Patents by Inventor Nolan Zimmerman
Nolan Zimmerman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11814744Abstract: Systems for cleaning electroplating system components may include an electroplating apparatus including a plating bath vessel. The electroplating apparatus may include a rinsing frame extending above the plating bath vessel. The rinsing frame may include a rim extending circumferentially about an upper surface of the plating bath vessel and defining a rinsing channel between the rim and the upper surface of the plating bath vessel. The electroplating apparatus may also include a rinsing assembly including a splash guard that is translatable from a recessed first position to a second position extending at least partially across an access to the plating bath vessel. The rinsing assembly may also include a fluid nozzle extending from the rinsing frame.Type: GrantFiled: March 29, 2019Date of Patent: November 14, 2023Assignee: Applied Materials, Inc.Inventors: Nolan Zimmerman, Gregory J. Wilson, Andrew Anten, Richard W. Plavidal, Eric J. Bergman, Tricia Youngbull, Timothy Gale Stolt, Sam Lee
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Publication number: 20190301049Abstract: Systems for cleaning electroplating system components may include an electroplating apparatus including a plating bath vessel. The electroplating apparatus may include a rinsing frame extending above the plating bath vessel. The rinsing frame may include a rim extending circumferentially about an upper surface of the plating bath vessel and defining a rinsing channel between the rim and the upper surface of the plating bath vessel. The electroplating apparatus may also include a rinsing assembly including a splash guard that is translatable from a recessed first position to a second position extending at least partially across an access to the plating bath vessel. The rinsing assembly may also include a fluid nozzle extending from the rinsing frame.Type: ApplicationFiled: March 29, 2019Publication date: October 3, 2019Applicant: Applied Materials, Inc.Inventors: Nolan Zimmerman, Greg Wilson, Andrew Anten, Richard W. Plavidal, Eric J. Bergman, Tricia Youngbull, Timothy Gale Stolt, Sam Lee
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Patent number: 7393439Abstract: Tools having mounting modules with registration systems are disclosed. The mounting module includes positioning elements for precisely locating a processing chamber and a transport system that moves workpieces to and from the processing chamber. The relative positions between positioning elements of the module are fixed so that the transport system does not need to be recalibrated when the processing chamber is removed and replaced with another processing chamber. The processing chamber includes a paddle device for agitating processing liquid at a process surface of the workpiece. The paddle device, the processing chamber, and electrodes within the processing chamber are configured to reduce the likelihood for electrical shadowing created by the paddles at the surface of the workpiece, and to account for three-dimensional effects on the electrical field as the paddles reciprocate relative to the workpiece.Type: GrantFiled: December 11, 2003Date of Patent: July 1, 2008Assignee: Semitool, Inc.Inventors: Paul R. McHugh, Gregory J. Wilson, Daniel J. Woodruff, Nolan Zimmerman, James J. Erickson
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Patent number: 7390382Abstract: Reactors having multiple electrodes and/or enclosed reciprocating paddles are disclosed. The reactor can include multiple electrodes spaced apart from a process location to provide virtual electrodes proximate to the process location for transferring material to or from the workpiece. A magnet may be positioned proximate to the process plane to orient magnetically sensitive material deposited on the workpiece. The electrodes may be removable from the reactor without passing them through the magnet to reduce interference between the electrodes and the magnet. The workpiece may be carried by a rotatable workpiece support to orient the workpiece for processing. At least one of the electrodes can operate as a current thief to reduce terminal effects at the periphery of the workpiece.Type: GrantFiled: December 11, 2003Date of Patent: June 24, 2008Assignee: Semitool, Inc.Inventors: Paul R. McHugh, Gregory J. Wilson, Daniel J. Woodruff, Nolan Zimmerman, James J. Erickson
