Patents by Inventor Nobuyuki Sashida

Nobuyuki Sashida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6427029
    Abstract: An image compression and restoration technique may be used as a substitute for JPEG. In this technique, orthogonal transforms are performed on the original image signals without interpolation, which means it requires less calculation than JPEG standard. Furthermore, the degradation of the image quality can be suppressed. After that quantization, re-ordering and Huffman coding follow. The Huffman coding is also unique in the sense that unlike JPEG, it uses the data from the previous blocks which results in a more simple, less CPU intensive codec technique. Conversely, the compressed data is restored using a procedure reverse to that of the aforementioned compression technique.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: July 30, 2002
    Assignee: Custom Technology Corp.
    Inventors: Takahiko Kono, Shunichi Takeuchi, Nobuyuki Sashida
  • Patent number: 6424676
    Abstract: An improved motion vector detecting method is provided that can ensure a wide search area while suppressing detection of erroneous motion vectors at the same time. Specifically, when detecting motion vectors from a first and a second image frame, the method divides the second image frame into blocks, classifies the blocks into a first and a second group such that the mutually adjacent blocks belong to the different groups. The method specifies a motion vector candidate for each of the blocks in the first and second groups, then performs the process of updating the motion vector candidate by studying an average of the motion vector candidates of the adjacent blocks for each of the blocks in the first and second groups. The process is repeated for a certain time.
    Type: Grant
    Filed: July 21, 1999
    Date of Patent: July 23, 2002
    Assignee: Custom Technology Corp.
    Inventors: Takehiko Kono, Shunichi Takeuchi, Nobuyuki Sashida
  • Patent number: 5756260
    Abstract: By using a polyamic acid ester comprising the following structural units (1a), (1b) and (1c) as a photosensitive resin and a sulfonamide compound or a specific glycol ether acetate as a stabilizer, a photo-sensitive resin composition excellent especially in viscosity stability can be obtained, and by using the above photosensitive resin and a specific developer, a relief pattern of high resolution can be formed.
    Type: Grant
    Filed: October 15, 1996
    Date of Patent: May 26, 1998
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Nobuyuki Sashida, Toshio Banba, Naoshige Takeda, Mitsuhiro Yamamoto
  • Patent number: 5648451
    Abstract: A process for producing a photosensitive resin, comprises reacting a diamine with a tetracarboxylic acid tetraester represented by the formula (1) at a temperature of 0.degree. to 50.degree. C. in an aprotic polar solvent: ##STR1## wherein R.sub.1 is a tetravalent organic group; R.sub.2 is a group represented by the formula: ##STR2## in which R.sub.5 is a divalent to hexavalent organic group, R.sub.6 is H or CH.sub.3 and p is an integer of 1 to 5; R.sub.3 is a group represented by --OCH.sub.3, --OC.sub.2 H.sub.5, --OC.sub.3 H.sub.7 or the formula: ##STR3## and R.sub.4 is a group of the formula: ##STR4## the tetracarboxylic acid tetraester of the formula (1) is obtained by subjecting to addition reaction a tetracarboxylic dianhydride, an alcohol compound represented by the formula R.sub.2 H in which R.sub.2 is as defined above and an alcohol compound represented by the formula R.sub.3 H in which R.sub.
    Type: Grant
    Filed: October 10, 1995
    Date of Patent: July 15, 1997
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Nobuyuki Sashida, Toshio Banba, Naoshige Takeda
  • Patent number: 5385808
    Abstract: The present invention provides a photosensitive resin composition which comprises as essential components:(A) a polyamic acid having a recurring unit represented by the following formula [I]: ##STR1## wherein 0.5-50 mol % of R.sub.1 consists of a silicone diamine residue represented by the following formula [II]: ##STR2## wherein n represents an integer of 1-50, and the remainder of 50-99.5 mol % of R.sub.1 consists of an organic group selected from the group consisting of an aromatic group, an aliphatic group, an alicyclic group, and a heterocyclic group, and R.sub.2 consists of an organic group selected from the group consisting of an aromatic group, an aliphatic group, an alicyclic group, a heterocyclic group, and a silicone group, and m represents 1 or 2,(B) an amide compound having carbon-carbon double bond, and(C) a photosensitizer.The present invention further provides a semiconductor apparatus in which the above composition is used.
    Type: Grant
    Filed: October 25, 1993
    Date of Patent: January 31, 1995
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Akira Tokoh, Nobuyuki Sashida, Etsu Takeuchi, Takashi Hirano
  • Patent number: 5238784
    Abstract: The present invention provides a photosensitive resin composition which comprises, as essential components:(A) a polyamic acid having a recurring unit represented by the following formula [I]: ##STR1## wherein R.sub.1 and R.sub.2 each represents an organic group selected from the group consisting of an aromatic group, an alicyclic group, an aliphatic group, and a heterocyclic group and m is 1 or 2,(B) an amide compound having carbon-carbon double bond, and(C) a photosensitizer.
    Type: Grant
    Filed: November 28, 1990
    Date of Patent: August 24, 1993
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Akira Tokoh, Nobuyuki Sashida, Etsu Takeuchi, Takashi Hirano