Patents by Inventor Nobuo Bessho
Nobuo Bessho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220273835Abstract: [Problem] To provide a method and a device for sanitizing hands quickly and easily in view of the current state of hand hygiene. [Solution] A sanitization method which is characterized by involving both irradiation of ultraviolet light of a wavelength of between 190 to 230 nm and a treatment using an alcoholic sanitizer; a sanitization method which is characterized in that the alcoholic sanitizer comprises water and an alcoholic agent selected from any one of ethanol, propanol, or a mixture thereof, and the amount of alcoholic agent is greater than the amount of water; and a sanitization device which includes a sanitizer supply unit for depositing the alcoholic sanitizer on an object to be sanitized and an ultraviolet irradiation unit that irradiates the object to be sanitized with ultraviolet light of a wavelength of between 190 to 230 nm.Type: ApplicationFiled: May 1, 2020Publication date: September 1, 2022Applicants: M&C Design Co., Ltd., UNIVERSITY OF FUKUIInventors: Hiromichi Iwasaki, Eiji Tanaka, Yukio Hida, Nobuo Bessho
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Patent number: 7205085Abstract: A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer. The composition allows its dielectric constant to be changed by a simple method, has a sufficiently large difference between its changed dielectric constant and its original dielectric constant and can provide a dielectric constant pattern and an optical material which are stable regardless of their use conditions.Type: GrantFiled: July 25, 2002Date of Patent: April 17, 2007Assignee: JSR CorporationInventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
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Publication number: 20070082965Abstract: It is an object of the present invention to provide a novel photo-curing composition which can be cured by light of a wide wavelength region including ultraviolet light or visible light, has such high sensitivity that it can be sufficiently cured by exposure to a small amount of light, can favorably form a fine pattern when used as a resist and provides a cured product having excellent heat resistance and insulating properties, and a negative photoresist composition using the photo-curing composition. It is another object of the present invention to provide a process for highly accurately and easily producing a polyimide thin film used for a medical instrument, and a medical instrument having the polyimide thin film. The photo-curing composition of the present invention comprises (A) a carbon cluster and/or its derivative, having a photosensitizing function, (B) a compound having plural heterocyclic rings in a molecule, and if necessary, (C) a photo-insensitive resin.Type: ApplicationFiled: November 13, 2003Publication date: April 12, 2007Applicant: JSR CorporationInventors: Kyouyu Yasuda, Yasuaki Yokoyama, Michiko Yokoyama, Naomi Shinoda, Risa Yokoyama, Nobuo Bessho
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Patent number: 7186448Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.Type: GrantFiled: May 12, 2003Date of Patent: March 6, 2007Assignee: JSR CorporationInventors: Yasuaki Yokoyama, Nobuo Bessho, Masaaki Hanamura
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Publication number: 20060275939Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.Type: ApplicationFiled: August 10, 2006Publication date: December 7, 2006Applicant: JSR CorporationInventors: Yasuaki Yokoyama, Nobuo Bessho, Masaaki Hanamura
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Patent number: 7125647Abstract: To provide a refractive index pattern and an optical material whose refractive indices are changed by a simple method, which have a sufficiently large refractive index difference and which are stable irrespective of their use conditions, and a method of forming these. A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium or tetramethoxysilane, or a halogen compound such as tetrachlorosilane and (C) a radiation sensitive decomposer; and a method of producing a refractive index pattern and an optical material, using the above radiation sensitive refractive index changing composition.Type: GrantFiled: March 8, 2002Date of Patent: October 24, 2006Assignee: JSR CorporationInventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
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Radiation-sensitive composition changing in refractive index and method of changing refractive index
Patent number: 7108954Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.Type: GrantFiled: December 6, 2001Date of Patent: September 19, 2006Assignee: JSR CorporationInventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Tsutomu Shimokawa, Kenji Yamada -
Patent number: 7071255Abstract: A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.Type: GrantFiled: February 18, 2002Date of Patent: July 4, 2006Assignee: JSR CorporationInventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
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Patent number: 6890663Abstract: A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.Type: GrantFiled: October 23, 2002Date of Patent: May 10, 2005Assignee: JSR CorporationInventors: Hideaki Masuko, Tadahiko Udagawa, Hiroaki Nemoto, Nobuo Bessho
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Patent number: 6828078Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.Type: GrantFiled: April 23, 2002Date of Patent: December 7, 2004Assignee: JSR CorporationInventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Tsutomu Shimokawa, Kenji Yamada
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Publication number: 20040185187Abstract: The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.Type: ApplicationFiled: January 9, 2004Publication date: September 23, 2004Inventors: Yasuaki Yokoyama, Nobuo Bessho, Masaaki Hanamura
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Patent number: 6787289Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.Type: GrantFiled: December 19, 2002Date of Patent: September 7, 2004Assignee: JSR CorporationInventors: Kenji Yamada, Nobuo Bessho, Atsushi Kumano, Keiji Konno
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Radiation-sensitive composition changing in refractive index and method of changing refractive index
Publication number: 20040013972Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.Type: ApplicationFiled: April 30, 2003Publication date: January 22, 2004Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Tsutomu Shimokawa, Kenji Yamada -
Publication number: 20040005506Abstract: A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer.Type: ApplicationFiled: April 1, 2003Publication date: January 8, 2004Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
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Publication number: 20030171468Abstract: A composition whose refractive index of a material is changed by a simple method, which can have a sufficiently large refractive index difference, and which provides a stable refractive index pattern and an optical material irrespective of their use conditions and a method for forming the refractive index pattern and the optical material.Type: ApplicationFiled: November 13, 2002Publication date: September 11, 2003Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
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Publication number: 20030139486Abstract: A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions.Type: ApplicationFiled: December 19, 2002Publication date: July 24, 2003Applicant: JSR CORPORATIONInventors: Kenji Yamada, Nobuo Bessho, Atsushi Kumano, Keiji Konno
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Patent number: 6572963Abstract: A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.Type: GrantFiled: October 17, 2001Date of Patent: June 3, 2003Assignee: JSR CorporationInventors: Hideaki Masuko, Tadahiko Udagawa, Hiroaki Nemoto, Nobuo Bessho
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Publication number: 20030064303Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer.Type: ApplicationFiled: April 23, 2002Publication date: April 3, 2003Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Tsutomu Shimokawa, Kenji Yamada
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Publication number: 20030049412Abstract: A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.Type: ApplicationFiled: October 23, 2002Publication date: March 13, 2003Applicant: JSR CORPORATIONInventors: Hideaki Masuko, Tadahiko Udagawa, Hiroaki Nemoto, Nobuo Bessho
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Publication number: 20020034611Abstract: A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.Type: ApplicationFiled: October 17, 2001Publication date: March 21, 2002Applicant: JSR CORPORATION, A JAPANESE CORPORATIONInventors: Hideaki Masuko, Tadahiko Udagawa, Hiroaki Nemoto, Nobuo Bessho