Patents by Inventor Nobuo Nishikawa

Nobuo Nishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing presensitized diazo resin lithographic printing plate using 1-methoxy-2-propanol as coating solvent
    Patent number: 4929533
    Abstract: A process is described for producing a presensitized lithographic printing plate by coating onto a surface-roughened aluminum plate a solution having dissolved in a solvent containing at least 10 wt % 1-methoxy-2-propanol a negative-working, light-sensitive composition which contains a light-sensitive diazo resin and a high-molecular weight compound and which is developable with an aqueous alkali developer, and drying the coated solution.
    Type: Grant
    Filed: July 1, 1988
    Date of Patent: May 29, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuo Nishikawa, Hiroshi Misu
  • Process for producing photosensitive negative working diazo resin lithographic plate using admixture of at least three solvents
    Patent number: 4917988
    Abstract: A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising:(a) at least 10 wt. % of 1-methoxy-2-propanol,(b) an amino group-free polar solvent having a boiling point under 1 atm of 50.degree. to 100.degree. C. and a dielectric constant at 20.degree. C. of at least 5.5, and(c) 2 to 50 wt. % of methyl lactate,and drying the coated solution.
    Type: Grant
    Filed: February 17, 1988
    Date of Patent: April 17, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shigeo Koizumi, Nobuo Nishikawa, Nobuyuki Kita