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Patent number: 7390383Abstract: Paddles and enclosures for processing microfeature workpieces are disclosed. A paddle device having multiple paddles is positioned in an enclosure to reciprocate back and forth along a generally linear path. The clearances between the paddles, the workpiece and the walls of the chamber are relatively small to increase the flow agitation at the surface of the workpiece and enhance the mass transfer process occurring there. The paddles are shaped to reduce or eliminate electrical shadowing effects created at the surface of the workpiece during electrochemical processing. Paddles on the same paddle device may have different shapes to reduce the likelihood for creating three-dimensional effects in the flow field proximate to the surface of the workpiece. The reciprocation stroke of the paddles may shift to further reduce shadowing.Type: GrantFiled: December 11, 2003Date of Patent: June 24, 2008Assignee: Semitool, Inc.Inventors: Paul R. McHugh, Gregory J. Wilson, Daniel J. Woodruff, Nolan Zimmerman, James J. Erickson
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Publication number: 20080011450Abstract: Apparatus and method for thermally controlled processing of microelectronic workpieces with liquids. An apparatus in accordance with and embodiment of the invention includes a process vessel configured to carry a processing liquid, such as an electroless processing liquid. The vessel has a thermally transmissive wall for transferring heat to and/or from the processing liquid within. A heat transfer device, such as a reservoir that receives processing liquid spilling over from the process vessel, transfers heat to or from the processing liquid within the process vessel. The heat transfer device can also transfer heat to or from an internal or external heat source, such as a conduit carrying a heat transfer fluid, or an electrical resistance heater.Type: ApplicationFiled: July 12, 2007Publication date: January 17, 2008Applicant: Semitool, Inc.Inventors: Kyle Hanson, Robert Batz, Rajesh Baskaran, Nolan Zimmerman, Zhongmin Hu, Gregory Wilson, Paul McHugh
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Patent number: 7294243Abstract: Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assembly (400) can comprise a support member (410) that includes an inner wall (412) which defines an opening (414) configured to receive the workpiece and a plurality of contacts (420). The individual contacts (420) include a conductor (440) and a cover (430). The conductor (440) can comprise a proximal section (435) projecting inwardly into the opening (414) relative to the support member (410), a distal section (436) extending from the proximal section (435), and an inert exterior (444) at least at the distal section (436). The cover (430) comprises a dielectric element that covers at least the proximal section of the conductor, but does not cover at least a portion of the distal section of the core. The exposed portion of the distal section of the core, accordingly, defines a conductive contact site for contacting a conductive layer (e.g., a seed layer) on the workpiece.Type: GrantFiled: December 5, 2002Date of Patent: November 13, 2007Assignee: Semitool, Inc.Inventors: Nolan Zimmerman, Gregory J. Wilson, Steve L. Eudy
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Patent number: 7252714Abstract: Apparatus and method for thermally controlled processing of microelectronic workpieces with liquids. An apparatus in accordance with and embodiment of the invention includes a process vessel configured to carry a processing liquid, such as an electroless processing liquid. The vessel has a thermally transmissive wall for transferring heat to and/or from the processing liquid within. A heat transfer device, such as a reservoir that receives processing liquid spilling over from the process vessel, transfers heat to or from the processing liquid within the process vessel. The heat transfer device can also transfer heat to or from an internal or external heat source, such as a conduit carrying a heat transfer fluid, or an electrical resistance heater.Type: GrantFiled: November 15, 2002Date of Patent: August 7, 2007Assignee: Semitool, Inc.Inventors: Kyle M. Hanson, Robert W. Batz, Jr., Rajesh Baskaran, Nolan Zimmerman, Zhongmin Hu, Gregory J. Wilson, Paul R. McHugh
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Publication number: 20050045474Abstract: Contact assemblies for electrochemical processing of microelectronic workpieces. The contact assembly (400) can comprise a support member (410) that includes an inner wall (412) which defines an opening (414) configured to receive the work-piece and a plurality of contacts (420). The individual contacts (420) include a conductor (440) and a cover (430). The conductor (440) can comprise a proximal section (435) projecting inwardly into the opening (414) relative to the support member (410), a distal section (436) extending from the proximal section (435), and an inert exterior (444) at least at the distal section (436). The cover (430) comprises a dielectric element that covers at least the proximal section of the conductor, but does not cover at least a portion of the distal section of the core. The exposed portion of the distal section of the core, accordingly, defines a conductive contact site for contacting a conductive layer (e.g., a seed layer) on the workpiece.Type: ApplicationFiled: December 5, 2002Publication date: March 3, 2005Inventors: Nolan Zimmerman, Gregory Wilson, Steve Eudy
