Abstract: A method for fabricating a solid-state image pick-up device changes part of the constituent elemental Si into the n-type impurity phosphorus P, thus changing the substrate to an n-type, by atomic transmutation through neutron irradiation of a p-type silicon Si wafer, and thus produces a Si substrate with a resistivity .rho..sub.s of 10 to 100 ohm-cm. or preferably 40 to 60 ohm-cm. A solid-state image pick-up device with a plurality of photosensors and vertical and horizontal shift registers as set forth above is then fabricated using the resulting Si substrate. In the preferred process, the silicon substrate can be obtained by irradiating a wafer sectioned from a crystal grown by the MCZ method, for instance, with neutrons as described before until it has the required resistivity .rho..sub.s. This silicon substrate is preferably of a p-type before neutron irradiation, that is, in the crystal growth state, and its resistivity .rho..sub.o is then ten or more times higher (100 ohm-cm. or more) than that .rho..

Abstract: A method for fabricating a solid-state image pick-up device changes part of the constituent elemental Si into the n-type impurity phosphorus P, thus changing the substrate to an n-type, by atomic transmutation through neutron irradiation of a p-type silicon Si wafer, and thus produces a Si substrate with a resistivity .rho..sub.s of 10 to 100 ohm-cm. or preferably 40 to 60 ohm-cm. A solid-state image pick-up device with a plurality of photosensors and vertical and horizontal shift registers as set forth above is then fabricated using the resulting Si substrate. In the preferred process, the silicon substrate can be obtained by irradiating a wafer sectioned from a crystal grown by the MCZ method, for instance, with neutrons as described before until it has the required resistivity .rho..sub.s. This silicon substrate is preferably of a p-type before neutron irradiation, that is, in the crystal growth state, and its resistivity .rho..sub.o is then ten or more times higher (100 ohm-cm. or more) than that .rho..

Abstract: An apparatus for solidification comprising a container for a liquid material which is to be solidified and an electric heater around the container and energized to melt the liquid material, a pair of magnets beside the container producing a stationary magnetic field, a source of electricity to supply substantially DC current to said heater and means for pulling a solid crystal from said liquid material.

Abstract: A process for solidification of fluid such as silicon melt and so on is disclosed. In this case, liquid material having electrical conductivity is in a container and a unidirectional stationary magnetic field is applied to the liquid material. Thus, the dissolution of at least one elemental material of the container into the liquid material is conducted by diffusion thereof.

Abstract: Apparatus for and methods of forming a liquid phase epitaxial growth layer on a semiconductor wafer by floating the wafer on a solution which forms the source of the epitaxial growth layer.