Abstract: Performed is a process of obtaining, when a dummy wafer is transferred between a orienter and a second processing chamber through a transfer path, a coordinate system for correcting a position deviation by calculating a position deviation direction of a transfer position in the orienter corresponding to a direction along which the correction of the position deviation of a transfer position in the second processing chamber can be made; detecting a position deviation of the dummy wafer, after returning it back from the second processing chamber into the orienter through the transfer path, from a position where the dummy wafer was placed before transferring it from the orienter to the second processing chamber through a reference transfer path; correcting the transfer position in the second processing chamber by the transfer path based on the coordinate system for correcting the position deviation so as to reduce the detected position deviation.