Patents by Inventor Nobuhiko Sakai
Nobuhiko Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11932781Abstract: The present invention provides an effect pigment dispersion that contains water, a wetting agent (A), a flake-effect pigment (B), and specific cellulose nanofibers (C). The effect pigment dispersion has a solids content of 0.1 to 10 parts by mass, per 100 parts by mass of all of the components of the effect pigment dispersion; and has a viscosity of 100 to 10000 mPa·sec as measured with a Brookfield viscometer at a rotational speed of 6 revolutions per minute.Type: GrantFiled: September 24, 2019Date of Patent: March 19, 2024Assignee: KANSAI PAINT CO., LTD.Inventors: Kenji Sakai, Nobuhiko Narita
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Publication number: 20240086146Abstract: A content playback device includes: a network interface that receives the current perceived temperature information for a person in a specific area from a server via a communication network; a memory that stores the perceived temperature information and date information indicating the current date; and a central processing unit (CPU) that causes the memory to store the perceived temperature information received by the network interface, selects playback content from a plurality of pieces of content, based on the perceived temperature information and the date information, and plays back the playback content.Type: ApplicationFiled: November 17, 2023Publication date: March 14, 2024Inventors: Toya Kitagawa, Nobuhiko WASHIO, Takeshi SAKAI
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Patent number: 11548984Abstract: An object of the present invention is to provide a light- or heat-curing method by which a cured product (crosslinked product or resin) can be prepared in a simple method even in a case where filler is contained in a large amount; a curable resin composition which is used in the curing method; and the like.Type: GrantFiled: June 12, 2018Date of Patent: January 10, 2023Assignee: FUJIFILM Wako Pure Chemical CorporationInventors: Tadashi Nakano, Nobuhiko Sakai, Kosuke Yanaba, Shigeaki Imazeki
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Patent number: 10774062Abstract: An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound. Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group.Type: GrantFiled: January 25, 2017Date of Patent: September 15, 2020Assignees: FUJIFILM Wako Pure Chemical Corporation, TOKYO UNIVERSITY OF SCIENCE FOUNDATIONInventors: Nobuhiko Sakai, Kosuke Yanaba, Shigeaki Imazeki, Koji Arimitsu
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Publication number: 20200123324Abstract: An object of the present invention is to provide a light- or heat-curing method by which a cured product (crosslinked product or resin) can be prepared in a simple method even in a case where filler is contained in a large amount; a curable resin composition which is used in the curing method; and the like.Type: ApplicationFiled: June 12, 2018Publication date: April 23, 2020Inventors: Tadashi NAKANO, Nobuhiko SAKAI, Kosuke YANABA, Shigeaki IMAZEKI
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BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
Publication number: 20190359561Abstract: It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.Type: ApplicationFiled: August 9, 2019Publication date: November 28, 2019Inventors: Nobuhiko SAKAI, Kosuke YANABA, Koji ARIMITSU -
Patent number: 10451967Abstract: It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical.Type: GrantFiled: November 21, 2014Date of Patent: October 22, 2019Assignee: FUJIFILM Wako Pure Chemical CorporationInventors: Nobuhiko Sakai, Kosuke Yanaba
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Base generator, base-reactive composition containing said base generator, and base generation method
Patent number: 10428014Abstract: The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.Type: GrantFiled: June 25, 2014Date of Patent: October 1, 2019Assignees: FUJIFILM Wako Pure Chemical Corporation, Tokyo University of Science FoundationInventors: Nobuhiko Sakai, Kosuke Yanaba, Koji Arimitsu -
Patent number: 10428015Abstract: The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on.Type: GrantFiled: July 22, 2016Date of Patent: October 1, 2019Assignee: FUJIFILM Wako Pure Chemical CorporationInventors: Kosuke Yanaba, Nobuhiko Sakai, Shigeaki Imazeki
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Publication number: 20190055210Abstract: An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound. Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group.Type: ApplicationFiled: January 25, 2017Publication date: February 21, 2019Applicant: FUJIFILM Wako Pure Chemical CorporationInventors: Nobuhiko SAKAI, Kosuke YANABA, Shigeaki IMAZEKI, Koji ARIMITSU
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Publication number: 20190002403Abstract: The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on.Type: ApplicationFiled: July 22, 2016Publication date: January 3, 2019Inventors: Kosuke YANABA, Nobuhiko SAKAI, Shigeaki IMAZEKI
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Patent number: 10100070Abstract: A compound capable of providing a composition having high storage stability without reacting with a base-reactive compound, even when stored in a mixed state with the base-reactive compound, as well as capable of generating a strong base by irradiation of light (active energy rays) or heating. A base generator comprises the compound and a base-reactive composition comprises the base generator and the base-reactive compound. The compound is represented by the general formula (A).Type: GrantFiled: January 22, 2015Date of Patent: October 16, 2018Assignee: FUJIFILM Wako Pure Chemical CorporationInventors: Nobuhiko Sakai, Kosuke Yanaba
