Patents by Inventor Nobuji Matsumura
Nobuji Matsumura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8921027Abstract: A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). R1 represents a hydrogen atom or the like, R2 represents a single bond or the like, R3 represents a linear or branched unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms or the like, and X+ represents an onium cation.Type: GrantFiled: December 15, 2011Date of Patent: December 30, 2014Assignee: JSR CorporationInventors: Ryuichi Serizawa, Nobuji Matsumura, Hirokazu Sakakibara
-
Patent number: 8808974Abstract: A method for forming a pattern includes providing a first positive-working radiation-sensitive resin composition on a substrate to form a first resist layer. The first positive-working radiation-sensitive resin composition includes a crosslinking agent, a polymer containing an acid-unstable group and not containing a crosslinking group, a radiation-sensitive acid generator, and a solvent. The first resist layer is exposed selectively to radiation, and developed to form a first resist pattern. The first resist pattern is made inactive to radiation, or insolubilized in an alkaline developer or in a second positive-working radiation-sensitive resin composition. The second positive-working radiation-sensitive resin composition is provided on the substrate to form a second resist layer. The second resist layer is exposed selectively to radiation, and developed to form a second resist pattern in the space area of the first resist pattern.Type: GrantFiled: February 19, 2013Date of Patent: August 19, 2014Assignee: JSR CorporationInventors: Yukio Nishimura, Kaori Sakai, Nobuji Matsumura, Makoto Sugiura, Atsushi Nakamura, Gouji Wakamatsu, Yuusuke Anno
-
Patent number: 8771923Abstract: A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).Type: GrantFiled: December 19, 2012Date of Patent: July 8, 2014Assignee: JSR CorporationInventors: Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai
-
Patent number: 8697331Abstract: A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.Type: GrantFiled: November 19, 2010Date of Patent: April 15, 2014Assignee: JSR CorporationInventors: Hirokazu Sakakibara, Takehiko Naruoka, Makoto Shimizu, Yukio Nishimura, Nobuji Matsumura, Yuusuke Asano
-
Patent number: 8530692Abstract: A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.Type: GrantFiled: August 23, 2011Date of Patent: September 10, 2013Assignee: JSR CorporationInventors: Nobuji Matsumura, Yuusuke Asano, Hirokazu Sakakibara, Yukio Nishimura, Takehiko Naruoka
-
Patent number: 8507575Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.Type: GrantFiled: October 13, 2011Date of Patent: August 13, 2013Assignee: JSR CorporationInventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
-
Patent number: 8450045Abstract: A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.Type: GrantFiled: January 18, 2012Date of Patent: May 28, 2013Assignee: JSR CorporationInventors: Hikaru Sugita, Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai, Tsutomu Shimokawa
-
Patent number: 8361691Abstract: A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.Type: GrantFiled: August 28, 2007Date of Patent: January 29, 2013Assignee: JSR CorporationInventors: Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai
-
Patent number: 8273837Abstract: A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition.Type: GrantFiled: December 13, 2006Date of Patent: September 25, 2012Assignee: JSR CorporationInventors: Tomoki Nagai, Takuma Ebata, Nobuji Matsumura
-
Publication number: 20120122036Abstract: A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.Type: ApplicationFiled: January 18, 2012Publication date: May 17, 2012Applicant: JSR CorporationInventors: Hikaru SUGITA, Nobuji MATSUMURA, Daisuke SHIMIZU, Toshiyuki KAI, Tsutomu SHIMOKAWA
-
Patent number: 8173348Abstract: A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.Type: GrantFiled: June 21, 2007Date of Patent: May 8, 2012Assignee: JSR CorporationInventors: Daisuke Shimizu, Hikaru Sugita, Nobuji Matsumura, Toshiyuki Kai, Tsutomu Shimokawa
-
Publication number: 20120100480Abstract: A compound has a following general formula (1). R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.Type: ApplicationFiled: August 23, 2011Publication date: April 26, 2012Applicant: JSR CorporationInventors: Nobuji MATSUMURA, Yuusuke Asano, Hirokazu Sakakibara, Yukio Nishimura, Takehiko Naruoka
-
Publication number: 20120082936Abstract: A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). R1 represents a hydrogen atom or the like, R2 represents a single bond or the like, R3 represents a linear or branched unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms or the like, and X+ represents an onium cation.Type: ApplicationFiled: December 15, 2011Publication date: April 5, 2012Applicant: JSR CorporationInventors: Ryuichi Serizawa, Nobuji Matsumura, Hirokazu Sakakibara
-
Publication number: 20120065291Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.Type: ApplicationFiled: October 13, 2011Publication date: March 15, 2012Applicant: JSR CorporationInventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
-
Patent number: 8119324Abstract: A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided.Type: GrantFiled: July 27, 2007Date of Patent: February 21, 2012Assignee: JSR CorporationInventors: Hikaru Sugita, Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai, Tsutomu Shimokawa
-
Publication number: 20110151378Abstract: A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.Type: ApplicationFiled: November 19, 2010Publication date: June 23, 2011Applicant: JSR CorporationInventors: Nobuji MATSUMURA, Akimasa Soyano, Yuusuke Asano, Takehiko Naruoka, Hirokazu Sakakibara, Makoto Shimizu, Yukio Nishimura
-
Publication number: 20110104611Abstract: A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.Type: ApplicationFiled: November 19, 2010Publication date: May 5, 2011Applicant: JSR CorporationInventors: Hirokazu Sakakibara, Takehiko Naruoka, Makoto Shimizu, Yukio Nishimura, Nobuji Matsumura, Yuusuke Asano
-
Publication number: 20100233635Abstract: A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.Type: ApplicationFiled: June 21, 2007Publication date: September 16, 2010Applicant: JSR CorporationInventors: Daisuke Shimizu, Hikaru Sugita, Nobuji Matsumura, Toshiyuki Kai, Tsutomu Shimokawa
-
Publication number: 20100068650Abstract: A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a second pattern on a substrate on which a pattern has been formed using a second resist layer forming composition and exposing the second resist layer to radiation, and a step of developing the exposed resist layer to form a second pattern in the space area of the first pattern. The first resist layer forming composition contains a cross-linking agent which accelerates conversion of the first layer from positive-working to negative-working.Type: ApplicationFiled: March 17, 2008Publication date: March 18, 2010Inventors: Yukio Nishimura, Kaori Sakai, Nobuji Matsumura, Makoto Sugiura, Atsushi Nakamura, Gouji Wakamatsu, Yuusuke Anno
-
Publication number: 20090318652Abstract: A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition.Type: ApplicationFiled: December 13, 2006Publication date: December 24, 2009Applicant: JSR CORPORATIONInventors: Tomoki Nagai, Takuma Ebata, Nobuji Matsumura