, Hirokatsu Shinano, Daisuke Sawamoto, Kiyoshi Murata
  • Publication number: 20150064623
    Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R5, R6, R7, R8, R9, R10, and R11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.
    Type: Application
    Filed: March 5, 2013
    Publication date: March 5, 2015
    Inventors: Takeo Oishi, Koichi Kimijima, Nobuhide Tominaga, Hirokatsu Shinano, Daisuke Sawamoto
  • Patent number: 8202679
    Abstract: An oxime ester compound of formula (I) useful as a photopolymerization initiator. A photopolymerization initiator having the oxime ester compound as an active ingredient is activated through efficient absorption of light of long wavelength, e.g., 405 nm or 365 nm, to exhibit high sensitivity. In formula (I), R1 and R2 are each R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 are each hydrogen, a C1-C20 alkyl group, C6-C30 aryl group, a C7-C30 arylalkyl group, or a C2-C20 heterocyclic group; R3 and R4 are each R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, halogen, or a hydroxyl group; a and b is each 0 to 4; X is oxygen, sulfur, selenium, CR31R32, CO, NR33, or PR34; and R31, R32, R33, and R34 each have the same meaning as R1.
    Type: Grant
    Filed: December 25, 2007
    Date of Patent: June 19, 2012
    Assignee: Adeka Corporation
    Inventors: Daisuke Sawamoto, Nobuhide Tominaga
  • Publication number: 20100249262
    Abstract: An oxime ester compound of formula (I) useful as a photopolymerization initiator. A photopolymerization initiator having the oxime ester compound as an active ingredient is activated through efficient absorption of light of long wavelength, e.g., 405 nm or 365 nm, to exhibit high sensitivity. In formula (I), R1 and R2 are each R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 are each hydrogen, a C1-C20 alkyl group, C6-C30 aryl group, a C7-C30 arylalkyl group, or a C2-C20 heterocyclic group; R3 and R4 are each R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, halogen, or a hydroxyl group; a and b is each 0 to 4; X is oxygen, sulfur, selenium, CR31R32, CO, NR33, or PR34; and R31, R32, R33, and R34 each have the same meaning as R1.
    Type: Application
    Filed: December 25, 2007
    Publication date: September 30, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Daisuke Sawamoto, Nobuhide Tominaga
  • Patent number: 6432875
    Abstract: A thermal recording material includes a condensation reaction product of a carboxylic acid component (A) with a polyhydric alcohol component (B) in a thermal recording layer as an essential component, wherein the carboxylic acid component (A) includes (poly) 4-hydroxybenzoic acid represented by the following general formula (I) as an essential component and another monocarboxylic acid and/or dicarboxylic acid as an arbitrary component, and wherein the polyhydric alcohol component (B) includes a polyhydric alcohol which is a trihydric or more alcohol as an essential component and a dihydric low molecular-weight alcohol as an arbitrary component. wherein in the general formula(I), a letter p denotes an integer ranging from 0 to 2.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: August 13, 2002
    Assignee: Asahi Denka Kogyo K.K.
    Inventors: Mitsuo Akutsu, Nobuhide Tominaga, Keiji Ohya, Koichi Shigeno, Takahiro Mori
  • Patent number: 5728646
    Abstract: A heat-sensitive recording material, comprising a heat-sensitive recording layer containing at least one acid hydrazide compound represented by the following general formula (I): ##STR1## wherein X.sub.1 and X.sub.2 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom or an alkyl group or alkoxy group having 1 to 10 carbon atoms, A represents --CO-- or --SO.sub.2 --, n is 1 or 2, when n is 1, R.sub.1 represents an alkyl group, an aryl group, a hydroxyaryl group, an alkoxyaryl group, or an alkylaryl group having 1 to 22 carbon atoms and when n is 2, R.sub.1 represents an alkylene group or arylene group having 1 to 18 carbon atoms or a direct bond.
    Type: Grant
    Filed: November 5, 1996
    Date of Patent: March 17, 1998
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Nobuhide Tominaga, Keiji Oya
  • Patent number: 5607894
    Abstract: The heat-sensitive recording material of the present invention comprises a heat-sensitive recording layer containing at least one resorcylic anilide derivative represented by the following general formula: ##STR1## wherein R.sub.1 represents an alkyl or alkoxy, group having 1 to 4 carbon atoms and R.sub.2 represents a hydrogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 4, 1997
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Nobuhide Tominaga, Keiji Oya, Athuo Tomita, Kouichi Shigeno
  • Patent number: 5334484
    Abstract: A photopolymerizable composition comprising: (a) 100 parts by weight of a compound having at least one ethylenically unsaturated group, (b) 0 to 400 parts by weight of a thermoplastic organic polymer and (c) 0.01 to 20 parts by weight of a photoinitiator, characterized in that an acridine compound of the following general formula (I) is used as the photoinitiator: ##STR1## wherein R represents an alkylene, oxadialkylene or thiodialkylene group having 2 to 20 carbon atoms,and a photopolymerizable element comprising a layer of the photopolymerizable composition formed on a support.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: August 2, 1994
    Assignees: Hitachi Chemical Co., Ltd., Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Yoshitaka Minami, Hajime Kakumaru, Naohiro Kubota, Nobuhide Tominaga, Koji Ishizaki
  • Patent number: 4105627
    Abstract: Improved clarity and resistance to deterioration on heating of polyvinyl fluoride and vinyl chloride polymers is obtained by employing a stabilizer composition consisting essentially of (A) a heterocyclic nitrogen compound having as part of a 5 or 6 membered heterocyclic ring the group ##STR1## in which R is hydrogen, aryl, or alkyl having 1 to 12 carbon atoms, and X is oxygen or sulfur, and (B) one or more 1,2-epoxides, organic phosphites, or stannous tin, zinc, magnesium, aluminum, potassium, sodium, calcium, strontium, or barium salts of non-nitrogenous monocarboxylic acids having from 6 to 24 carbon atoms or hydrocarbon-substituted phenols having from about 10 to about 30 carbon atoms.
    Type: Grant
    Filed: September 20, 1976
    Date of Patent: August 8, 1978
    Assignee: Argus Chemical Corporation
    Inventors: Tetsuo Sekiguchi, Masami Abe, Kouji Tsuruga, Nobuhide Tominaga