Patents by Inventor Nobuyuki Iwasaki

Nobuyuki Iwasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4835396
    Abstract: An improvement of a radiographic intensifying screen comprises a support and a phosphor layer provided on the support, in which phosphor particles are arranged in the phosphor layer in such manner that the diameters of the phosphor particles become larger along the depth direction of from the screen surface side to the support side. A radiation image producing method utilizes a screen-film system comprising a radiographic film and a radiographic intensifying screen provided on one side of the film or a screen-film system comprising a radiographic film and two radiographic intensifying screens provided on both sides of the film, in each of which the phosphor layer has the above-mentioned specific particle diameter distribution.
    Type: Grant
    Filed: January 21, 1988
    Date of Patent: May 30, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Kitada, Nobuyuki Iwasaki
  • Patent number: 4738918
    Abstract: A process for processing silver halide photographic material is disclosed, which comprises development-processing a silver halide photographic material in the presence of a compound represented by formula (I) or a salt thereof with an inorganic or organic acid: ##STR1## wherein Z represents an atomic group of carbon atoms, nitrogen atoms, or a combination thereof forming a 5-, 6-, or 7-membered unsaturated heterocyclic ring, said unsaturated heterocyclic ring being optionally fused with a monocyclic or bicyclic aryl group;R.sup.0 represents ##STR2## R.sup.1 represents an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group;R.sup.2 and R.sup.3 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an alkoxy group, a substituted alkoxy group, an amino group, or a substituted amino group;R.sup.4 represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group; andR.sup.
    Type: Grant
    Filed: September 15, 1986
    Date of Patent: April 19, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shoji Ishiguro, Hiroyuki Mifune, Shigeo Hirano, Nobuyuki Iwasaki
  • Patent number: 4508818
    Abstract: A silver halide photographic sensitive material is disclosed. The material is comprised of a support base which has a sensitive silver halide emulsion layer on the surface of the base. On the silver halide emulsion layer is a first and a second insensitive layer. The second insensitive layer has a melting time which is higher than that of the first insensitive layer. The first insensitive layer has a melting time which is equal to or higher than the melting time of the silver halide emulsion layer. The resulting material can be advantageously utilize within an automatic developing apparatus. The material has improved mechanical properties and results in a reduced amount of scum being formed within the developing solution.
    Type: Grant
    Filed: March 26, 1984
    Date of Patent: April 2, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Nobuyuki Iwasaki, Taku Nakamura
  • Patent number: 4481284
    Abstract: A silver halide photographic light-sensitive material is disclosed, comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and a thickness of the light-insensitive uppermost layer is from 0.3 .mu.m to 0.8 .mu.m. The silver halide photographic light-sensitive material causes a remarkably lower degree of reticulation, can reduce the amount of scum formed in the processing solution, and has an improved covering power.
    Type: Grant
    Filed: September 21, 1982
    Date of Patent: November 6, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Nobuyuki Iwasaki, Taku Nakamura
  • Patent number: 4476218
    Abstract: A silver halide photographic light-sensitive material is described, which comprises a support, and at least one light-sensitive silver halide emulsion layer and an uppermost layer provided on at least one surface of the support, wherein the melting time of the uppermost layer is made greater than that of the light-sensitive silver halide emulsion layer. The material has good strength and produces a reduced amount of scum which normally occurs in the processing liquid during development processing.
    Type: Grant
    Filed: June 16, 1982
    Date of Patent: October 9, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Taku Nakamura, Nobuyuki Iwasaki
  • Patent number: 4460680
    Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer is disclosed. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and the thickness of the light-insensitive uppermost layer is from 1.3 .mu.m to 5.0 .mu.m. The silver halide photographic light-sensitive material has an improved covering power and results in remarkably low degree of reticulation. Furthermore, when the material is used it results in a reduced amount of scum being formed in the processing solution.
    Type: Grant
    Filed: August 25, 1982
    Date of Patent: July 17, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masashi Ogawa, Kunio Ishigaki, Nobuyuki Iwasaki, Taku Nakamura
  • Patent number: 4435500
    Abstract: A method of rapidly processing a silver halide photographic light-sensitive material having high sensitivity and high covering power using a developing solution is disclosed. The developing solution contains a combination of a silver halide solvent and a particular anti-foggant. The rapid processing is not attended by increase in fog and deterioration of graininess. The photographic material contains a surface latent image type silver halide emulsion and a silver halide emulsion having fogged nuclei inside the grains in a single layer formed by coating the mixture thereof, or in a double layer formed by coating them separately. The anti-foggant has the general formula (I) or (II): ##STR1## wherein R.sub.1 represents hydrogen, a nitro group, a cyano group or a halogen atom; and R.sub.2 represents hydrogen, a halogen atom or an alkyl group.
    Type: Grant
    Filed: August 31, 1982
    Date of Patent: March 6, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Eiichi Okutsu, Nobuyuki Iwasaki, Shunji Takada
  • Patent number: 4052373
    Abstract: A process for hardening, e.g., gelatin, in particular, a gelatin used for photographic light-sensitive materials, which comprises treating gelatin, a non-gelatin hydrophilic high molecular weight material containing primary or secondary amino groups or a composition containing the same with a compound represented by the following general formula (I): ##STR1## WHEREIN R.sub.1 and R.sub.2, which may be the same or different, each represents a monovalent residue which is bonded through a carbon atom or a sulfur atom thereof to the nitrogen atom forming the carboxylic acid ester, and R.sub.1 and R.sub.2 may combine to form a ring structure; R is a divalent or trivalent residue which is bonded through a carbon atom or a nitrogen atom thereof to the carbon atom of the carboxyl group in the carboxylic acid ester, and n is 2 when R is a divalent residue and n is 3 when R is a trivalent residue.
    Type: Grant
    Filed: June 5, 1975
    Date of Patent: October 4, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hidefumi Sera, Nobuo Yamamoto, Ikutaro Horie, Kameji Nagao, Nobuyuki Iwasaki