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Publication number: 20160342084Abstract: It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical.Type: ApplicationFiled: November 21, 2014Publication date: November 24, 2016Inventors: Nobuhiko SAKAI, Kosuke YANABA
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Publication number: 20160340374Abstract: An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound.Type: ApplicationFiled: January 22, 2015Publication date: November 24, 2016Inventors: Nobuhiko SAKAI, Kosuke YANABA
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BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
Publication number: 20160122292Abstract: It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.Type: ApplicationFiled: June 25, 2014Publication date: May 5, 2016Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATIONInventors: Nobuhiko SAKAI, Kosuke YANABA, Koji ARIMITSU -
Patent number: 8957212Abstract: There is intended to provide the novel compounds which generate a base easily when irradiated with long wavelength light (active energy rays), a photobase generator containing the compounds and a photobase generation method, and the present invention relates to the compounds represented by the general formula [1], a photobase generator containing the compounds and a photobase generation method: (wherein, Ar represents any of groups with specific structures selected from the group consisting of an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R1 and R2 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or represent ones which can form an alicyclic ring containing nitrogen atom(s) or an aromatic ring containing nitrogen atom(s) together with a nitrogen atom to which they are bound, which the rings having 3 to 8 carbon atoms which may have a substituent, R3 and R4 each independently represent a hydrogen atom, a linear, brancType: GrantFiled: December 1, 2009Date of Patent: February 17, 2015Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Ayako Kuramoto, Motoshige Sumino, Nobuhiko Sakai
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Publication number: 20110233048Abstract: There is intended to provide the novel compounds which generate a base easily when irradiated with long wavelength light (active energy rays), a photobase generator containing the compounds and a photobase generation method, and the present invention relates to the compounds represented by the general formula [1], a photobase generator containing the compounds and a photobase generation method: (wherein, Ar represents any of groups with specific structures selected from the group consisting of an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R1 and R2 each independently represent a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or represent ones which can form an alicyclic ring containing nitrogen atom(s) or an aromatic ring containing nitrogen atom(s) together with a nitrogen atom to which they are bound, which the rings having 3 to 8 carbon atoms which may have a substituent, R3 and R4 each independently represent a hydrogen atom, a linear, brancType: ApplicationFiled: December 1, 2009Publication date: September 29, 2011Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.Inventors: Ayako Kuramoto, Motoshige Sumino, Nobuhiko Sakai
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Patent number: 4913785Abstract: There is disclosed a process for preparing hot-dip metal coated steel sheets having excellent corrosion resistance comprising electrolytically plating steel sheets containing Si and/or Cr with an Fe-B alloy containing 0.001.about.0.3% by weight of B to the thickness of 0.05.about.5 g/m.sup.2 and thereafter hot-dip-coating the thus pre-plated substrate sheets with a molten bath of Zn, Al or Zn-Al alloy. By this process poorly wettable steel sheets containing silicon and/or chromium can be well coated with zinc, aluminum and zinc-aluminum alloy.Type: GrantFiled: January 17, 1989Date of Patent: April 3, 1990Assignee: Nisshin Steel Company, Ltd.Inventors: Yukio Uchida, Yasunori Hattori, Yusuke Hirose, Nobuo Hatanaka, Nobuhiko Sakai
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Patent number: 4878960Abstract: There is disclosed a process for preparing alloyed-zinc-plated steel sheet having excellent deep drawability, which comprises adjusting the temperature of substrate steel sheet of titanium-killed steel essentially consisting of C.ltoreq.0.01%, Si<0.15%, Mn: 0.15-0.85%, Ti: 0.05-0.30%, P.ltoreq.0.02%, S.ltoreq.0.02%, Al.ltoreq.0.05% and balance of Fe, to a temperature within a temperature range T(.degree.C.) defined as 180.ltoreq.T.ltoreq.-240.times.W+292, wherein W(%) is the Ti content of the substrate steel sheet, subjecting said steel sheet to Zn-plating by vacuum vapor deposition, and thereafter maintaining the plated steel sheet for alloying the plating zinc layer and the substate steel at 220.degree..about.320.degree. C. for 1-50 hours in accordance with Ti content of the substrate steel. This process provided alloyed zinc-plated steel sheets having excellent drawability and powdering resistance.Type: GrantFiled: February 6, 1989Date of Patent: November 7, 1989Assignee: Nisshin Steel Company, Ltd.Inventors: Nobuhiko Sakai, Yukio Uchida, Eizo Wada, Yusuke Hirose
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Patent number: 4847169Abstract: Alloyed-zinc-plated steel sheet the alloyed layer of which is minutely cellulated is disclosed. Such an alloyed-zinc-plated steel sheet can be prepared by carrying out the vacuum deposition plating in an inert atmosphere containing 1.0-30 ppm oxygen by volume oxygen and subjecting the plated steel sheet to an alloying heat treatment.Type: GrantFiled: December 29, 1987Date of Patent: July 11, 1989Assignee: Nisshin Steel Company, Ltd.Inventors: Nobuhiko Sakai, Yukio Uchida, Eizo Wada, Yusuke Hirose