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Publication number: 20050006241Abstract: Paddles and enclosures for processing microfeature workpieces are disclosed. A paddle device having multiple paddles is positioned in an enclosure to reciprocate back and forth along a generally linear path. The clearances between the paddles, the workpiece and the walls of the chamber are relatively small to increase the flow agitation at the surface of the workpiece and enhance the mass transfer process occurring there. The paddles are shaped to reduce or eliminate electrical shadowing effects created at the surface of the workpiece during electrochemical processing. Paddles on the same paddle device may have different shapes to reduce the likelihood for creating three-dimensional effects in the flow field proximate to the surface of the workpiece. The reciprocation stroke of the paddles may shift to further reduce shadowing.Type: ApplicationFiled: December 11, 2003Publication date: January 13, 2005Inventors: Paul McHugh, Gregory Wilson, Daniel Woodruff, Nolan Zimmerman, James Erickson
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Publication number: 20050000817Abstract: Reactors having multiple electrodes and/or enclosed reciprocating paddles are disclosed. The reactor can include multiple electrodes spaced apart from a process location to provide virtual electrodes proximate to the process location for transferring material to or from the workpiece. A magnet may be positioned proximate to the process plane to orient magnetically sensitive material deposited on the workpiece. The electrodes may be removable from the reactor without passing them through the magnet to reduce interference between the electrodes and the magnet. The workpiece may be carried by a rotatable workpiece support to orient the workpiece for processing. At least one of the electrodes can operate as a current thief to reduce terminal effects at the periphery of the workpiece.Type: ApplicationFiled: December 11, 2003Publication date: January 6, 2005Inventors: Paul McHugh, Gregory Wilson, Daniel Woodruff, Nolan Zimmerman, James Erickson
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Publication number: 20040245094Abstract: Tools having mounting modules with registration systems are disclosed. The mounting module includes positioning elements for precisely locating a processing chamber and a transport system that moves workpieces to and from the processing chamber. The relative positions between positioning elements of the module are fixed so that the transport system does not need to be recalibrated when the processing chamber is removed and replaced with another processing chamber. The processing chamber includes a paddle device for agitating processing liquid at a process surface of the workpiece. The paddle device, the processing chamber, and electrodes within the processing chamber are configured to reduce the likelihood for electrical shadowing created by the paddles at the surface of the workpiece, and to account for three-dimensional effects on the electrical field as the paddles reciprocate relative to the workpiece.Type: ApplicationFiled: December 11, 2003Publication date: December 9, 2004Inventors: Paul R. McHugh, Gregory J. Wilson, Daniel J. Woodruff, Nolan Zimmerman, James J. Erickson
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Publication number: 20040013808Abstract: Apparatus and method for thermally controlled processing of microelectronic workpieces with liquids. An apparatus in accordance with and embodiment of the invention includes a process vessel configured to carry a processing liquid, such as an electroless processing liquid. The vessel has a thermally transmissive wall for transferring heat to and/or from the processing liquid within. A heat transfer device, such as a reservoir that receives processing liquid spilling over from the process vessel, transfers heat to or from the processing liquid within the process vessel. The heat transfer device can also transfer heat to or from an internal or external heat source, such as a conduit carrying a heat transfer fluid, or an electrical resistance heater.Type: ApplicationFiled: November 15, 2002Publication date: January 22, 2004Inventors: Kyle M. Hanson, Robert W. Batz, Rajesh Baskaran, Nolan Zimmerman, Zhongmin Hu, Gregory J. Wilson, Paul R. McHugh